Kenneth D Harvey

US Patent:

6548999, Apr 15, 2003

Filed:

Aug 17, 2001

Appl. No.:

09/933477

Inventors:

Vincent W. C. Wong - Morgan Hill CA
William W. Oldfield - Redwood City CA
Kenneth C. Harvey - Los Gatos CA

Assignee:

Anritsu Company - Morgan Hill CA

International Classification:

G01R 1508

US Classification:

324132, 324 95, 324115, 324119

Abstract:

A power meter includes components to measure RMS power over an 84 dB range or greater using the I-V square-law relation of a diode for measurements. The power meter includes multiple diodes along with a power distribution manifold which includes power dividers to distribute an input signal to the diodes. In one embodiment, a first power divider ( ) distributes power to a first one of the diodes ( ), and to the second power divider ( ) which distributes power to the second ( ) and third ( ) diodes. The first power divider ( ) is connected without attenuation to the first diode ( ). The second power divider ( ) is connected to the second diode ( ) through a 11 dB attenuator ( ), and to the third diode ( ) through a 28 dB attenuator ( ). With such attenuation, the first diode can operate in its square law range for measurements of signals with power from -64 dBm to -14 dBm, while the second diode can operate in its square law range for signals with power from -14 dBm to +3 dBm, and the third diode can operate within its square law range for signals with power from +3 dBm to +20 dBm. By measuring the current from the appropriate diode depending on the power level of the input signal, RMS power can be determined accurately over an 84 dB operating range.

US Patent:

6830939, Dec 14, 2004

Filed:

Aug 28, 2002

Appl. No.:

10/232987

Inventors:

Kenneth C. Harvey - Dallas TX
Jimmy W. Hosch - Dallas TX
Neal B. Gallagher - Manson WA
Barry M. Wise - Manson WA

Assignee:

Verity Instruments, Inc. - Carrollton TX

International Classification:

H01L 21302

US Classification:

438 8, 9 16, 9714, 216 60, 134 12, 134 2211

Abstract:

The present invention is directed to a system, method and software product for creating a predictive model of the endpoint of etch processes using Partial Least Squares Discriminant Analysis (PLS-DA). Calibration data is collected from a calibration wafer using optical emission spectroscopy (OES). The data may be non-periodic or periodic with time and periodic signals may be sampled synchronously or non-synchronously. The OES data is arranged in a spectra matrix X having one row for each data sample. The OES data is processed depending upon whether or not it is synchronous. Synchronous data is arranged in an unfolded spectra matrix X having one row for each period of data samples. A previewed endpoint signal is plotted using wavelengths known to exhibit good endpoint characteristics. Regions of stable intensity values in the endpoint plot that are associated with either the etch region or the post-etch region are identified by sample number. An X-block is created from the processed OES data samples associated with the two regions of stable intensity values.

US Patent:

7339682, Mar 4, 2008

Filed:

Feb 25, 2005

Appl. No.:

11/066933

Inventors:

Arun Ananth Aiyer - Fremont CA, US
Mark A. Meloni - Flower Mound TX, US
Kenneth C. Harvey - Dallas TX, US
Andrew Weeks Kueny - Dallas TX, US

Assignee:

Verity Instruments, Inc. - Carrollton TX

International Classification:

G01B 9/02

US Classification:

356504, 356485, 356492

Abstract:

The present invention is directed to a heterodyne reflectometer system and method for obtaining highly accurate phase shift information from heterodyned optical signals, from which extremely accurate film depths can be calculated. A linearly polarized light comprised of two linearly polarized components that are orthogonal to each other, with split optical frequencies, is directed toward a film causing one of the optical polarization components to lag behind the other due to an increase in the optical path in the film for that component. A pair of detectors receives the beam reflected from the film layer and produces a measurement signal, and the beam prior to incidence on the film layer and generates a reference signal, respectively. The measurement signal and reference signal are analyzed by a phase detector for phase shift. The detected phase shift is then fed into a thickness calculator for film thickness results.

US Patent:

7630859, Dec 8, 2009

Filed:

May 1, 2007

Appl. No.:

11/799516

Inventors:

Kenneth C. Harvey - Dallas TX, US

Assignee:

Verity Instruments, Inc. - Carrollton TX

International Classification:

G06F 11/30
G06F 17/40

US Classification:

702182, 702 30, 702183, 702187

Abstract:

The present invention is directed to a method and apparatus for reducing the effects of window clouding on a viewport window in a reactive environment. One or more clouded viewport windows are obtained for testing, in which the clouding results from exposure to the reactive environment. The clouding typically appears as a coating film on the test windows. The clouded viewport windows are analyzed for one or more spectral regions having good transmission. The threshold level of light transmission is determined by the particular application in which the window is used. The spectral regions of good transmission are evaluated for their usefulness with a particular algorithm that will use the spectral data in a production environment. Spectral regions that cannot be evaluated using the subject algorithm are eliminated from consideration. Spectral regions that can be evaluated using the subject algorithm and exhibit low absorption are selected for monitoring in the production environment.

US Patent:

8125633, Feb 28, 2012

Filed:

May 6, 2008

Appl. No.:

12/151449

Inventors:

Mike Whelan - Coppell TX, US
Andrew Weeks Kueny - Dallas TX, US
Kenneth C. Harvey - Dallas TX, US
John Douglas Corless - Dallas TX, US

Assignee:

Verity Instruments, Inc. - Carrollton TX

International Classification:

G01J 3/00

US Classification:

356300

Abstract:

The present invention is directed to a system and method for radiometric calibration of spectroscopy equipment utilized in fault detection and process monitoring. Initially, a reference spectrograph is calibrated to a local primary standard (a calibrated light source with known spectral intensities and traceable to a reference standard). Other spectrographs are then calibrated from the reference spectrograph rather than the local primary calibration standard. This is accomplished by viewing a light source with both the reference spectrograph and the spectrograph to be calibrated. The output from the spectrograph to be calibrated is compared to the output of the reference spectrograph and then adjusted to match that output. The present calibration process can be performed in two stages, the first with the spectrographs calibrated to the reference spectrograph and then are fine tuned to a narrow band light source at the plasma chamber. Alternatively, the reference spectrograph can be calibrated to the local primary standard while optically coupled to the plasma chamber.

US Patent:

20080233016, Sep 25, 2008

Filed:

Mar 21, 2007

Appl. No.:

11/726958

Inventors:

Kenneth C. Harvey - Dallas TX, US

International Classification:

B01J 19/00

US Classification:

422119

Abstract:

A multichannel array structure is provided and a mechanism for establishing a viscous flow within the multichannel array for preventing the flow of particulates (???material) that cause window clouding. A process chamber is provided for confining a process pressure within a process volume with a viewport window along the chamber for viewing at least a portion of the process volume. A ingress port is disposed in the process chamber, and to the process volume, for receiving a flow of process gas in the process volume and an egress port is disposed, and in the process chamber, to the process volume for extracting a flow rate of gas from the process volume. A multichannel array (MCA) is disposed between the viewport window and the process volume of the process chamber. The MCA has a plurality of channels, each of the channels having a diameter and a length. A window chamber is defined between the viewport window and MCA with a chamber window port for receiving gas into the chamber volume. A viscous flow is formed at the window side of the channels in the MCA that prevents material from entering the window chamber and adhering to the window. The viscous flow is established by increasing pressure in the window chamber via the chamber window port, wherein the window chamber pressure exceeds the process pressure, but not enough to substantially increase the flow rate of gas from the process volume. The viscous flow rate is substantially lower than the flow of process gas into the process volume.

US Patent:

20100032587, Feb 11, 2010

Filed:

Jul 16, 2009

Appl. No.:

12/460462

Inventors:

Jimmy W. Hosch - Dallas TX, US
Matthew J. Goeckner - Plano TX, US
Mike Whelan - Coppell TX, US
Andrew Weeks Kueny - Dallas TX, US
Kenneth C. Harvey - Dallas TX, US

International Classification:

H01J 31/00
H01J 29/00

US Classification:

2504923, 2504931

Abstract:

The present invention is directed to a gas line electron beam exciter, gas line electron beam excitation system and method for exciting a gas using an electron beam exciter. The electron beam exciter generally comprises a variable density electron source for generating a cloud of electrons in an electron chamber and a variable energy electron extractor for accelerating electrons from the electron chamber as an electron beam and into an effluent stream for fluorescing species in the effluent. The electron density of the electron beam is variably controlled by adjusting the excitation power applied to the variable density electron source. The electrons in the electron chamber reside at a reference electrical potential of the chamber, typically near ground electrical potential. The electron energy of the electron beam is variably controlled by adjusting an electrical potential across the variable energy electron extractor, which energizes the electrons through an extraction hole of the chamber and toward the extractor. The greater the difference in the electrical potential between the electron extractor and the electron source, the higher the energy imparted to the electrons in the electron beam. The excitation power applied to the electron source can be adjusted independently from the electron energy of the electron beam, thereby altering the electron density of the electron beam without changing the energy level of the electrons of the electron beam.

US Patent:

63317699, Dec 18, 2001

Filed:

Jun 18, 1999

Appl. No.:

9/336607

Inventors:

Vincent W. C. Wong - Morgan Hill CA
William W. Oldfield - Redwood City CA
Kenneth C. Harvey - Los Gatos CA

Assignee:

Anritsu Company - Morgan Hill CA

International Classification:

G01R 1508
G01R 1510

US Classification:

324132

Abstract:

A power meter includes components to measure RMS power over an 84 dB range or greater using the I-V square-law relation of a diode for measurements. The power meter includes multiple diodes along with a power distribution manifold which includes power dividers to distribute an input signal to the diodes. In one embodiment, a first power divider (202) distributes power to a first one of the diodes (203), and to the second power divider (204) which distributes power to the second (210) and third (212) diodes. The first power divider (202) is connected without attenuation to the first diode (203). The second power divider (204) is connected to the second diode (210) through a 11 dB attenuator (206), and to the third diode (212) through a 28 dB attenuator (208). With such attenuation, the first diode can operate in its square law range for measurements of signals with power from -64 dBm to -14 dBm, while the second diode can operate in its square law range for signals with power from -14 dBm to +3 dBm, and the third diode can operate within its square law range for signals with power from +3 dBm to +20 dBm. By measuring the current from the appropriate diode depending on the power level of the input signal, RMS power can be determined accurately over an 84 dB operating range.