Kevin K Lin

US Patent:

8187795, May 29, 2012

Filed:

Dec 9, 2008

Appl. No.:

12/331131

Inventors:

Kanti Jain - Urbana IL, US
Kevin Lin - Urbana IL, US

Assignee:

The Board of Trustees of the University of Illinois - Urbana IL

International Classification:

G03F 7/00
G03F 7/20
G01B 7/16
G01P 15/125

US Classification:

430311, 430315, 430318, 430319, 430328, 430329, 257E23117, 7351432, 73780

Abstract:

Described herein are processing techniques for fabrication of stretchable and/or flexible electronic devices using laser ablation patterning methods. The laser ablation patterning methods utilized herein allow for efficient manufacture of large area (e. g. , up to 1 mmor greater or 1 mor greater) stretchable and/or flexible electronic devices, for example manufacturing methods permitting a reduced number of steps. The techniques described herein further provide for improved heterogeneous integration of components within an electronic device, for example components having improved alignment and/or relative positioning within an electronic device. Also described herein are flexible and/or stretchable electronic devices, such as interconnects, sensors and actuators.

US Patent:

8610986, Dec 17, 2013

Filed:

Apr 6, 2009

Appl. No.:

12/419210

Inventors:

Kanti Jain - Urbana IL, US
Junghun Chae - Champaign IL, US
Kevin Lin - Urbana IL, US
Hyunjong Jin - Urbana IL, US

Assignee:

The Board of Trustees of the University of Illinois - Urbana IL

International Classification:

G02B 26/08
G02B 26/10
G02B 26/12

US Classification:

3592241, 359904

Abstract:

Micromirrors and micromirror arrays described herein are useful, for example in maskless photolithography systems and methods and projection display devices and methods. According to one aspect, the micromirrors comprise a polymer structural layer and a reflective dielectric multilayer for selective reflection and/or redirection of incoming electromagnetic radiation. According to another aspect, incorporation of a reflective dielectric multilayer allows for use of polymer structural materials in micromirrors and prevents damage to such polymer materials due to excessive heating from absorption of electromagnetic radiation, as the reflective dielectric multilayers are highly reflective and minimize heating of the micromirror components. According to yet a further aspect, top down fabrication methods are described herein for making a micromirror comprising a polymer structural layer and a reflective dielectric multilayer.