Kiriti Nagesh Gowda

US Patent:

20180316851, Nov 1, 2018

Filed:

Apr 28, 2017

Appl. No.:

15/582460

Inventors:

- Sunnyvale CA, US
Radhakrishna Giduthuri - Sunnyvale CA, US
Kiriti Nagesh Gowda - Sunnyvale CA, US

Assignee:

Advanced Micro Devices, Inc. - Sunnyvale CA

International Classification:

H04N 5/232
H04N 5/247

Abstract:

A method and apparatus of seam finding includes determining an overlap area between a first image and a second image. The first image is captured by a first image capturing device and the second image is captured by a second image capturing device. A plurality of seam paths for stitching the first image with the second image is computed and a cost is computed for each seam path. A seam is selected to stitch the first image to the second image based upon the cost for the seam path for that seam being less than a cost for all other computed seam paths, that seam is maintained as the selected seam for stitching based upon a predefined criteria.