Kristin A Hayes

US Patent:

20160115353, Apr 28, 2016

Filed:

Oct 21, 2015

Appl. No.:

14/919449

Inventors:

- Aurora IL, US
Andrew Wolff - Darien IL, US
Phillip W. Carter - Round Lake IL, US
Kristin Hayes - St. Charles IL, US
Benjamin Petro - Aurora IL, US

International Classification:

C09G 1/02
H01L 21/321
B24B 37/04

Abstract:

The invention provides a chemical-mechanical polishing composition comprising (a) abrasive particles, (b) a cobalt accelerator selected from a compound having the formula: NRRRwherein R, R, and Rare independently selected from hydrogen, carboxyalkyl, substituted carboxyalkyl, hydroxyalkyl, substituted hydroxyalkyl and aminocarbonylalkyl, wherein none or one of R, R, and Rare hydrogen; dicarboxyheterocycles; heterocyclylalkyl-α-amino acids; N-(amidoalkyl)amino acids; unsubstituted heterocycles; alkyl-substituted heterocycles; substituted-alkyl-substituted heterocycles; N-aminoalkyl-α-amino acids; and combinations thereof, (c) a cobalt corrosion inhibitor, (d) an oxidizing agent that oxidizes a metal, and (e) water, wherein the polishing composition has a pH of about 3 to about 8.5. The invention further provides a method of chemically-mechanically polishing a substrate with the inventive chemical-mechanical polishing composition. Typically, the substrate contains cobalt.