Larry S Wong

US Patent:

6368416, Apr 9, 2002

Filed:

Jul 1, 1999

Appl. No.:

09/345398

Inventors:

Larry Ping-Kwan Wong - Fremont CA

Assignee:

Lam Research Corporation - Fremont CA

International Classification:

B08B 700

US Classification:

134 6, 134 9

Abstract:

A method for validating pre-process adjustments to a wafer cleaning system includes the operations of (a) making pre-process adjustments to a wafer cleaning system, (b) loading a substantially transparent wafer into the wafer cleaning system, and (c) observing the substantially transparent wafer as the substantially transparent wafer moves along a wafer transfer path in the wafer cleaning system. In the event undesirable contact between the substantially transparent wafer and components of the wafer cleaning system is observed, the method further includes (d) making adjustments to the wafer cleaning system formulated to avoid undesirable contact between semiconductor wafers to be processed and components of the wafer cleaning system, and (e) repeating operations (b) through (d) until the substantially transparent wafer moves along the wafer transfer path without undesirable contact with components of the wafer cleaning system. The method also may include observing the substantially transparent wafer to confirm that liquid sprayed from below the wafer during rinsing operations properly contacts the bottom side of the wafer.

US Patent:

6406273, Jun 18, 2002

Filed:

May 18, 2001

Appl. No.:

09/860724

Inventors:

Larry Ping-Kwan Wong - Fremont CA

Assignee:

Lam Research Corporation - Fremont CA

International Classification:

F04B 4900

US Classification:

417279, 417280

Abstract:

A pressure booster and method for amplifying a water pressure that is supplied by a water facility is provided. The pressure booster is configured to be connected between the water facility and one or more semiconductor substrate cleaning systems. The pressure booster includes a pump having a pump input that connects to the water facility and a pump output that is configured to produce a fluctuating amplified water pressure that is greater than the water pressure that is supplied by the water facility. Further included is a pressure dampener having a dampener input for accepting the fluctuating amplified water pressure from the pump output. The pressure dampener is configured to partially reduce pressure fluctuations in the fluctuating amplified water pressure. The pressure dampener also has a dampener output. A pressure regulator having a regulator input for receiving the dampener output is also included as part of the pressure booster.

US Patent:

6419170, Jul 16, 2002

Filed:

Sep 23, 1999

Appl. No.:

09/401742

Inventors:

Larry Ping-Kwan Wong - Fremont CA

Assignee:

Lam Research Corporation - Fremont CA

International Classification:

B05B 1508

US Classification:

2395871, 239273, 239280, 2392805, 239281, 2395872, 239589

Abstract:

A nozzle assembly includes a connector tube having a first end and a second end. An outer surface of the connector tube is threaded. A first cap having an opening therethrough is threaded onto the first end of the connector tube. A second cap having an opening therethrough is threaded onto the second end of the connector tube. Each of the first and second caps has a top surface and a threaded inner surface. The nozzle assembly further includes a nozzle having a tubular portion defining a channel. The tubular portion is disposed in the opening of the first connector cap so that a position of the nozzle can be axially and rotationally adjusted. A spin, rinse, and dry station including the adjustable nozzle assembly and a method for spin rinsing the bottom side, i. e. , the backside, of a semiconductor wafer also are described.

US Patent:

6685440, Feb 3, 2004

Filed:

May 7, 2002

Appl. No.:

10/141563

Inventors:

Larry Ping-Kwan Wong - Fremont CA

Assignee:

Lam Research Corporation - Fremont CA

International Classification:

F04B 4900

US Classification:

417279, 417280

Abstract:

A pressure booster and method for amplifying a water pressure that is supplied by a water facility is provided. The pressure booster is configured to be connected between the water facility and one or more semiconductor substrate cleaning systems. The pressure booster includes a pump having a pump input that connects to the water facility and a pump output that is configured to produce a fluctuating amplified water pressure that is greater than the water pressure that is supplied by the water facility. Further included is a pressure dampener having a dampener input for accepting the fluctuating amplified water pressure from the pump output. The pressure dampener is configured to partially reduce pressure fluctuations in the fluctuating amplified water pressure. The pressure dampener also has a dampener output. A pressure regulator having a regulator input for receiving the dampener output is also included as part of the pressure booster.

US Patent:

6786224, Sep 7, 2004

Filed:

May 30, 2002

Appl. No.:

10/160626

Inventors:

Larry Ping-Kwan Wong - Fremont CA

Assignee:

Lam Research Corporation - Fremont CA

International Classification:

B08B 302

US Classification:

134148, 134157, 134198, 134902

Abstract:

A nozzle assembly includes a connector tube having a first end and a second end. An outer surface of the connector tube is threaded. A first cap having an opening therethrough is threaded onto the first end of the connector tube. A second cap having an opening therethrough is threaded onto the second end of the connector tube. Each of the first and second caps has a top surface and a threaded inner surface. The nozzle assembly further includes a nozzle having a tubular portion defining a channel. The tubular portion is disposed in the opening of the first connector cap so that a position of the nozzle can be axially and rotationally adjusted. A spin, rinse, and dry station including the adjustable nozzle assembly and a method for spin rinsing the bottom side, i. e. , the backside, of a semiconductor wafer also are described.

US Patent:

55545548, Sep 10, 1996

Filed:

Feb 18, 1994

Appl. No.:

8/198698

Inventors:

Bamdad Bastani - Danville CA
Larry Wong - Hillsboro OR

Assignee:

National Semiconductor Corporation - Santa Clara CA

International Classification:

H01L 218244

US Classification:

437 47

Abstract:

The present invention provides a method of forming a first load having a first resistance level and a second load having a second resistance level in a common layer of polysilicon. In accordance with the method, a layer of polysilicon having a first resistance level is formed on a semiconductor circuit structure. A mask is then formed on the polysilicon layer to define areas of the polysilicon to be implanted with a dopant. The dopant is then implanted into the defined areas of the polysilicon to modify these areas to have a second resistance level. Selected areas of the polysilicon layer are then etched away to form first load regions having the first resistance level and second load regions having the second resistance level.

US Patent:

62671421, Jul 31, 2001

Filed:

Jun 25, 1999

Appl. No.:

9/344674

Inventors:

Larry Ping-Kwan Wong - Fremont CA
John Martin deLarios - Palo Alto CA

Assignee:

Lam Research Corporation - Fremont CA

International Classification:

B08B 300

US Classification:

137605

Abstract:

A solution delivery system for use with a wafer preparation system is provided. The solution deliver system includes a de-ionized water (DIW) dispense drawer having an input for receiving an initial flow of DIW from a facility water supply. The DIW dispense drawer further includes a first pressure regulator for stabilizing the initial flow of DIW and producing a substantially steady flow of DIW as a DIW output of the DIW dispense drawer. A chemical drawer is also provided as part of the solution delivery system. The chemical drawer is configured to receive the substantially steady flow of DIW from the DIW dispense drawer. The chemical drawer is further configured to receive an initial flow of chemicals from a chemical source. The chemical drawer also includes a second pressure regulator for stabilizing the initial flow of chemicals from the chemical source and thus producing a substantially steady flow of chemicals. In this example, the chemical drawer further includes a mix manifold for mixing the substantially steady flow of DIW received from the DIW dispense drawer and the substantially steady flow of chemicals.

US Patent:

62479032, Jun 19, 2001

Filed:

Mar 26, 1999

Appl. No.:

9/277712

Inventors:

Larry Ping-Kwan Wong - Fremont CA

Assignee:

Lam Research Corporation - Fremont CA

International Classification:

F04B 4900

US Classification:

417279

Abstract:

A pressure booster and method for amplifying a water pressure that is supplied by water facility is provided. The pressure booster is configured to be connected between he water facility and one or more semiconductor substrate cleaning systems. The pressure booster includes a pump having a pump input that connects to the water facility and a pump output that is configured to produce a fluctuating amplified water pressure that is greater than the water pressure that is supplied by the water facility. Further included is a pressure dampener having a dampener input for accepting the fluctuating amplified water pressure from the pump output. The pressure dampener is configured to partially reduce pressure fluctuations in the fluctuating amplified water pressure. The pressure dampener also has a dampener output. A pressure regulator having a regulator input for receiving the dampener output is also included as part of the pressure booster.