Li Chen

Address:

13215 Emily Rd, Dallas, TX 75240

VIN:

1NXBR32E27Z768960

Make:

TOYOTA

Model:

COROLLA

Year:

2007

US Patent:

6720255, Apr 13, 2004

Filed:

Dec 12, 2002

Appl. No.:

10/318309

Inventors:

Richard A. Faust - Dallas TX
Noel M. Russell - Plano TX
Li Chen - Austin TX

Assignee:

Texas Instruments Incorporated - Dallas TX

International Classification:

H01L 214763

US Classification:

438637, 438765, 438798

Abstract:

A method ( ) of fabricating an electronic device ( ) formed on a semiconductor wafer. The method forms a dielectric layer ( ) in a fixed position relative to the wafer, where the dielectric layer comprises an atomic concentration of each of silicon, carbon, and oxygen. After the forming step, the method exposes ( ) the electronic device to a plasma such that the atomic concentration of carbon in a portion of the dielectric layer is increased and the atomic concentration of oxygen in a portion of the dielectric layer is decreased. After the exposing step, the method forms a barrier layer ( ) adjacent at least a portion of the dielectric layer.

US Patent:

20080153393, Jun 26, 2008

Filed:

Mar 12, 2007

Appl. No.:

11/716804

Inventors:

Linlin Chen - Plano TX, US
Li Chen - Dallas TX, US
Satyavolu Srinivas Papa Rao - Garland TX, US

International Classification:

B24B 1/00

US Classification:

451 37

Abstract:

A method for serially polishing a plurality of semiconductor wafers, wherein a CMP apparatus having a first polishing pad and a second polishing pad is provided. A first slurry composition is disposed between the first polishing pad and a first wafer when the first wafer is in a first state, and a first polishing on the first wafer via the first polishing pad and first slurry composition is commenced at a first commencement time. A second slurry composition is disposed between the second polishing pad and a second wafer when the second wafer is in a second state, and a second polishing on the second wafer via the second polishing pad and second slurry is commenced at a second commencement time, wherein the second commencement time differs from the first commencement time by a first intermediate period. One or more of the first wafer and the second wafer is rinsed with a pre-rinse agent for at least a portion of the first intermediate period. The first polishing and second polishing are halted at substantially the same end time, therein placing the first wafer in the second state and the second wafer in a third state.

US Patent:

20100009622, Jan 14, 2010

Filed:

Nov 2, 2007

Appl. No.:

12/446906

Inventors:

Li Chen - Dallas TX, US

International Classification:

H04H 20/71
H04M 1/00

US Classification:

455 301, 4555501

Abstract:

A system and method for ordering broadcast content using associated metadata. Metadata, which has been added to the broadcast transmission or otherwise transmitted is separated and transmitted to a personal communication device, preferably from the broadcast transmission receiver over a short-range radio frequency channel. The PCD uses the metadata to order the content from a content provider over a communications network and, if necessary, execute payment. The contact is then downloaded for storage and later use.

US Patent:

20140158536, Jun 12, 2014

Filed:

Nov 13, 2013

Appl. No.:

14/079455

Inventors:

- Center City MN, US
Chunze Lai - Kendall Park NJ, US
Li Chen - Dallas TX, US

Assignee:

United Science LLC - Center City MN

International Classification:

G01N 27/333
H01B 7/00

US Classification:

204406, 204416, 204413, 174 28

Abstract:

In the present invention, the solid contacted ISE and the solid contacted reference are based on a conductive porous network with a solid contact and membrane disposed thereon. The porous networks are not only mechanically stable, but also provide pore structure for the solid contact and membrane to intercalate, which enhances the life time and stability of the sensors. The invention further incorporates a unique fluidic fitting sensor and sealing mechanism so that measurements can be taken at high pressures. The fitting design has many benefits, such as low cost and disposability, which allows them to be mass manufactured. These sensors can be produced for detection of many different kinds of ions by applying different types of ion selective membranes, including polyvinylchloride (PVC) based ion-selective membranes and fluorous matrixes based ion-selective membranes.