Li Bin Cui

US Patent:

20210397093, Dec 23, 2021

Filed:

Jul 8, 2021

Appl. No.:

17/370541

Inventors:

- Marlborough MA, US
Li Cui - Westborough MA, US
Shintaro Yamada - Shrewsbury MA, US
Paul J. LaBeaume - Auburn MA, US
Suzanne M. Coley - Mansfield MA, US
James F. Cameron - Brookline MA, US
Daniel Greene - Pendleton KY, US

International Classification:

G03F 7/11
C08F 230/08
G03F 7/16
G03F 7/32
G03F 7/20
G03F 7/42
G03F 7/075

Abstract:

Methods of manufacturing electronic devices employing wet-strippable underlayer compositions comprising a condensate and/or hydrolyzate of a polymer comprising as polymerized units one or more first unsaturated monomers having a condensable silicon-containing moiety, wherein the condensable silicon-containing moiety is pendent to the polymer backbone, and one or more condensable silicon monomers are provided.

US Patent:

20210341840, Nov 4, 2021

Filed:

Apr 15, 2021

Appl. No.:

17/231417

Inventors:

- Marlborough MA, US
James F. Cameron - Brookline MA, US
Shintaro YAMADA - Shrewsbury MA, US
Keren ZHANG - Kirkland WA, US
Suzanne M. Coley - Mansfield MA, US
Li Cui - Westborough MA, US
Paul J. LaBeaume - Auburn MA, US
Deyan Wang - Hudson MA, US

International Classification:

G03F 7/11
G03F 7/09
G03F 7/075
G03F 7/20
G03F 7/16
C09D 7/47
C09D 7/63
C09D 4/06

Abstract:

Coating compositions comprise: a curable compound comprising: a core chosen from a Ccarbocyclic aromatic ring, a Cheterocyclic aromatic ring, a Cfused carbocyclic aromatic ring system, a Cfused heterocyclic aromatic ring system, Caliphatic, and Ccycloaliphatic, and three or more substituents of formula (1)wherein at least two substituents of formula (1) are attached to the aromatic core; and wherein: Aris chosen from a Ccarbocyclic aromatic ring, a Cheterocyclic aromatic ring, a Cfused carbocyclic aromatic ring system, and a Cfused heteroocyclic aromatic ring system; Z is a substituent independently chosen from OR, protected hydroxyl, carboxyl, protected carboxyl, SR, protected thiol, —O—C(═O)—Calkyl, halogen, and NHR; wherein each Ris independently chosen from H, Calkyl, Cunsaturated hydrocarbyl, and Caryl; each Ris independently chosen from H, Calkyl, Cunsaturated hydrocarbyl, Caryl, C(═O)—R, and S(═O)—R; x is an integer from 1 to the total number of available aromatic ring atoms in Ar; and * denotes the point of attachment to the core; provided that no substituents of formula (1) are in an ortho position to each other on the same aromatic ring of the core; a polymer; and one or more solvents, wherein the total solvent content is from 50 to 99 wt % based on the coating composition. Coated substrates formed with the coating compositions and methods of forming electronic devices using the compositions are also provided. The compositions, coated substrates and methods find particular applicability in the manufacture of semiconductor devices.

US Patent:

20210343522, Nov 4, 2021

Filed:

Apr 15, 2021

Appl. No.:

17/231339

Inventors:

- Marlborough MA, US
James F. CAMERON - Brookline MA, US
Shintaro YAMADA - Shrewsbury MA, US
Li CUI - Westborough MA, US

International Classification:

H01L 21/027
C09D 163/00
G03F 7/11
G03F 7/00
G03F 7/09
G03F 7/075

Abstract:

Coating compositions comprise: a B-staged reaction product of one or more compounds comprising: a core chosen from Ccarbocyclic aromatic, Cheterocyclic aromatic, Caliphatic, Cheteroaliphatic, Ccycloaliphatic, and Cheterocycloaliphatic, each of which may be substituted or unsubstituted; and two or more substituents of formula (1) attached to the core:wherein: Aris an aromatic group independently chosen from Ccarbocyclic aromatic and Cheteroaromatic, each of which may be substituted or unsubstituted; Z is a substituent independently chosen from OR, protected hydroxyl, carboxyl, protected carboxyl, SR, protected thiol, —O—C(═O)—Calkyl, halogen, and NHR; wherein each Ris independently chosen from H, Calkyl, Cunsaturated hydrocarbyl, and Caryl; each Ris independently chosen from H, Calkyl, Cunsaturated hydrocarbyl, Caryl, C(═O)—R, and S(═O)—R; x is an integer from 1 to the total number of available aromatic ring atoms in Ar; and * denotes the point of attachment to the core; provided that when the core comprises an aromatic ring, no substituents of formula (1) are in an ortho position to each other on the same aromatic ring of the core; and one or more solvents, wherein the total solvent content is from 50 to 99 wt % based on the coating composition. Coated substrates formed with the coating compositions and methods of forming electronic devices using the compositions are also provided. The compositions, coated substrates and methods find particular applicability in the manufacture of semiconductor devices.

US Patent:

20210247695, Aug 12, 2021

Filed:

Apr 30, 2021

Appl. No.:

17/245326

Inventors:

- Marlborough MA, US
James F. Cameron - Brookline MA, US
Shintaro Yamada - Shrewsbury MA, US
Keren Zhang - Kirkland WA, US
Daniel Greene - Louisville KY, US
Paul J. LaBeaume - Auburn MA, US
Li Cui - Westborough MA, US
Suzanne M. Coley - Mansfield MA, US

International Classification:

G03F 7/11
C09D 5/00
G03F 7/075

Abstract:

Compounds having three or more alkynyl moieties substituted with an aromatic moiety having one or more of certain substituents are useful in forming underlayers useful in semiconductor manufacturing processes.

US Patent:

20200348592, Nov 5, 2020

Filed:

Aug 2, 2019

Appl. No.:

16/530273

Inventors:

- Marlborough MA, US
Ke Yang - Natick MA, US
Keren Zhang - Shrewsbury MA, US
James F. Cameron - Brookline MA, US
Li Cui - Westborough MA, US
Emad Aqad - Northborough MA, US
Shintaro Yamada - Shrewsbury MA, US
Paul J. LaBeaume - Auburn MA, US

International Classification:

G03F 7/075
G03F 7/09
C08L 25/18

Abstract:

A resist underlayer composition including a polyarylene ether, an additive polymer that is different from the polyarylene ether, and a solvent, wherein the additive polymer includes an aromatic or heteroaromatic group having at least one protected or free functional group selected from hydroxy, thiol, and amino.

US Patent:

20200142309, May 7, 2020

Filed:

Oct 10, 2019

Appl. No.:

16/598264

Inventors:

- Marlborough MA, US
James F. Cameron - Brookline MA, US
Shintaro Yamada - Shrewsbury MA, US
Keren Zhang - Shrewsbury MA, US
Daniel Greene - Louisville KY, US
Paul J. LaBeaume - Auburn MA, US
Li Cui - Westborough MA, US
Suzanne M. Coley - Mansfield MA, US

International Classification:

G03F 7/11
G03F 7/075
G03F 7/09
G03F 7/20

Abstract:

Compounds having three or more alkynyl moieties substituted with an aromatic moiety having one or more of certain substituents are useful in forming underlayers useful in semiconductor manufacturing processes.

US Patent:

20190146343, May 16, 2019

Filed:

Sep 18, 2018

Appl. No.:

16/133739

Inventors:

- Marlborough MA, US
Li Cui - Westborough MA, US
Shintaro Yamada - Shrewsbury MA, US
Paul J. LaBeaume - Auburn MA, US
Suzanne M. Coley - Mansfield MA, US
James F. Cameron - Brookline MA, US
Daniel Greene - Shrewsbury MA, US

International Classification:

G03F 7/11
C09D 143/04
C08F 230/08
G03F 7/16
G03F 7/32
G03F 7/20
G03F 7/42

Abstract:

Methods of manufacturing electronic devices employing wet-strippable underlayer compositions comprising a condensate and/or hydrolyzate of a polymer comprising as polymerized units one or more first unsaturated monomers having a condensable silicon-containing moiety, wherein the condensable silicon-containing moiety is pendent to the polymer backbone, and one or more condensable silicon monomers are provided.

US Patent:

20180158674, Jun 7, 2018

Filed:

Nov 2, 2017

Appl. No.:

15/802089

Inventors:

- Marlborough MA, US
Li Cui - Westborough MA, US
Christopher Gilmore - Natick MA, US
Joshua A. Kaitz - Watertown MA, US
Sheng Liu - Bow NH, US
James F. Cameron - Brookline MA, US
Suzanne M. Coley - Mansfield MA, US

International Classification:

H01L 21/027
G03F 7/11
C09D 171/00

Abstract:

Aromatic resin polymers and compositions containing them are useful as underlayers in semiconductor manufacturing processes.