Lynn M Yang

US Patent:

20200020512, Jan 16, 2020

Filed:

Jul 13, 2018

Appl. No.:

16/035431

Inventors:

- Santa Clara CA, US
Lynn YANG - Santa Clara CA, US
Christy PAN - Santa Clara CA, US
Beom Soo PARK - San Jose CA, US
Young-Jin CHOI - San Jose CA, US
Max CHANG - Santa Clara CA, US

International Classification:

H01J 37/32
C23C 16/44
C23C 16/50
B08B 7/00

Abstract:

A method and apparatus for obtaining at least one normalized baseline spectrum for a processing volume of a processing chamber; calculating a distribution value of the normalized baseline spectrum; obtaining a plurality of normalized cleaning process spectrums; calculating a distribution function of the plurality of normalized cleaning process spectrums; comparing the distribution value to the distribution function; and determining an end point by identifying when the distribution function approaches the distribution value. A method includes: initiating a cleaning process in a processing chamber, flowing a cleaning gas into a processing volume of the processing chamber; obtaining a normalized baseline spectrum; measuring a plurality of intensity spectrums; calculate a plurality of normalized cleaning process spectrums; comparing a distribution value of the normalized baseline spectrum to a distribution function of the plurality of normalized cleaning process spectrums; and determining an end point by identifying when the distribution function approaches the distribution value.