Mark Jude Leclerc

US Patent:

6522433, Feb 18, 2003

Filed:

Apr 4, 2001

Appl. No.:

09/826470

Inventors:

Adam F. Kelsey - Waltham MA
Mark A. Leclerc - Epping NH
Daniel P. Resler - Carlisle MA

Assignee:

Optical Switch Corporation - Richardson TX

International Classification:

G03H 100

US Classification:

359 34, 359 35, 359577, 359900, 385125

Abstract:

A method and apparatus for interference lithography utilize a fiber having a cladding region with axially formed holes surrounding a core region. The fiber emits an optical signal to perform interference lithography. A number of alternative variations in the size and arrangement of axially formed holes produces fibers having characteristics particularly adapted for receiving, communicating, and emitting optical signals for interference lithography.

US Patent:

6556280, Apr 29, 2003

Filed:

Sep 19, 2000

Appl. No.:

09/665540

Inventors:

Adam F. Kelsey - Waltham MA
Mark A. Leclerc - Epping NH

Assignee:

Optical Switch Corporation - Richardson TX

International Classification:

G03B 2772

US Classification:

355 71, 355 67, 355 53, 355 55, 355 77, 356399, 356400, 356401, 356484, 359485, 359486, 359577, 430 4, 430396

Abstract:

A lithographic tool system for generating an interferometric pattern of light using a plurality of exposure beams includes a processor coupled to a positioning device. The processor receives a selected period for the interferometric pattern of light, and generates an angular control signal and a translational control signal in response to the selected period. The positioning device translates an exposure beam in response to the translational control signal, and rotates the exposure beam in response to the angular control signal.

US Patent:

20020149757, Oct 17, 2002

Filed:

Apr 4, 2001

Appl. No.:

09/826445

Inventors:

Adam Kelsey - Waltham MA, US
Mark Leclerc - Epping NH, US
Bruce MacLeod - Pepperell MA, US

Assignee:

Optical Switch Corporation

International Classification:

G03B027/72

US Classification:

355/071000

Abstract:

A polarization vector alignment technique for interference lithography generates a control signal indicating a difference in orientation between a polarization state of an emitted optical signal and a desired linear polarization vector. The technique adjusts the linear polarization vector to enhance the quality of the pattern produced for interference lithography.