Mark A Mccord

US Patent:

6586736, Jul 1, 2003

Filed:

Sep 10, 1999

Appl. No.:

09/394133

Inventors:

Mark A. McCord - Mountain View CA

Assignee:

KLA-Tencor, Corporation - San Jose CA

International Classification:

H01J 37147

US Classification:

250310, 250396 R, 250397

Abstract:

A method and apparatus for generating an image of a sample with a electron beam apparatus is disclosed. The image is generated from a portion of the sample with a measurement device having a source unit for directing an electron beam substantially towards the sample. The measurement device also has a detector for detecting particles that are emitted from the sample, an electrode proximal to the sample having a hole through which the electron beam and a portion of the emitted particles may pass, and an image generator for generating the image of the sample from the detected particles. A first voltage is applied to the electrode when the electron beam is substantially in a center of the hole. The first voltage is selected to control positive charge build up on the sample. A second voltage is applied to the electrode when the electron beam is deflected a predetermined distance from the center of the hole.

US Patent:

6597006, Jul 22, 2003

Filed:

Oct 9, 2001

Appl. No.:

09/974560

Inventors:

Mark McCord - Mountain View CA
Jun Pei - Campbell CA

Assignee:

KLA-Tencor Technologies Corp. - Milpitas CA

International Classification:

G01N 2186

US Classification:

25055919, 25055929, 3562372

Abstract:

Systems and methods for determining the height of a surface of a specimen, such as a surface of a semiconductor device wafer are provided. A system may be configured to generate a comparison signal that may used to alter a Z-axis fine height adjustment of the system. The system may include for example, a processing tool, a metrology tool, or an inspection tool that may be used in semiconductor device fabrication. In this manner, the system may be configured to maintain a constant working distance between the wafer surface and an optical column of the system. A system may include an off-axis dual beam symmetric height sensor due to mechanical constraints of the system. The dual beam symmetric height sensor may provide automatic focusing of the wafer with high precision by substantially eliminating wafer pattern-induced error in comparison signals generated by the system.

US Patent:

6627884, Sep 30, 2003

Filed:

Jul 23, 2001

Appl. No.:

09/912732

Inventors:

Mark A. McCord - Mountain View CA
David Walker - Sunol CA
Jun Pei - Campbell CA
Neil Richardson - Palo Alto CA

Assignee:

KLA-Tencor Technologies Corporation - Milpitas CA

International Classification:

G21K 700

US Classification:

250306, 250305, 250302, 250310, 250251, 378 84, 378 85

Abstract:

Disclosed are methods and apparatus for simultaneously flooding a sample (e. g. , a semiconductor wafer) to control charge and inspecting the sample. The apparatus includes a charged particle beam generator arranged to generate a charged particle beam substantially towards a first portion of the sample and a flood gun for generating a second beam towards a second portion of the sample. The second beam is generated substantially simultaneously with the inspection beam. The apparatus further includes a detector arranged to detect charged particles originating from the sample portion. In a further implementation, the apparatus further includes an image generator for generating an image of the first portion of the sample from the detected particles. In one embodiment, the sample is a semiconductor wafer. In a method aspect, a first area of a sample is flooded with a flood beam to control charge on a surface of the sample.

US Patent:

6664546, Dec 16, 2003

Filed:

Feb 10, 2000

Appl. No.:

09/502554

Inventors:

Mark A. McCord - Mountain View CA
Jan Lauber - Menlo Park CA
Jun Pei - Campbell CA
Jorge P. Fernandez - San Mateo CA

Assignee:

KLA-Tencor - San Jose CA

International Classification:

H01J 3721

US Classification:

250397, 250306, 250310

Abstract:

Disclosed is a method and apparatus for generating an image from a sample. The apparatus includes a charged particle beam generator arranged to generate and control a charged particle beam substantially towards a portion of the sample and a detector arranged to detect charged particles originating from the sample portion to allow generation of an image from the detected charged particles. The apparatus further includes a measurement device arranged to measure a characteristic of the sample portion to obtain a surface voltage value of the sample portion that is exposed to the charged particle beam. For example, the measurement device is an electrostatic voltmeter positioned to obtain a surface voltage value of the exposed sample portion. A charged particle beam is directed substantially towards a portion of the sample under a first set of operating conditions. A surface charge value of the sample portion is obtained under the first set of operating conditions.

US Patent:

6774646, Aug 10, 2004

Filed:

Jan 28, 2002

Appl. No.:

10/058614

Inventors:

Liqun Han - Santa Clara CA
Mark A. McCord - Mountain View CA

Assignee:

KLA-Tencor Corporation - San Jose CA

International Classification:

G01R 3100

US Classification:

324751, 324750

Abstract:

A method for inspecting samples uses a multiple beam electron system having a uniform magnetic focusing field. Deflection of the incident electron beams is produced by deflector plates generating an electrostatic deflection force which produces a uniform force on the electron beams. Thermal field emission sources generate incident electron beams towards at least two portions of the sample. A detector array collects multiple detection electrons.

US Patent:

7660687, Feb 9, 2010

Filed:

May 25, 2006

Appl. No.:

11/420243

Inventors:

Indranil De - Mountain View CA, US
Mark A. McCord - Los Gatos CA, US
David L. Adler - San Jose CA, US

Assignee:

KLA-Tencor Corporation - Milpitas CA

International Classification:

G01D 18/00
G06F 17/40
G06F 19/00

US Classification:

702 85, 73 101, 73 188, 738661, 250306, 250310, 2504911, 2504922, 2504923, 378 70, 378 86, 378 87, 378204, 378207, 382100, 382141, 382145, 382168, 382169, 382170, 438 14, 438 17, 702 1, 702 33, 702 35, 702 40, 702 86, 702 87, 702 88, 702107, 702127, 702187, 702189

Abstract:

A method of increasing consistency between separate parametric measurement readings that are taken with an electron beam imaging tool at different times within a period of time, by correcting drift in the imaging tool at a time frequency that is less than a time period during which the drift is anticipated to be undesirably large.

US Patent:

8106355, Jan 31, 2012

Filed:

Jun 27, 2008

Appl. No.:

12/163708

Inventors:

Jan Lauber - San Francisco CA, US
Mark A. McCord - Los Gatos CA, US

Assignee:

KLA-Tencor Corporation - Milpitas CA

International Classification:

G21K 7/00

US Classification:

250307, 250306, 250310, 250311, 25044011, 2504923

Abstract:

One embodiment relates to an apparatus for automated inspection of a semiconductor substrate. Processor-executable code is configured to control the stage electronics to move the substrate using a continuous motion in a substrate-translation direction and is configured to control the beam to scan it across the surface of the substrate and collect corresponding image data, scan lines of the scan being along a scan-line direction perpendicular to the substrate-translation direction. Processor-executable code is also configured to select from the image data two cells of the repeating pattern on the surface of the substrate, the two cells being displaced from each other by one or multiple cell heights in the scan-line direction. Finally, processor-executable code is configured to generate a difference image by subtracting image data from said two cells on a pixel-by-pixel basis. Other embodiments, aspects and features are also disclosed.

US Patent:

8253119, Aug 28, 2012

Filed:

Jul 27, 2009

Appl. No.:

12/510049

Inventors:

Alan D. Brodie - Palo Alto CA, US
Paul Petric - Pleasanton CA, US
Mark A. McCord - Los Gatos CA, US

Assignee:

KLA-Tencor Corporation - Milpitas CA

International Classification:

G01N 23/00
G21K 1/02
G21K 1/08

US Classification:

25049222, 2504922, 2504921, 2504923, 250306, 250396 R, 716 54

Abstract:

One embodiment relates to an apparatus of a dynamic pattern generator for reflection electron beam lithography. The apparatus includes a plurality of base electrodes in a two-dimensional array, an insulating border surrounding each base electrode so as to electrically isolate the base electrodes from each other; and a sidewall surrounding each base electrode. The sidewall comprises a plurality of stacked electrodes which are separated by insulating layers. In addition, the base electrodes are advantageously shaped so as to be concave. Furthermore, a conformal coating may be advantageously applied over the base electrodes and sidewalls. Another embodiment relates to an apparatus for reflection electron beam lithography. The apparatus includes a shadow mask configured to form an array of incident electron beamlets. The shadow mask comprises an array of holes which correspond one-to-one with an array of pixel pads of an electron reflective patterned structure.