Mark Theodore Merrill

US Patent:

20040257284, Dec 23, 2004

Filed:

Jun 23, 2003

Appl. No.:

10/606949

Inventors:

Patrick Rada - San Jose CA, US
Mark Merrill - Atherton CA, US

Assignee:

NetGear Inc. - Santa Clara CA

International Classification:

H01Q001/24

US Classification:

343/702000

Abstract:

Disclosed is a wireless node with a detachable antenna. When the antenna is detached, 802.11a lower band communications are disabled. When the antenna is attached, 802.11a lower band communications are enabled.

US Patent:

20210327689, Oct 21, 2021

Filed:

Jun 30, 2021

Appl. No.:

17/363870

Inventors:

- Fremont CA, US
Neema Rastgar - San Jose CA, US
Alexander Miller Paterson - San Jose CA, US
Mark Merrill - Fremont CA, US

International Classification:

H01J 37/32
H01L 21/67

Abstract:

A substrate processing system includes a processing chamber including a substrate support to support a substrate. A coil includes at least one terminal. An RF source configured to supply RF power to the coil. A dielectric window is arranged on one surface of the processing chamber adjacent to the coil. A contamination reducer includes a first plate that is arranged between the at least one terminal of the coil and the dielectric window.

US Patent:

20210151290, May 20, 2021

Filed:

Jan 29, 2021

Appl. No.:

17/163248

Inventors:

- Fremont CA, US
Shuogang Huang - Fremont CA, US
Zhimin Wan - Fremont CA, US
Mark Merrill - Fremont CA, US

International Classification:

H01J 37/305
H01L 21/67
H01L 21/687
H01L 21/3065
H01J 37/32

Abstract:

Methods and apparatuses for providing an anisotropic ion beam for etching and treatment of substrate are discussed. In one embodiment, a system for processing a substrate includes a chamber, a chuck assembly, an ion source, and a grid system. The ion source includes grid system interfaces both the chamber and the ion source and includes a plurality of holes through which ions are extracted from the ion source to form an ion beam. The grid system is oriented so the ion beam is directed into the chamber toward the substrate support, and the array of holes of the grid system is defined vertically by a y-axis and horizontally by an x-axis, The array of holes is defined by hole densities that vary vertically in the y-axis such that the ion beam is caused to have an energy density gradient that is defined vertically in the y-axis.

US Patent:

20190181899, Jun 13, 2019

Filed:

Feb 15, 2019

Appl. No.:

16/277648

Inventors:

- San Jose CA, US
Mark G. Merrill - Atherton CA, US
Peiman AMINI - Mountain View CA, US

International Classification:

H04B 1/18
H04B 1/48
H03H 11/34
H03H 11/12

Abstract:

Various embodiments are described herein that improve the signal reception and transmission capabilities of an access point by coupling an active antenna assembly to the access point. An active antenna assembly includes an antenna and at least one active component, such as a low-noise amplifier or a power amplifier. The active component can be connected to an antenna circuit board rather than the main circuit board of the access point, which is typically retained within an access point housing. By positioning the active component near the antenna, the active antenna assembly prevents degradation of signals received by the antenna. One or more coaxial cables can be used to connect the active component of the active antenna assembly to the main circuit board of the access point.

US Patent:

20190148109, May 16, 2019

Filed:

Nov 10, 2017

Appl. No.:

15/809957

Inventors:

- Fremont CA, US
Shuogang Huang - Fremont CA, US
Zhimin Wan - Fremont CA, US
Mark Merrill - Fremont CA, US

International Classification:

H01J 37/305
H01L 21/67
H01L 21/687
H01L 21/3065
H01L 21/66
H01J 37/32
H01J 37/20

Abstract:

Methods and apparatuses for providing an anisotropic ion beam for etching and treatment of substrate are discussed. In one embodiment, a system for processing a substrate includes a chamber, a chuck assembly, an ion source, and a grid system. The ion source includes grid system interfaces both the chamber and the ion source and includes a plurality of holes through which ions are extracted from the ion source to form an ion beam. The size of the plurality holes varies along an axis such that the ion density of the ion beam also varies along the axis. The density of the plurality of holes varies along an axis such that the ion density of the ion beam also varies along the axis. In some embodiments, the energies of a beamlet or multiple beamlets may be individual defined to adjust beam energy density.

US Patent:

20170094671, Mar 30, 2017

Filed:

Sep 8, 2016

Appl. No.:

15/260102

Inventors:

- San Jose CA, US
Mark G. Merrill - Atherton CA, US
Peiman AMINI - Mountain View CA, US

International Classification:

H04W 72/08
H04W 72/04
H04W 76/02

Abstract:

Various embodiments are described herein that improve the signal reception and transmission capabilities of an access point by coupling an active antenna assembly to the access point. An active antenna assembly includes an antenna and at least one active component, such as a low-noise amplifier or a power amplifier. The active component can be connected to an antenna circuit board rather than the main circuit board of the access point, which is typically retained within an access point housing. By positioning the active component near the antenna, the active antenna assembly prevents degradation of signals received by the antenna. One or more coaxial cables can be used to connect the active component of the active antenna assembly to the main circuit board of the access point.