Martin Z Garcia

Address:

4533 Cedar Spg Rd APT 407, Dallas, TX 75219

Phone:

(214)8508603

VIN:

JTMZF4DV9B5043020

Make:

TOYOTA

Model:

RAV4

Year:

2011

Address:

1512 Maple Dr, Garland, TX 75042

Phone:

(214)2275350

VIN:

1CAFH16227T046228

Make:

Chrysler

Model:

Town & Country 4dr SWB F

Year:

2007

US Patent:

7238623, Jul 3, 2007

Filed:

Oct 6, 2004

Appl. No.:

10/959269

Inventors:

Martin Garcia - McKinney TX, US

Assignee:

Texas Instruments Incorporated - Dallas TX

International Classification:

H01L 21/31

US Classification:

438758, 257E21001, 118715

Abstract:

The present invention provides a system () for aligning a dispensing apparatus () utilized within a semiconductor deposition chamber (). A stationary reference apparatus () is disposed along the bottom of the deposition chamber. A self-alignment support system (), comprising one or more support components (), is intercoupled between the dispensing apparatus and a deposition system exterior component (). The self-alignment support system is adapted to facilitate and secure repositioning of the dispensing apparatus responsive to pressure applied to the dispensing surface () thereof. A non-yielding offset component () is placed upon a first surface () of the stationary reference apparatus. The dispensing surface of the dispensing apparatus is engaged with the offset component, and pressure is applied to the dispensing apparatus via the offset component until a desired alignment is achieved.

US Patent:

8414734, Apr 9, 2013

Filed:

May 31, 2007

Appl. No.:

11/756361

Inventors:

Martin B. Garcia - Princeton TX, US

Assignee:

Texas Instruments Incorporated - Dallas TX

International Classification:

H01L 21/36
C23C 16/52
C23C 16/54

US Classification:

15634534, 118715, 118300, 118506, 15634533

Abstract:

The present invention provides a system () for aligning a dispensing apparatus () utilized within a semiconductor deposition chamber (). A stationary reference apparatus () is disposed along the bottom of the deposition chamber. A self-alignment support system (), comprising one or more support components (), is intercoupled between the dispensing apparatus and a deposition system exterior component (). The self-alignment support system is adapted to facilitate and secure repositioning of the dispensing apparatus responsive to pressure applied to the dispensing surface () thereof. A non-yielding offset component () is placed upon a first surface () of the stationary reference apparatus. The dispensing surface of the dispensing apparatus is engaged with the offset component, and pressure is applied to the dispensing apparatus via the offset component until a desired alignment is achieved.

US Patent:

20050036855, Feb 17, 2005

Filed:

Aug 13, 2003

Appl. No.:

10/640121

Inventors:

Martin Garcia - Allen TX, US

International Classification:

B65G049/07

US Classification:

414217000

Abstract:

According to one embodiment of the invention, a system for handling semiconductor wafers includes a chamber, a robot associated with the chamber, and a robot blade generally horizontally disposed within the chamber and coupled to the robot at a first end. The robot blade includes a second end distal the first end, in which the second end has a plan view profile that forms a continuously curved surface.

US Patent:

20130228125, Sep 5, 2013

Filed:

Apr 9, 2013

Appl. No.:

13/859605

Inventors:

Martin Garcia - McKinney TX, US

Assignee:

TEXAS INSTRUMENTS INCORPORATED - Dallas TX

International Classification:

H01L 21/02

US Classification:

118724, 29464

Abstract:

The present invention provides a system () for aligning a dispensing apparatus () utilized within a semiconductor deposition chamber (). A stationary reference apparatus () is disposed along the bottom of the deposition chamber. A self-alignment support system (), comprising one or more support components (), is intercoupled between the dispensing apparatus and a deposition system exterior component (). The self-alignment support system is adapted to facilitate and secure repositioning of the dispensing apparatus responsive to pressure applied to the dispensing surface () thereof. A non-yielding offset component () is placed upon a first surface () of the stationary reference apparatus. The dispensing surface of the dispensing apparatus is engaged with the offset component, and pressure is applied to the dispensing apparatus via the offset component until a desired alignment is achieved.

US Patent:

20170298498, Oct 19, 2017

Filed:

Jun 30, 2017

Appl. No.:

15/639230

Inventors:

- Dallas TX, US
Martin B. Garcia - Princeton TX, US

International Classification:

C23C 14/24
C23C 14/54

Abstract:

The present disclosure provides a system () for aligning a dispensing apparatus () utilized within a semiconductor deposition chamber (). A stationary reference apparatus () is disposed along the bottom of the deposition chamber. A self-alignment support system (), comprising one or more support components (), is intercoupled between the dispensing apparatus and a deposition system exterior component (). The self-alignment support system is adapted to facilitate and secure repositioning of the dispensing apparatus responsive to pressure applied to the dispensing surface () thereof. A non-yielding offset component () is placed upon a first surface () of the stationary reference apparatus. The dispensing surface of the dispensing apparatus is engaged with the offset component, and pressure is applied to the dispensing apparatus via the offset component until a desired alignment is achieved.