Meredith Williams

US Patent:

6133152, Oct 17, 2000

Filed:

May 16, 1997

Appl. No.:

8/880194

Inventors:

Benjamin Bierman - Milpitas CA
Meredith J. Williams - Santa Clara CA
David S. Ballance - Cupertino CA
Brian Haas - San Jose CA
Paul Deaton - San Jose CA
James V. Tietz - Fremont CA

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

H01L 21302

US Classification:

438706

Abstract:

An apparatus to isolate a rotating frame in a processing chamber, comprising: a support cylinder rotatably extending from the rotating frame; and a co-rotating edge ring extension extending from the support cylinder to at least one of substantially thermally, optically and mechanically isolate the region above the co-rotating edge ring extension from the region below the co-rotating edge ring extension.

US Patent:

60484039, Apr 11, 2000

Filed:

Apr 1, 1998

Appl. No.:

9/053286

Inventors:

Paul Deaton - San Jose CA
Meredith J. Williams - Santa Clara CA

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

C23C 1600
C23F 102

US Classification:

118725

Abstract:

A substrate support, for example an edge ring, includes an upper ledge for supporting a first substrate, such as a semiconductor wafer, during a first process, and a lower ledge contiguous with the upper ledge for supporting a second substrate during a second process for cleaning the substrate support. A method of processing substrates supported by the edge ring in a thermal process chamber is also disclosed.

US Patent:

59605553, Oct 5, 1999

Filed:

May 16, 1997

Appl. No.:

8/858091

Inventors:

Paul Deaton - San Jose CA
Benjamin Bierman - Milpitas CA
Meredith J. Williams - Santa Clara CA
Brian Haas - San Jose CA
David S. Ballance - Cupertino CA
James V. Tietz - Fremont CA

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

F26B 1118

US Classification:

34 58

Abstract:

An apparatus for purging the backside of a substrate in a process chamber includes a purge gas injector. The injector includes a substantially annular-shaped opening providing a slit that is structured and arranged to direct a flow of purge gas about radially outward therefrom in a direction approximately parallel to a plane defined by the substrate, wherein the substrate is supported in the process chamber above the purge gas injector. When the substrate is rotated at a sufficient speed, the purge gas flowing from the injector is impelled to flow spirally outward along the backside of the substrate.

US Patent:

61237663, Sep 26, 2000

Filed:

May 16, 1997

Appl. No.:

8/872123

Inventors:

Meredith J. Williams - Santa Clara CA
David S. Ballance - Cupertino CA
Benjamin Bierman - Milpitas CA
Paul Deaton - San Jose CA
Brian Haas - San Jose CA
Nobuyuki Takahashi - Santa Clara CA
James V. Tietz - Fremont CA

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

C30B 2516

US Classification:

117 85

Abstract:

A method for controlling the temperature of a substrate in a processing chamber. The processing chamber employs a heating control over at least two heating zones. Each heating zone is independently controllable according to a measured signal corresponding to the substrate temperature and a user-definable offset.

US Patent:

60351004, Mar 7, 2000

Filed:

May 16, 1997

Appl. No.:

8/858089

Inventors:

Benjamin Bierman - Milpitas CA
David S. Ballance - Cupertino CA
James V. Tietz - Fremont CA
Brian Haas - San Jose CA
Meredith J. Williams - Santa Clara CA
Paul Deaton - San Jose CA

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

H01L 2126
H01L 21324
F27B 508
F27B 514

US Classification:

392416

Abstract:

In one embodiment, the invention is directed to an apparatus for preventing depositions from occurring on a reflector in a processing chamber, comprising: a cover disposed adjacent to the reflector, the cover optically transparent over a range of wavelengths in which the reflector is reflective; and at least one cover support for maintaining the position of the cover relative to the reflector.