Michael M Albert

US Patent:

7084959, Aug 1, 2006

Filed:

May 27, 2004

Appl. No.:

10/854634

Inventors:

Michael M. Albert - Stamford CT, US

Assignee:

ASML Holding N.V. - Veldhoven

International Classification:

G03B 27/54
G03B 27/72
G01N 21/55

US Classification:

355 67, 355 71, 356447

Abstract:

A pulse stretcher includes a first prism and a second prism positioned opposite each other. A first coupling prism is optically coupled to the first prism with a partially reflective interface that directs a beam towards the second prism in a helical path. The first prism and the first coupling prism form a beamsplitter. A recirculating prism (or a reflective element) reflects the beam from the first prism into the second prism. Mirrors are positioned around the first and second prisms to permit recirculation of the beam through the first and second prisms. The beam recirculates through the first and second prisms using two or more helical paths. The pulse stretcher can be incorporated into a lithographic system.

US Patent:

7321605, Jan 22, 2008

Filed:

May 24, 2004

Appl. No.:

10/851247

Inventors:

Michael M. Albert - Stamford CT, US

Assignee:

ASML Holding, N.V. - Veldhoven

International Classification:

H01S 3/10
H01S 3/13
G03B 27/54

US Classification:

372 30, 372 25, 372700, 355 67

Abstract:

A pulse stretcher includes a single pass pulse stretcher. An optical system is arranged around the single pass pulse stretcher. A beam enters the single pass stretcher and is reflected in a helical path using the optical system for multiple passes through the single pass pulse stretcher. The single pass pulse stretcher can include two 90 prisms, with a beam splitter located therebetween. The optical system can include first and second prisms. At least one of the first and second prisms can be a roof prism. The first and second prisms can have at least one surface oriented so as to direct the beam into the helical path. The optical system can have at least one mirror, or a plurality of mirrors.

US Patent:

7324280, Jan 29, 2008

Filed:

May 25, 2004

Appl. No.:

10/852099

Inventors:

Michael M. Albert - Stamford CT, US

Assignee:

ASML Holding N.V. - Veldhoven

International Classification:

G02B 27/28

US Classification:

359489, 359497, 359501, 355 71

Abstract:

A polarization pattern assembly produces a polarization pattern. In an embodiment, a polarization pattern assembly includes a frame that supports a polarization pane in a central region of the frame. The polarization pane changes the polarization direction of light incident upon the polarization pane. Different polarization patterns in a pupil of a polarized illuminator can be generated.

US Patent:

7548370, Jun 16, 2009

Filed:

Jun 29, 2004

Appl. No.:

10/878040

Inventors:

Michael M. Albert - Stamford CT, US
Justin Kreuzer - Trumbull CT, US
Ronald A. Wilklow - Fairfield CT, US

Assignee:

ASML Holding N.V. - Veldhoven

International Classification:

G02B 27/28

US Classification:

359489, 359497, 359501

Abstract:

The present invention relates to an apparatus for polarizing an incident light beam. In embodiments, a tile wave plate assembly is provided. The tile wave plate includes a layered structure having a substrate plate and two layers of mosaic tiles. The layers of the apparatus are mechanically separated to form a controlled gap spacing. The mosaic tiles can be configured to form a pseudo or true zero order wave plate.

US Patent:

7609363, Oct 27, 2009

Filed:

Nov 21, 2007

Appl. No.:

11/944307

Inventors:

Michael M. Albert - Stamford CT, US

Assignee:

ASML Holding N.V. - Veldhoven

International Classification:

G03B 27/54
G03B 27/42

US Classification:

355 67, 355 53

Abstract:

A lithographic system and method using an illumination system, a single pass pulse stretcher, an optical system, a patterning device and a projection system. The optical system is arranged around the single pass pulse stretcher. A beam enters the single pass stretcher and is reflected in a helical path using the optical system for multiple passes through the single pass pulse stretcher. The single pass pulse stretcher can include two 90 prisms, with a beam splitter located therebetween. The optical system can include first and second prisms. At least one of the first and second prisms can be a roof prism. The first and second prisms can have at least one surface oriented so as to direct the beam into the helical path. The optical system can have at least one mirror, or a plurality of mirrors.

US Patent:

7697117, Apr 13, 2010

Filed:

Dec 20, 2007

Appl. No.:

11/961678

Inventors:

Michael M. Albert - Stamford CT, US

Assignee:

ASML Holding N.V. - Veldhoven

International Classification:

G03B 27/58

US Classification:

355 71, 355 67, 359489, 359497, 359501

Abstract:

A polarization pattern assembly produces a polarization pattern. In an embodiment, a polarization pattern assembly includes a frame that supports a polarization pane in a central region of the frame. The polarization pane changes the polarization direction of light incident upon the polarization pane. Different polarization patterns in a pupil of a polarized illuminator can be generated.

US Patent:

7916391, Mar 29, 2011

Filed:

Mar 4, 2005

Appl. No.:

11/569001

Inventors:

Michael Albert - Stamford CT, US
Damian Fiolka - Oberkochen, DE

Assignee:

Carl Zeiss SMT GmbH - Oberkochen
ASML Holding NV - Veldhoven

International Classification:

G02B 27/28

US Classification:

359489, 359497, 359501, 355 71

Abstract:

A polarization pattern assembly for use in an illuminator and an apparatus for providing at least one polarization pattern in a pupil of an illuminator for a lithography system are provided. A polarization pattern assembly for use in an illuminator having a pupil includes a frame () and at least one polarization pane () coupled to the frame (), the polarization pane () changing a direction of polarization of light passing therethrough, whereby at least one polarization pattern is obtained across the pupil of the illuminator, and wherein the polarization pane () includes an optically active material.