Michael A Demarco

US Patent:

6619903, Sep 16, 2003

Filed:

Aug 10, 2001

Appl. No.:

09/925722

Inventors:

Glenn M. Friedman - Redding CT 06896
Michael DeMarco - Victor NY 14564
Jorge S. Ivaldi - Trumbull CT 06611
James A. McClay - Oxford CT 06483

International Classification:

B65G 4907

US Classification:

41433114, 41433118, 41441605, 41441611, 414940, 901 30, 901 40, 901 41

Abstract:

A reticle protection and transport system and method for a lithography tool. The system includes an indexer that stores a plurality of reticles and a removable reticle cassette. The removable reticle cassette is comprised of an inner chamber and an outer chamber. The system further includes an end effector coupled to a robotic arm. The end effector engages one of the plurality of reticles to enable the reticle to be positioned within the removable reticle cassette and thereafter transported. The system further includes a seal, coupled to the end effector and the robotic arm. To transport the reticle, the reticle is first loaded onto the end effector. Next, the end effector is used to create an arrangement wherein the reticle is loaded into the removable reticle cassette. Importantly, the reticle and removable reticle cassette do not come into contact with one another. The reticle and removable reticle cassette arrangement is then sealed and transported from the indexer to a mount for performing lithographic exposure.

US Patent:

6991416, Jan 31, 2006

Filed:

Aug 12, 2002

Appl. No.:

10/216660

Inventors:

Santiago E. del Puerto - Milton NY, US
Michael A. DeMarco - Victor NY, US
Glenn M. Friedman - Redding CT, US
Jorge S. Ivaldi - Trumbull CT, US
James A. McClay - Oxford CT, US

Assignee:

ASML Holding N.V.

International Classification:

H01L 21/68

US Classification:

41433114, 414805

Abstract:

A substrate protection and transport system and method for transitioning a substrate from atomospheric pressure to vacuum in a lithography tool. The system includes one or more removable substrate transport cassettes. Each cassette has at least one vent and at least one filter. The system further includes an end effector coupled to a robotic arm to enable the substrate to be positioned within one of the cassettes, thereby forming a cassette-substrate arrangement. The system further includes a box having a base and a lid. The box holds one or more of the cassette-substrate arrangements. In this way, a box-cassette-substrate arrangement is provided. An out of vacuum storage rack having shelves for holding the box-cassette-substrate arrangement is also provided. Still further, an entry-exit module having a loadlock is provided for transitioning the cassette-substrate arrangement from atmospheric pressure to vacuum. To transport the substrate, the substrate is first loaded into a removable substrate transport cassette.

US Patent:

7249925, Jul 31, 2007

Filed:

Nov 21, 2005

Appl. No.:

11/282474

Inventors:

Santiago E. del Puerto - Milton NY, US
Michael A. DeMarco - Victor NY, US
Glenn M. Friedman - Redding CT, US
Jorge S. Ivaldi - Trumbull CT, US
James A. McClay - Oxford CT, US

Assignee:

ASML Holding N.V. - Veldhoven

International Classification:

H01L 21/68

US Classification:

41433114, 414805, 414940

Abstract:

A substrate protection and transport system and method for transitioning a substrate from atmospheric pressure to vacuum in a lithography tool. The system includes one or more removable substrate transport cassettes that support a substrate. The cassette can include a base portion and top portion, and can include a seal. Each cassette has at least one vent and at least one filter. The system further includes a box having a base and lid. The box holds one or more cassette-substrate arrangements. A storage rack having shelves for holding the box-cassette-substrate arrangement is also provided. Further, an entry-exit module having a loadlock is provided for transitioning the cassette-substrate arrangement from atmospheric pressure to vacuum. The entry-exit module can include a shuttle and/or elevator for transporting the cassette-substrate arrangement. During transitioning, the filter(s) and vent(s) restrict particles within the loadlock from entering the cassette-substrate arrangement and reaching a surface of the substrate.

US Patent:

55406947, Jul 30, 1996

Filed:

Sep 16, 1994

Appl. No.:

8/307408

Inventors:

Alfred F. DeCarlo - Stamford CT
Michael DeMarco - Port Chester NY
J. Larry Hineline - Fairfield CT

Assignee:

Joint Medical Products Corporation - Stamford CT

International Classification:

A61B 1716
A61B 1717

US Classification:

606 80

Abstract:

A surgical instrument 20 for machining a precise cavity in a patient's bone for receiving a prosthesis 13 having a conical portion 6 and a triangular portion 8 is provided. The instrument 20 includes a first member 26 which has (i) a conical portion 44 which defines a longitudinal axis 40 and (ii) a guide path 46, 76 for receiving a movable second member 24. The movable second member 24 carries a triangle cutter 22. The movable second member 24 is moved along the longitudinal axis 40 to cut bone until an appropriate index 30 on the movable second member 24 is aligned with a reference surface 28 on the first member 26. This alignment indicates that the triangular cavity formed by cutter 22 is of the appropriate size for the triangular portion 8 of the prosthesis 13 which is to be implanted.

US Patent:

D3256065, Apr 21, 1992

Filed:

Apr 10, 1990

Appl. No.:

7/506889

Inventors:

Robert DeMarco - Farmingdale NY
Michael DeMarco - Woodside NY
Glen Gentile - Brooklyn NY

US Classification:

D21124