Michael Daniel Goldstein

US Patent:

6490031, Dec 3, 2002

Filed:

Sep 29, 2000

Appl. No.:

09/675535

Inventors:

Michael Goldstein - Ridgefield CT
Keith Andresen - Wilton CT

Assignee:

Intel Corporation - Santa Clara CA

International Classification:

G01J 100

US Classification:

356121, 356124

Abstract:

Scattered light is detected radiometrically in a photolithography system. A photodetector makes direct measurements of scatter at points in the line or plane of illumination, and a generalized scatter function is derived from these measured data.

US Patent:

6522465, Feb 18, 2003

Filed:

Sep 27, 2001

Appl. No.:

09/965158

Inventors:

Michael Goldstein - Ridgefield CT

Assignee:

Intel Corporation - Santa Clara CA

International Classification:

G02B 520

US Classification:

359361, 359369, 359 16, 359569, 359570

Abstract:

In one embodiment of the invention, a transmitting spectral filter includes a thin film layer and a grating structure. The thin film layer is made of transmitting material to transmit a first incident radiation within a first band around a first wavelength. The first incident radiation is reflected from a mirror in an optical path. The grating structure is deposited on the thin film layer and is etched to have a grating period. The grating period causes transmission of the first incident radiation within the first band and causes at least one of reflection and diffraction of the second incident radiation above a second wavelength out of the optical path.

US Patent:

6577442, Jun 10, 2003

Filed:

Sep 27, 2001

Appl. No.:

09/965170

Inventors:

Michael Goldstein - Ridgefield CT

Assignee:

Intel Corporation - Santa Clara CA

International Classification:

F21V 906

US Classification:

359361, 359359, 359360, 359565, 359566

Abstract:

In one embodiment of the invention, a grating structure etched on a mirror substrate has a grating period causing diffracting, out of an optical path, a first incident radiation within a first band around a first wavelength. A multi-layer coating deposited on the grating structure reflects the first incident radiation, in the optical path, within the first band and a second incident radiation within a second band around a second wavelength. In another embodiment, a first multi-layer coating deposited on a mirror substrate reflects a first incident radiation within a first band around a first wavelength and a second incident radiation, in an optical path, within a second band around a second wavelength. A grating structure is deposited on the first multi-layer coating. The grating structure is etched to have a grating period causing diffracting, out of the optical path, the second incident radiation within the second band.

US Patent:

6611387, Aug 26, 2003

Filed:

Sep 29, 2000

Appl. No.:

09/676594

Inventors:

Michael Goldstein - Ridgefield CT
John M. Urata - Norwalk CT

Assignee:

Intel Corporation - Santa Clara CA

International Classification:

G02B 900

US Classification:

359738, 359739, 355 53, 355 67

Abstract:

The present invention describes an apparatus comprising an optical array generating a distribution of partial coherence of light energy and an aperture to select a subset of said distribution of partial coherence.

US Patent:

6671054, Dec 30, 2003

Filed:

Feb 7, 2002

Appl. No.:

10/071814

Inventors:

Michael Goldstein - Ridgefield CT

Assignee:

Intel Corporation - Santa Clara CA

International Classification:

G01B 902

US Classification:

356450, 356521

Abstract:

Production of interference patterns from incoherent light sources by using an optical filter, a field mirror, and a plane mirror. The optical filter is designed to filter incoherent light waves and generate coherent light waves. The field mirror is arranged to convert the coherent light waves into plane waves. The plane mirror is arranged as a Lloyds mirror to generate interference patterns from the plane waves.

US Patent:

6671088, Dec 30, 2003

Filed:

Apr 3, 2003

Appl. No.:

10/406933

Inventors:

Michael Goldstein - Ridgefield CT

Assignee:

Intel Corporation - Santa Clara CA

International Classification:

F21V 906

US Classification:

359361, 359360, 359359, 359565, 359566

Abstract:

In one embodiment of the invention, a grating structure etched on a mirror substrate has a grating period causing diffracting, out of an optical path, a first incident radiation within a first band around a first wavelength. A multi-layer coating deposited on the grating structure reflects the first incident radiation, in the optical path, within the first band and a second incident radiation within a second band around a second wavelength. In another embodiment, a first multi-layer coating deposited on a mirror substrate reflects a first incident radiation within a first band around a first wavelength and a second incident radiation, in an optical path, within a second band around a second wavelength. A grating structure is deposited on the first multi-layer coating. The grating structure is etched to have a grating period causing diffracting, out of the optical path, the second incident radiation within the second band.

US Patent:

6700700, Mar 2, 2004

Filed:

Apr 3, 2003

Appl. No.:

10/408033

Inventors:

Michael Goldstein - Ridgefield CT

Assignee:

Intel Corporation - Santa Clara CA

International Classification:

F21V 906

US Classification:

359361, 359359, 359360, 359565

Abstract:

In one embodiment of the invention, a grating structure etched on a mirror substrate has a grating period causing diffracting, out of an optical path, a first incident radiation within a first band around a first wavelength. A multi-layer coating deposited on the grating structure reflects the first incident radiation, in the optical path, within the first band and a second incident radiation within a second band around a second wavelength. In another embodiment, a first multi-layer coating deposited on a mirror substrate reflects a first incident radiation within a first band around a first wavelength and a second incident radiation, in an optical path, within a second band around a second wavelength. A grating structure is deposited on the first multi-layer coating. The grating structure is etched to have a grating period causing diffracting, out of the optical path, the second incident radiation within the second band.

US Patent:

6707602, Mar 16, 2004

Filed:

Apr 3, 2003

Appl. No.:

10/408075

Inventors:

Michael Goldstein - Ridgefield CT

Assignee:

Intee Corporation - Santa Clara CA

International Classification:

G02B 520

US Classification:

359361, 359359, 359360, 359565, 359566

Abstract:

In one embodiment of the invention, a grating structure etched on a mirror substrate has a grating period causing diffracting, out of an optical path, a first incident radiation within a first band around a first wavelength. A multi-layer coating deposited on the grating structure reflects the first incident radiation, in the optical path, within the first band and a second incident radiation within a second band around a second wavelength. In another embodiment, a first multi-layer coating deposited on a mirror substrate reflects a first incident radiation within a first band around a first wavelength and a second incident radiation, in an optical path, within a second band around a second wavelength. A grating structure is deposited on the first multi-layer coating. The grating structure is etched to have a grating period causing diffracting, out of the optical path, the second incident radiation within the second band.