Michael John Halpin

US Patent:

6343183, Jan 29, 2002

Filed:

Jun 27, 2000

Appl. No.:

09/605094

Inventors:

Michael W. Halpin - Phoenix AZ
Mark R. Hawkins - Gilbert AZ
Derrick W. Foster - Scottsdale AZ
Robert M. Vyne - Gilbert AZ
John F. Wengert - Jacksonville OR
Cornelius A. van der Jeugd - Portland OR
Loren R. Jacobs - Mesa AZ
Frank B. M. Van Bilsen - Phoenix AZ
Matthew Goodman - Tempe AZ
Hartmann Glenn - Phoenix AZ
Jason M. Layton - Chandler AZ

Assignee:

ASM America, Inc. - Phoenix AZ

International Classification:

A21B 200

US Classification:

392416, 392418, 219390, 219411, 118725, 118666, 118696

Abstract:

A wafer support system comprising a segmented susceptor having top and bottom sections and gas flow passages therethrough. A plurality of spacers projecting from a recess formed in the top section of the susceptor support a wafer in spaced relationship with respect to the recess. A sweep gas is introduced to the bottom section of the segmented susceptor and travels through the gas flow passages to exit in at least one circular array of outlets in the recess and underneath the spaced wafer. The sweep gas travels radially outward between the susceptor and wafer to prevent back-side contamination of the wafer. The gas is delivered through a hollow drive shaft and into a multi-armed susceptor support underneath the susceptor. The support arms conduct the sweep gas from the drive shaft to the gas passages in the segmented susceptor. The gas passages are arranged to heat the sweep gas prior to delivery underneath the wafer.

US Patent:

6360148, Mar 19, 2002

Filed:

Nov 16, 1999

Appl. No.:

09/440738

Inventors:

Michael W. Halpin - Phoenix AZ 85044

International Classification:

B60G 2300

US Classification:

701 37, 280 55

Abstract:

Among other things, methods and apparatus for automatically controlling hydraulic dampers are described. The apparatus can automatically sense the magnitude of at least one electrical input signal, automatically process each input signal through a microprocessor and associated software algorithm to determine an optimum damping rate, and automatically generate an electrical output signal corresponding to the optimum damping rate. The output signal is configured for communication with a hydraulic damper having means for automatically controlling the damping rate according to an electrical signal. Electrical input signals correspond to variables including engine speed, wheel speed, throttle position, vehicle operator position, and suspension position.

US Patent:

6454863, Sep 24, 2002

Filed:

Aug 17, 2000

Appl. No.:

09/640604

Inventors:

Michael W. Halpin - Phoenix AZ

Assignee:

ASM America, Inc. - Phoenix AZ

International Classification:

C23C 1600

US Classification:

118725, 118715, 392416, 392418

Abstract:

A semiconductor processing chamber, capable of withstanding low pressures while transmitting radiant energy, is provided in a lightweight, compact design. The inner surface of the window is preferably substantially flat and parallel to the wafer to be processed. The window is thin in a center portion and thicker in a surrounding peripheral portion. The thickness increases in the radially outward direction, defined between the flat inner surface and a concave outer surface. Deposition uniformity is improved by employing multiple outlet ports for distributing gas laterally in a short length, enabling a compact, symmetrical geometry. Preferably, a quadra-flow system of gas distribution is used, whereby the chamber contains one inlet port and three outlet ports distributed approximately at 90 degrees around a cylindrical side wall defining the chamber space.

US Patent:

6454866, Sep 24, 2002

Filed:

Jul 10, 2000

Appl. No.:

09/614481

Inventors:

Michael W. Halpin - Phoenix AZ
Mark R. Hawkins - Gilbert AZ
Derrick W. Foster - Scottsdale AZ
Robert M. Vyne - Gilbert AZ
John F. Wengert - Jacksonville OR
Cornelius A. van der Jeugd - Portland OR
Loren R. Jacobs - Mesa AZ
Frank B. M. Van Bilsen - Phoenix AZ
Matthew Goodman - Tempe AZ
Hartmann Glenn - Phoenix AZ
Jason M. Layton - Chandler AZ

Assignee:

ASM America, Inc. - Phoenix AZ

International Classification:

C23C 1600

US Classification:

118730, 118715, 118725, 118728, 118500

Abstract:

A wafer support system comprising a segmented susceptor having top and bottom sections and gas flow passages therethrough. A plurality of spacers projecting from a recess formed in the top section of the susceptor support a wafer in spaced relationship with respect to the recess. A sweep gas is introduced to the bottom section of the segmented susceptor and travels through the gas flow passages to exit in at least one circular array of outlets in the recess and underneath the spaced wafer. The sweep gas travels radially outward between the susceptor and wafer to prevent back-side contamination of the wafer. The gas is delivered through a hollow drive shaft and into a multi-armed susceptor support underneath the susceptor. The support arms conduct the sweep gas from the drive shaft to the gas passages in the segmented susceptor. The gas passages are arranged to heat the sweep gas prior to delivery underneath the wafer.

US Patent:

6464792, Oct 15, 2002

Filed:

Jul 11, 2000

Appl. No.:

09/613437

Inventors:

John F. Wengert - Phoenix AZ
Loren R. Jacobs - Mesa AZ
Michael W. Halpin - Phoenix AZ
Derrick W. Foster - Scottsdale AZ
Cornelius A. van der Jeugd - Tempe AZ
Robert M. Vyne - Tempe AZ
Mark R. Hawkins - Gilbert AZ

Assignee:

ASM America, Inc. - Phoenix AZ

International Classification:

C23C 1600

US Classification:

118715, 118724, 118725, 4272481

Abstract:

An improved chemical vapor deposition reaction chamber having an internal support plate to enable reduced pressure processing. The chamber has a vertical-lateral lenticular cross-section with a wide horizontal dimension and a shorter vertical dimension between bi-convex upper and lower walls. A central horizontal support plate is provided between two lateral side rails of the chamber. A large rounded rectangular aperture is formed in the support plate for positioning a rotatable susceptor on which a wafer is placed. The shaft of the susceptor extends downward through the aperture and through a lower tube depending from the chamber. The support plate segregates the reaction chamber into an upper region and a lower region, with purge gas being introduced through the lower tube into the lower region to prevent unwanted deposition therein. A temperature compensation ring is provided surrounding the susceptor and supported by fingers connected to the support plate. The temperature compensation ring may be circular or may be built out to conform to the rounded rectangular shape of the support plate aperture.

US Patent:

6465761, Oct 15, 2002

Filed:

Jul 23, 2001

Appl. No.:

09/911212

Inventors:

Ronald R. Stevens - San Ramon CA
Eric Shero - Phoenix AZ
Ravinder K. Aggarwal - Gilbert AZ
Michael W. Halpin - Scottsdale AZ

Assignee:

ASM America, Inc. - Phoenix AZ

International Classification:

F27B 514

US Classification:

219411, 219390, 219405, 118725, 118501, 392411, 392416

Abstract:

A reactor chamber is positioned between a top array of heat lamps and a bottom array of heat lamps. At least one of the heat lamps forming the top and bottom arrays features a segmented filament such that power output along the length of the heat lamp differs. In one configuration, the heat lamp has a pair of high energy output regions spaced from each other by a lower energy output region. In some configurations, at least one of the heat lamps forming the top and bottom arrays is non-linear, such as U-shaped. In further configurations, a non-linear heat lamp has a segmented filament with segments or areas of different winding density.

US Patent:

6491757, Dec 10, 2002

Filed:

Aug 17, 2001

Appl. No.:

09/932795

Inventors:

Michael W. Halpin - Phoenix AZ
Mark R. Hawkins - Gilbert AZ
Derrick W. Foster - Scottsdale AZ
Robert M. Vyne - Gilbert AZ
John F. Wengert - Jacksonville OR
Cornelius A. van der Jeugd - Portland OR
Loren R. Jacobs - Mesa AZ
Frank B. M. Van Bilsen - Phoenix AZ
Matthew Goodman - Tempe AZ
Hartmann Glenn - Phoenix AZ
Jason M. Layton - Chandler AZ

Assignee:

ASM America, Inc. - Phoenix AZ

International Classification:

C23C 1600

US Classification:

118666, 118725, 118696, 15634524, 392407, 392411, 392416, 392418, 219390, 219395, 219411, 219412, 219413

Abstract:

An apparatus for processing a substrate comprises a susceptor for supporting the substrate, an upper heat source spaced above the susceptor, a lower heat source spaced below the susceptor, and a controller. The controller provides power to the heat sources at a selected ratio between the sources. The controller is configured to vary the ratio during a high temperature processing cycle of a substrate to thereby vary the ratio of the heat provided by the heat sources during the cycle.

US Patent:

6572924, Jun 3, 2003

Filed:

Nov 18, 1999

Appl. No.:

09/443552

Inventors:

Michael W. Halpin - Phoenix AZ

Assignee:

ASM America, Inc. - Phoenix AZ

International Classification:

C23C 1644

US Classification:

42725528, 4272481, 42725523, 118715, 118733, 55417

Abstract:

An improved exhaust conductance system for a CVD reactor includes two exhaust paths and a three-way valve controlling flow to the exhaust paths. The valve directs flow through a first exhaust conductance path when reactant gas passes through the reactor, and through a second exhaust conductance path after reactant gas has been purged from the chamber and only purging gas is flowing through the reactor.