Michael P Kanouff from 4856 Deer Peak Trl, Bishop, CA 93514, age 69, Phone: (760)3872148

Us Patents

Discharge Source With Gas Curtain For Protecting Optics From Particles
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US Patent:

6714624, Mar 30, 2004
Filed:

Sep 18, 2001
Appl. No.:

09/956275
Inventors:

Neal R. Fornaciari - Tracey CA
Michael P. Kanouff - Livermore CA
Assignee:

EUV LLC - Santa Clara CA
International Classification:

H05G 200
US Classification:

378119, 378 34
Abstract:

A gas curtain device is employed to deflect debris that is generated by an extreme ultraviolet and soft x-ray radiation discharge source such as an electric discharge plasma source. The gas curtain device projects a stream of gas over the path of the radiation to deflect debris particles into a direction that is different from that of the path of the radiation. The gas curtain can be employed to prevent debris accumulation on the optics used in photolithography.

Coaxial Microreactor For Particle Synthesis
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US Patent:

8563325, Oct 22, 2013
Filed:

Sep 29, 2010
Appl. No.:

12/893915
Inventors:

Michael Bartsch - Menlo Park CA, US
Michael P. Kanouff - Livermore CA, US
Scott M. Ferko - Livermore CA, US
Robert W. Crocker - Fremont CA, US
Karl Wally - Lafayette CA, US
Assignee:

Sandia Corporation - Albuquerque NM
International Classification:

B01L 3/00
US Classification:

436180, 436174, 422503, 422502
Abstract:

A coaxial fluid flow microreactor system disposed on a microfluidic chip utilizing laminar flow for synthesizing particles from solution. Flow geometries produced by the mixing system make use of hydrodynamic focusing to confine a core flow to a small axially-symmetric, centrally positioned and spatially well-defined portion of a flow channel cross-section to provide highly uniform diffusional mixing between a reactant core and sheath flow streams. The microreactor is fabricated in such a way that a substantially planar two-dimensional arrangement of microfluidic channels will produce a three-dimensional core/sheath flow geometry. The microreactor system can comprise one or more coaxial mixing stages that can be arranged singly, in series, in parallel or nested concentrically in parallel.

Coated Metal Structures And Methods Of Making And Using Thereof
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US Patent:

20070080062, Apr 12, 2007
Filed:

Oct 3, 2005
Appl. No.:

11/240396
Inventors:

Cindy Harnett - Livermore CA, US
Tyrone Hill - Cambridge MA, US
Michael Kanouff - Livermore CA, US
International Classification:

C07K 1/26
B32B 15/04
US Classification:

204450000, 428457000, 428469000
Abstract:

Disclosed herein are methods and devices for applying two or more mobilization fields in a microchannel using a multifunctional structure and manipulating particles and fluids based on more than one characteristic. Specifically, a fluidic channel comprising at least one metal structure having a coat comprising a conductive material, an insulative material, a semi-conductive material, or a combination thereof, is disclosed. Also disclosed are methods for manipulating or assaying a particle in a sample which comprises subjecting the sample to a fluidic channel comprising at least one metal structure having a coat comprising a conductive material, an insulative material, a semi-conductive material, or a combination thereof and inducing at least one mobilization field such as a magnetic field, an electroosmotic field, an insulative dielectrophoresis (iDEP) field, which iDEP field may be an iDEP trapping field or an iDEP streaming field, or a combination thereof.

Heating Systems For Hydrogen Storage Materials
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US Patent:

20100061926, Mar 11, 2010
Filed:

Aug 25, 2009
Appl. No.:

12/547065
Inventors:

TERRY A. JOHNSON - LIVERMORE CA, US
DANIEL E. DEDRICK - OAKLAND CA, US
MICHAEL P. KANOUFF - LIVERMORE CA, US
Assignee:

GM GLOBAL TECHNOLOGY OPERATIONS, INC. - DETROIT MI
International Classification:

C01B 3/02
B01J 19/00
US Classification:

4236481, 422198
Abstract:

Auxiliary heating systems that can supply heat to a hydrogen storage material, which may comprise at least one hydridable material, located inside a hydrogen storage tank have been developed. These auxiliary heating systems involve the catalytic combustion of hydrogen and oxygen in a catalytic heater to produce heat and combustion products. The heat produced from the catalytic combustion may then be transferred, either indirectly or directly, to the hydrogen storage material to stimulate the release of additional desorbable hydrogen that may be stored in the at least one hydrdidable material.

Surface Figure Control For Coated Optics
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US Patent:

62065289, Mar 27, 2001
Filed:

Sep 30, 1998
Appl. No.:

9/164413
Inventors:

Avijit K. Ray-Chaudhuri - Livermore CA
Paul A. Spence - Pleasanton CA
Michael P. Kanouff - Livermore CA
Assignee:

EUV LLC - Santa Clara CA
International Classification:

G02B7/182
US Classification:

359871
Abstract:

A pedestal optical substrate that simultaneously provides high substrate dynamic stiffness, provides low surface figure sensitivity to mechanical mounting hardware inputs, and constrains surface figure changes caused by optical coatings to be primarily spherical in nature. The pedestal optical substrate includes a disk-like optic or substrate section having a top surface that is coated, a disk-like base section that provides location at which the substrate can be mounted, and a connecting cylindrical section between the base and optics or substrate sections. The optic section has an optical section thickness. sup. 2 /optical section diameter ratio of between about 5 to 10 mm, and a thickness variation between front and back surfaces of less than about 10%. The connecting cylindrical section may be attached via three spaced legs or members. However, the pedestal optical substrate can be manufactured from a solid piece of material to form a monolith, thus avoiding joints between the sections, or the disk-like base can be formed separately and connected to the connecting section.

Wafer Chamber Having A Gas Curtain For Extreme-Uv Lithography
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US Patent:

61987921, Mar 6, 2001
Filed:

Nov 6, 1998
Appl. No.:

9/187911
Inventors:

Michael P. Kanouff - Livermore CA
Avijit K. Ray-Chaudhuri - Livermore CA
Assignee:

EUV LLC - Santa Clara CA
International Classification:

G21K 500
US Classification:

378 34
Abstract:

An EUVL device includes a wafer chamber that is separated from the upstream optics by a barrier having an aperture that is permeable to the inert gas. Maintaining an inert gas curtain in the proximity of a wafer positioned in a chamber of an extreme ultraviolet lithography device can effectively prevent contaminants from reaching the optics in an extreme ultraviolet photolithography device even though solid window filters are not employed between the source of reflected radiation, e. g. , the camera, and the wafer. The inert gas removes the contaminants by entrainment.

Plasma-Based Light Source
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US Patent:

20160249442, Aug 25, 2016
Filed:

Aug 28, 2015
Appl. No.:

14/838594
Inventors:

- Milpitas CA, US
Alexander Bykanov - San Diego CA, US
Michael Kanouff - Livermore CA, US
Oleg Khodykin - San Diego CA, US
International Classification:

H05G 2/00
Abstract:

The present disclosure is directed to plasma-based light sources. Systems and methods are described for protecting components of the light source from plasma generated debris which can include target material gas, atomic vapor, high energy ions, neutrals, micro-particles, and contaminants. Particular embodiments include arrangements for reducing the adverse effects of plasma generated ions and neutrals on light source components while simultaneously reducing in-band light attenuation due to target material gas and vapor.

Apparatus And Methods For Optics Protection From Debris In Plasma-Based Light Source
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US Patent:

20160128171, May 5, 2016
Filed:

Jun 15, 2015
Appl. No.:

14/739305
Inventors:

- Milpitas CA, US
Ye Liu - San Jose CA, US
Oleg Khodykin - San Diego CA, US
Michael P. Kanouff - Livermore CA, US
Assignee:

KLA-Tencor Corporation - Milpitas CA
International Classification:

H05G 2/00
Abstract:

Disclosed are methods and apparatus for generating an illumination beam. In one embodiment, the apparatus includes a vacuum chamber configured to hold a target material, an optical element positioned within the vacuum chamber or within a wall of such vacuum chamber, and an illumination source system for generating at least one excitation source that is focused on the target in the vacuum chamber for generating a plasma in the vacuum chamber so as to produce illumination radiation. The apparatus further includes a debris protection system for flowing gas out of a plurality of nozzles and away from the optical element at a velocity towards the plasma so as to prevent debris from reaching such optical element.