Michael Todd Nichols

US Patent:

20210116896, Apr 22, 2021

Filed:

Oct 21, 2019

Appl. No.:

16/659557

Inventors:

- Santa Clara CA, US
Michael Nichols - Sunnyvale CA, US

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

G05B 19/418
G06N 3/08
G06N 3/04
G05B 13/02

Abstract:

A method of detecting and classifying anomalies during semiconductor processing includes executing a wafer recipe a semiconductor processing system to process a semiconductor wafer; monitoring sensor outputs from a sensors that monitor conditions associated with the semiconductor processing system; providing the sensor outputs to models trained to identify when the conditions associated with the semiconductor processing system indicate a fault in the semiconductor wafer; receiving an indication of a fault from at least one of the models; and generating a fault output in response to receiving the indication of the fault.

US Patent:

20210074526, Mar 11, 2021

Filed:

Sep 6, 2019

Appl. No.:

16/563352

Inventors:

- Santa Clara CA, US
Michael Nichols - Santa Clara CA, US

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

H01J 37/32
H01L 21/67
C23C 16/455
C23C 16/52

Abstract:

System and methods of improving dynamic pressure response during recipe step transitions. An exemplary method may include changing at least one of a plurality of recipe parameters in accordance with a processing recipe while running the processing recipe on a semiconductor substrate in a processing chamber. The method may further include measuring a pressure response in the processing chamber responsive to the changing of the at least one of the plurality of recipe parameters, and determining a response error based on the pressure response and a model pressure response calculated based on the processing recipe. The method may further include, in response to determining that the response error may be greater than a threshold value, calculating an adjustment to an operation of a valve downstream of the processing chamber when changing the at least one of the plurality of recipe parameters in accordance with the processing recipe in subsequent runs.

US Patent:

20180122655, May 3, 2018

Filed:

Oct 16, 2017

Appl. No.:

15/784846

Inventors:

- Santa Clara CA, US
Roberto COTLEAR - Sunnyvale CA, US
Michael NICHOLS - Sunnyvale CA, US
Imad YOUSIF - San Jose CA, US
Steven E. BABAYAN - Los Altos CA, US
Rajinder DHINDSA - Pleasanton CA, US
Changhun LEE - San Jose CA, US

International Classification:

H01L 21/67
B01D 39/20
B01D 46/24
B01D 46/10

Abstract:

Methods and apparatus for delivering one or more gases to a process chamber are provided herein. In some embodiments a gas delivery system includes a process chamber having an inner volume; a gas source panel; a gas line coupling the inner volume to the gas source panel; and a first gas filter disposed along the gas line proximate the inner volume, wherein the first gas filter comprises a filter element body having a first end and a second end opposite the first end, and a filtration efficiency of about 1 to about 5 log reduction value (LRV).