Michael L Sherrard

US Patent:

6746544, Jun 8, 2004

Filed:

Oct 25, 2001

Appl. No.:

10/046423

Inventors:

Boris Fishkin - San Carlos CA
Michael Sherrard - Los Altos CA

Assignee:

Applied Materials Inc. - Santa Clara CA

International Classification:

B08B 300

US Classification:

134 30, 134 26, 134 34, 134 36, 134 37, 134 32, 134902

Abstract:

A method and apparatus for cleaning, rinsing and Marangoni drying substrates is provided. A line of fluid is sprayed along a substrate surface forming an air/fluid interface line, and a line of drying vapor is supplied to the interface line to achieve Marangoni drying. Thus, a large portion of the substrate is simultaneously dried. A preferred apparatus employs a tank of cleaning and/or rinsing fluid. Above the tank fluid a source of rinsing fluid directs rinsing fluid to the surface of a substrate forming a meniscus on the substrate surface as the substrate is lifted from the cleaning fluid, and a drying vapor source directs drying vapor to the meniscus. The drying vapor lowers the surface tension of the meniscus, inducing a Marangoni flow of rinsing fluid from the substrates surface, and thereby drying the substrate. The cleaning fluid tank has a substrate receiving and cleaning portion and a substrate rinsing portion. The rinsing fluid source and the drying vapor source are enclosed by a drying enclosure above the rinsing portion of the tank.

US Patent:

7252098, Aug 7, 2007

Filed:

Sep 22, 2003

Appl. No.:

10/667855

Inventors:

Boris Fishkin - San Carlos CA, US
Michael Sherrard - Los Altos CA, US

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

B08B 7/04
B08B 3/04
B08B 3/10

US Classification:

134 66, 134 61, 134184, 134902

Abstract:

A method and apparatus for cleaning, rinsing and Marangoni drying substrates is provided. A line of fluid is sprayed along a substrate surface forming an air/fluid interface line, and a line of drying vapor is supplied to the interface line to achieve Marangoni drying. Thus, a large portion of the substrate is simultaneously dried. A preferred apparatus employs a tank of cleaning and/or rinsing fluid. Above the tank fluid a source of rinsing fluid directs rinsing fluid to the surface of a substrate forming a meniscus on the substrate surface as the substrate is lifted from the cleaning fluid, and a drying vapor source directs drying vapor to the meniscus. The drying vapor lowers the surface tension of the meniscus, inducing a Marangoni flow of rinsing fluid from the substrate's surface, and thereby drying the substrate. The cleaning fluid tank has a substrate receiving and cleaning portion and a substrate rinsing portion. The rinsing fluid source and the drying vapor source are enclosed by a drying enclosure above the rinsing portion of the tank.

US Patent:

7718011, May 18, 2010

Filed:

Aug 6, 2007

Appl. No.:

11/834657

Inventors:

Boris Fishkin - San Carlos CA, US
Michael Sherrard - Los Altos CA, US

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

B08B 3/04
B08B 5/00
B08B 7/04

US Classification:

134 18, 134 1, 134 13, 134 26, 134 30, 134 32, 134 34, 134 37, 134 61, 134 66, 134 952, 134 31, 134184, 134902

Abstract:

A method and apparatus for cleaning, rinsing and Marangoni drying substrates is provided. The invention includes spraying a line of fluid to a substrate, thereby creating an air/fluid interface line on the substrate; supplying a line of drying vapors to the air/fluid interface line, thereby creating a Marangoni drying effect along the air/fluid interface line; and moving the substrate relative to the air/fluid line. Numerous other aspects are provided.

US Patent:

20060260653, Nov 23, 2006

Filed:

Jul 31, 2006

Appl. No.:

11/497445

Inventors:

Boris Fishkin - San Carlos CA, US
Michael Sherrard - Los Altos CA, US

International Classification:

B08B 3/00

US Classification:

134026000, 134094100, 134095200, 134095300, 134030000

Abstract:

A method and apparatus for cleaning, rinsing and Marangoni drying substrates is provided. A line of fluid is sprayed along a substrate surface forming an air/fluid interface line, and a line of drying vapor is supplied to the interface line to achieve Marangoni drying. Thus, a large portion of the substrate is simultaneously dried. A preferred apparatus employs a tank of cleaning and/or rinsing fluid. Above the tank fluid a source of rinsing fluid directs rinsing fluid to the surface of a substrate forming a meniscus on the substrate surface as the substrate is lifted from the cleaning fluid, and a drying vapor source directs drying vapor to the meniscus. The drying vapor lowers the surface tension of the meniscus, inducing a Marangoni flow of rinsing fluid from the substrate's surface, and thereby drying the substrate. The cleaning fluid tank has a substrate receiving and cleaning portion and a substrate rinsing portion. The rinsing fluid source and the drying vapor source are enclosed by a drying enclosure above the rinsing portion of the tank. Thus, substrate loading, cleaning, rinsing, drying and unloading are performed with at least partial overlap in time.

US Patent:

63288141, Dec 11, 2001

Filed:

Mar 26, 1999

Appl. No.:

9/280118

Inventors:

Boris Fishkin - San Carlos CA
Michael Sherrard - Los Altos CA

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

B08B 304
B08B 500
B08B 704

US Classification:

134 30

Abstract:

A method and apparatus for cleaning, rinsing and Marangoni drying substrates is provided. A line of fluid is sprayed along a substrate surface forming an air/fluid interface line, and a line of drying vapor is supplied to the interface line to achieve Marangoni drying. Thus, a large portion of the substrate is simultaneously dried. A preferred apparatus employs a tank of cleaning and/or rinsing fluid. Above the tank fluid a source of rinsing fluid directs rinsing fluid to the surface of a substrate forming a meniscus on the substrate surface as the substrate is lifted from the cleaning fluid, and a drying vapor source directs drying vapor to the meniscus. The drying vapor lowers the surface tension of the meniscus, inducing a Marangoni flow of rinsing fluid from the substrate's surface, and thereby drying the substrate. The cleaning fluid tank has a substrate receiving and cleaning portion and a substrate rinsing portion. The rinsing fluid source and the drying vapor source are enclosed by a drying enclosure above the rinsing portion of the tank.