Ming M Li

US Patent:

7642202, Jan 5, 2010

Filed:

Jun 27, 2005

Appl. No.:

11/168013

Inventors:

Ming Li - West Linn OR, US
Bart Van Schravendijk - Sunnyvale CA, US
Tom Mountsier - San Jose CA, US
Chiu Chi - San Jose CA, US
Kevin Ilcisin - Beaverton OR, US
Julian Hsieh - Pleasanton CA, US

Assignee:

Novellus Systems, Inc. - San Jose CA

International Classification:

H01L 21/31
H01L 21/469

US Classification:

438786, 438624, 438783, 257E21627, 257E21277

Abstract:

A nitrogen-free anti-reflective layer for use in semiconductor photolithography is fabricated in a chemical vapor deposition process, optionally plasma-enhanced, using a gaseous mixture of carbon, silicon, and oxygen sources. By varying the process parameters, a substantially hermetic layer with acceptable values of the refractive index n and extinction coefficient k can be obtained. The nitrogen-free moisture barrier anti-reflective layer produced by this technique improves plasma etch of features such as vias in subsequent processing steps.

US Patent:

8003549, Aug 23, 2011

Filed:

Nov 20, 2009

Appl. No.:

12/623305

Inventors:

Ming Li - West Linn OR, US
Bart Van Schravendijk - Sunnyvale CA, US
Tom Mountsier - San Jose CA, US
Chiu Chi - San Jose CA, US
Kevin Ilcisin - Beaverton OR, US
Julian Hsieh - Pleasanton CA, US

Assignee:

Novellus Systems, Inc. - San Jose CA

International Classification:

H01L 21/31
H01L 21/469

US Classification:

438786, 438624, 438783, 257E21627, 257E21277

Abstract:

A nitrogen-free anti-reflective layer for use in semiconductor photolithography is fabricated in a chemical vapor deposition process, optionally plasma-enhanced, using a gaseous mixture of carbon, silicon, and oxygen sources. By varying the process parameters, a substantially hermetic layer with acceptable values of the refractive index n and extinction coefficient k can be obtained. The nitrogen-free moisture barrier anti-reflective layer produced by this technique improves plasma etch of features such as vias in subsequent processing steps.

US Patent:

8017527, Sep 13, 2011

Filed:

Dec 16, 2008

Appl. No.:

12/336386

Inventors:

Arul N. Dhas - Sherwood OR, US
Ming Li - West Linn OR, US
Joseph Bradley Laird - Sherwood OR, US

Assignee:

Novellus Systems, Inc. - San Jose CA

International Classification:

H01L 21/31
H01L 21/469
A23G 3/24
B05C 3/00
B01D 47/00
F02M 37/00
F02M 69/02
F02M 5/08
B01F 5/04

US Classification:

438778, 438780, 438781, 257E21094, 257E21477, 118429, 118723 E, 118 29, 261 341, 261 38, 261 42, 261 442, 261 76

Abstract:

Apparatuses and methods for diverting a flow of a liquid precursor during flow stabilization and plasma stabilization stages during PECVD processes are effective at eliminating particle defects in PECVD films deposited using a liquid precursor.

US Patent:

8101531, Jan 24, 2012

Filed:

Sep 23, 2010

Appl. No.:

12/889132

Inventors:

Ming Li - West Linn OR, US
Hu Kang - Tualatin OR, US
Mandyam Sriram - Beaverton OR, US
Adrien LaVoie - Portland OR, US

Assignee:

Novellus Systems, Inc. - San Jose CA

International Classification:

H01L 21/469

US Classification:

438788, 438789, 438792, 427535, 257E21576

Abstract:

Methods and hardware for depositing thin conformal films using plasma-activated conformal film deposition (CFD) processes are described herein. In one example, a method for forming a thin conformal film comprises, in a first phase, generating precursor radicals off of a surface of the substrate and adsorbing the precursor radicals to the surface to form surface active species; in a first purge phase, purging residual precursor from the process station; in a second phase, supplying a reactive plasma to the surface, the reactive plasma configured to react with the surface active species and generate the thin conformal film; and in a second purge phase, purging residual reactant from the process station.

US Patent:

8122042, Feb 21, 2012

Filed:

Jun 26, 2009

Appl. No.:

12/493105

Inventors:

Yufei Pan - North Brunswick NJ, US
Jiankuan Ye - Edison NJ, US
Ming Li - San Jose CA, US
Alessio Signorini - Boulder CO, US
Apostolos Gerasoulis - Edison NJ, US
Tomasz Imielinski - Princeton NJ, US

Assignee:

IAC Search & Media, Inc. - Oakland CA

International Classification:

G06F 17/00

US Classification:

707759, 707769

Abstract:

In a method for a direct answer for search, a search query is received over a network, one or more answer entities are determined from one or more answer candidate snippets, with an answer candidate snippet having at least a portion of content available over the network for an answer candidate, a content identifier is determined for an answer candidate, a title is tokenized for the content identifier, a comparison is performed between a vector of tokens for the title and a vector of the one or more answer entities, an indicator of the relevance is adjusted for the content identifier in accordance with the comparison, and at least one answer candidate snippet is sent for a response to the search query.

US Patent:

8518259, Aug 27, 2013

Filed:

Jan 27, 2011

Appl. No.:

13/015363

Inventors:

Patrick Cloutier - Andover MN, US
Robert Olsen - Plymouth MN, US
Stephen Roller - Minneapolis MN, US
Chris Plott - St. Paul MN, US
Al McLevish - Apple Valley MN, US
Ming Li - Roseville MN, US
Michael Laxen - Minneapolis MN, US
John Knoll - Brooklyn Park MN, US
Gregory Hake - Otsego MN, US

Assignee:

Medtronic, Inc. - Minneapolis MN

International Classification:

B01D 61/30
B01D 61/28
B01D 61/20
B01D 61/18
A61M 1/36

US Classification:

210646, 210175, 210180, 210183, 210184, 210188, 210252, 210256, 210258, 210436, 210472, 210650, 422 44, 422 45, 422 46, 422 47, 422 48, 604 401, 604 501, 604 609, 604 613, 604 614, 604 28

Abstract:

An apparatus for de-aering, oxygenating and controlling a temperature of blood in an extracorporeal blood circuit. The apparatus includes a housing, a manifold body, a heat exchanger, and an oxygenator. A blood inlet tangentially directs blood into a first chamber of the housing. The manifold body is disposed in a second chamber, and includes a core and a plurality of vanes that define channels. The heat exchanger is arranged around the manifold body, and the oxygenator around the heat exchanger. The channels are open to the heat exchanger. An established blood flow path includes rotational flow within the first chamber to separate air from the blood, generally longitudinal flow from the first chamber and along the channels, and generally radial flow through the heat exchanger and the oxygenator. With this construction, gross air removal occurs prior to the blood passing through the heat exchanger and oxygenator.

US Patent:

8524612, Sep 3, 2013

Filed:

Jan 21, 2011

Appl. No.:

13/011569

Inventors:

Ming Li - West Linn OR, US
Hu Kang - Tualatin OR, US
Mandyam Sriram - Beaverton OR, US
Adrien LaVoie - Portland OR, US

Assignee:

Novellus Systems, Inc. - Fremont CA

International Classification:

H01L 21/31
H01L 21/469
H01L 21/44

US Classification:

438762, 438667, 438778, 438787

Abstract:

Embodiments related to depositing thin conformal films using plasma-activated conformal film deposition (CFD) processes are described herein. In one example, a method of processing a substrate includes, applying photoresist to the substrate, exposing the photoresist to light via a stepper, patterning the resist with a pattern and transferring the pattern to the substrate, selectively removing photoresist from the substrate, placing the substrate into a process station, and, in the process station, in a first phase, generating radicals off of the substrate and adsorbing the radicals to the substrate to form active species, in a first purge phase, purging the process station, in a second phase, supplying a reactive plasma to the surface, the reactive plasma configured to react with the active species and generate the film, and in a second purge phase, purging the process station.

US Patent:

8545754, Oct 1, 2013

Filed:

Apr 23, 2009

Appl. No.:

12/428674

Inventors:

Walt L. Carpenter - Minneapolis MN, US
Robert W. Olsen - Plymouth MN, US
Michael J. Hobday - Lino Lakes MN, US
Alford L. McLevish - Maple Grove MN, US
Christopher J. Plott - St. Paul MN, US
Roderick E. Briscoe - Rogers MN, US
Patrick J. Cloutier - Andover MN, US
Anil Thapa - Blaine MN, US
Ming Li - Roseville MN, US
Kevin McIntosh - Brooklyn Park MN, US
Ken Merte - Southlake TX, US

Assignee:

Medtronic, Inc. - Minneapolis MN

International Classification:

A61M 1/00
A61M 1/16

US Classification:

422 46, 422 44, 422 45, 422 48, 604 401, 604 609, 604 613, 604 614

Abstract:

Disclosed is an apparatus for oxygenating and controlling the temperature of blood in an extracorporeal circuit. The apparatus has an inlet and an outlet that is located radially outward from the inlet in order to define a flowpath through the apparatus. The apparatus comprises: a core that is substantially centrally located in the apparatus and to which blood from a patient can be supplied through the inlet; a heat exchanger comprising a plurality of heat transfer elements that are arranged around the core and between which blood from the core can move radially outward; and an oxygenator comprising a plurality of gas exchange elements that are arranged around the heat exchanger and between which blood from the heat exchanger can move radially outward before exiting the apparatus through the outlet.