Ming Li

US Patent:

6976414, Dec 20, 2005

Filed:

Nov 19, 1997

Appl. No.:

08/974179

Inventors:

Ming Li - Murrysville PA, US
Gregory Fata - Westland MI, US

Assignee:

Alcoa Inc. - Pittsburgh PA

International Classification:

B23D015/04
B23D033/02
B26D001/08
B21D028/16

US Classification:

83 13, 83452, 83613, 83694

Abstract:

A method and apparatus are provided for reducing or eliminating sliver formation during aluminum sheet trimming operations. By controlling parameters such as trimming angle and cutting blade clearance, aluminum sheet can be trimmed while substantially eliminating the formation of slivers which damage the surface finish of the part. Cutting angle and clearance are preferably selected such that a wide range of cutting blade sharpnesses produce satisfactory cuts. The method and apparatus are particularly useful for trimming aluminum autobody sheet.

US Patent:

7430951, Oct 7, 2008

Filed:

Aug 24, 2000

Appl. No.:

09/645653

Inventors:

Ming Li - Murrysville PA, US
Gregory Fata - Westland MI, US

Assignee:

Alcoa Inc. - Pittsburgh PA

International Classification:

B26D 1/08

US Classification:

83684, 83693, 83694

Abstract:

A method and apparatus are provided for reducing or eliminating sliver formation during aluminum sheet trimming operations. A resilient support pad is used in the trimming apparatus to substantially eliminate the formation of slivers which damage the surface finish of the part. Use of the resilient support pad also significantly reduces burr heights and improves trimmed edge quality. The method and apparatus are particularly useful for trimming aluminum autobody sheet.

US Patent:

7455004, Nov 25, 2008

Filed:

Mar 6, 2003

Appl. No.:

10/383180

Inventors:

Ming M. Li - Murrysville PA, US
Hongbing Lu - Edmond OK, US
James M. Rushing - Maryville TN, US
Dennis P. Henninger - Newburgh IN, US
Xingyun Shen - Bettendorf IA, US

Assignee:

Alcoa Inc. - Pittsburgh PA

International Classification:

B26D 1/24

US Classification:

83495, 83496, 83663, 83673, 83676

Abstract:

The apparatus for trimming sheet material includes a top knife and an opposing bottom knife for trimming sheet or web material passing between the top and bottom knives. The top knife defines a negative rake angle with a substantially vertical plane passing through a cutting edge of the bottom knife. The negative rake angle may be between about −10 and −30 and, more preferably, between about −12 and −20. The top and bottom knives may be disk or block knives.

US Patent:

7642202, Jan 5, 2010

Filed:

Jun 27, 2005

Appl. No.:

11/168013

Inventors:

Ming Li - West Linn OR, US
Bart Van Schravendijk - Sunnyvale CA, US
Tom Mountsier - San Jose CA, US
Chiu Chi - San Jose CA, US
Kevin Ilcisin - Beaverton OR, US
Julian Hsieh - Pleasanton CA, US

Assignee:

Novellus Systems, Inc. - San Jose CA

International Classification:

H01L 21/31
H01L 21/469

US Classification:

438786, 438624, 438783, 257E21627, 257E21277

Abstract:

A nitrogen-free anti-reflective layer for use in semiconductor photolithography is fabricated in a chemical vapor deposition process, optionally plasma-enhanced, using a gaseous mixture of carbon, silicon, and oxygen sources. By varying the process parameters, a substantially hermetic layer with acceptable values of the refractive index n and extinction coefficient k can be obtained. The nitrogen-free moisture barrier anti-reflective layer produced by this technique improves plasma etch of features such as vias in subsequent processing steps.

US Patent:

8003549, Aug 23, 2011

Filed:

Nov 20, 2009

Appl. No.:

12/623305

Inventors:

Ming Li - West Linn OR, US
Bart Van Schravendijk - Sunnyvale CA, US
Tom Mountsier - San Jose CA, US
Chiu Chi - San Jose CA, US
Kevin Ilcisin - Beaverton OR, US
Julian Hsieh - Pleasanton CA, US

Assignee:

Novellus Systems, Inc. - San Jose CA

International Classification:

H01L 21/31
H01L 21/469

US Classification:

438786, 438624, 438783, 257E21627, 257E21277

Abstract:

A nitrogen-free anti-reflective layer for use in semiconductor photolithography is fabricated in a chemical vapor deposition process, optionally plasma-enhanced, using a gaseous mixture of carbon, silicon, and oxygen sources. By varying the process parameters, a substantially hermetic layer with acceptable values of the refractive index n and extinction coefficient k can be obtained. The nitrogen-free moisture barrier anti-reflective layer produced by this technique improves plasma etch of features such as vias in subsequent processing steps.

US Patent:

8017527, Sep 13, 2011

Filed:

Dec 16, 2008

Appl. No.:

12/336386

Inventors:

Arul N. Dhas - Sherwood OR, US
Ming Li - West Linn OR, US
Joseph Bradley Laird - Sherwood OR, US

Assignee:

Novellus Systems, Inc. - San Jose CA

International Classification:

H01L 21/31
H01L 21/469
A23G 3/24
B05C 3/00
B01D 47/00
F02M 37/00
F02M 69/02
F02M 5/08
B01F 5/04

US Classification:

438778, 438780, 438781, 257E21094, 257E21477, 118429, 118723 E, 118 29, 261 341, 261 38, 261 42, 261 442, 261 76

Abstract:

Apparatuses and methods for diverting a flow of a liquid precursor during flow stabilization and plasma stabilization stages during PECVD processes are effective at eliminating particle defects in PECVD films deposited using a liquid precursor.

US Patent:

8101531, Jan 24, 2012

Filed:

Sep 23, 2010

Appl. No.:

12/889132

Inventors:

Ming Li - West Linn OR, US
Hu Kang - Tualatin OR, US
Mandyam Sriram - Beaverton OR, US
Adrien LaVoie - Portland OR, US

Assignee:

Novellus Systems, Inc. - San Jose CA

International Classification:

H01L 21/469

US Classification:

438788, 438789, 438792, 427535, 257E21576

Abstract:

Methods and hardware for depositing thin conformal films using plasma-activated conformal film deposition (CFD) processes are described herein. In one example, a method for forming a thin conformal film comprises, in a first phase, generating precursor radicals off of a surface of the substrate and adsorbing the precursor radicals to the surface to form surface active species; in a first purge phase, purging residual precursor from the process station; in a second phase, supplying a reactive plasma to the surface, the reactive plasma configured to react with the surface active species and generate the thin conformal film; and in a second purge phase, purging residual reactant from the process station.

US Patent:

8444092, May 21, 2013

Filed:

Aug 5, 2009

Appl. No.:

12/536160

Inventors:

Ming Li - Murrysville PA, US
James M. Marinelli - Murrysville PA, US
Jiantao Liu - Murrysville PA, US
Paul E. Magnusen - Pittsburgh PA, US
Simon Sheu - Murrysville PA, US
Markus B. Heinimann - New Alexandria PA, US
John Liu - Murrysville PA, US
Luis Fanor Vega - Cheswick PA, US

Assignee:

Alcoa Inc. - Pittsburgh PA

International Classification:

B64C 1/00

US Classification:

244133, 244130, 244200, 244204, 244198, 2441991

Abstract:

Metal sheets and plates having friction-reducing textured surfaces and methods of manufacturing these metal sheets and plates are disclosed herein. In an embodiment, there is provided a transportation vessel that includes at least one metal product having at least one surface that is substantially grooved, wherein the substantially grooved surface forms a riblet topography, the riblet topography including a multiplicity of adjacent permanently rolled longitudinal riblets running along at least a part of the surface, and wherein the riblet topography is coated with at least one coating sufficiently designed and applied to preserve the riblet topography. In an embodiment, the multiplicity of adjacent permanently rolled longitudinal riblets results in a friction-reducing textured surface. In an embodiment, metal product is used in fabricating at least a portion of an aircraft. In an embodiment, metal product is used in fabricating at least a portion of a rotor blade.