Stuart B Krost MD 3618 Lantana Rd STE 201, Lake Worth, FL 33462 (561)2962220 (phone), (561)2962221 (fax)
Gulfcoast Spine Institute 7101 Mariner Blvd, Spring Hill, FL 34609 (352)3414778 (phone), (352)3414477 (fax)
Languages:
English Spanish
Description:
Mr. Taylor works in Lake Worth, FL and 1 other location and specializes in Physical Medicine & Rehabilitation. Mr. Taylor is affiliated with Delray Medical Center, Good Samaritan Medical Center and Palm Beach Gardens Medical Center.
Aaron O. Vanderpool - Gilbert AZ, US Mitchell C. Taylor - Lake Oswego OR, US
Assignee:
Intel Corporation - Santa Clara CA
International Classification:
H01L 21/336
US Classification:
438305
Abstract:
The use of a carbon implant, in addition to the conventional fluorine implant, may significantly reduce the transient enhanced diffusion in P-type source drain extension regions. As a result, resistivity may be reduced, and dopant density may be increased, increasing current drive in some embodiments.
Implanting Carbon To Form P-Type Source Drain Extensions
Aaron O. Vanderpool - Gilbert AZ, US Mitchell C. Taylor - Lake Oswego OR, US
Assignee:
Intel Corporation - Santa Clara CA
International Classification:
H01L 29/78
US Classification:
257336, 257E29278
Abstract:
The use of a carbon implant, in addition to the conventional fluorine implant, may significantly reduce the transient enhanced diffusion in P-type source drain extension regions. As a result, resistivity may be reduced, and dopant density may be increased, increasing current drive in some embodiments.
Aaron O. Vanderpool - Queen Creek AZ, US Mitchell C. Taylor - Lake Oswego OR, US
International Classification:
H01L 21/8232 H01L 21/335
US Classification:
438142
Abstract:
A method including implanting carbon and fluorine into a substrate in an area of the substrate between a source/drain region and a channel, the area designated for a source/drain extension; and a source/drain extension dopant following implanting carbon and fluorine, implanting phosphorous in the area. A method including disrupting a crystal lattice of a semiconductor substrate in an area of the substrate between a source/drain region and a channel designated for a source/drain extension; after disrupting, implanting carbon and fluorine in the area; and implanting phosphorous in the area. A method including performing a boron halo implant before implanting phosphorous to form N-type source/drain extensions. An apparatus including an N-type transistor having a source/drain extension comprising carbon and phosphorous, formed in an area of a substrate between a source/drain region of the transistor and a channel of the transistor.
Cray, Goddard, Miller & Taylor, LLP - Burlington, Iowa since Feb 1992
Attorney
United States District Court 1991 - 1991
Intern for the Honorable Charles R. Wolle
Earst & Young 1989 - 1990
Intern Accountant
Education:
Drake University Law School 1989 - 1992
Doctor of Law (J.D.), Law
University of Iowa - Henry B. Tippie College of Business 1986 - 1989
Bachelor of Business Administration (BBA), Profesional School of Accountin
Skills:
Bankruptcy Real Estate Wills Probate Chapter 7 Creditors' Rights Commercial Litigation Family Law Estate Planning Small Business Wrongful Death Start-ups Courts Trusts Civil Litigation Personal Injury Litigation Estate Administration
Certifications:
American Board of Certification, Consumer Bankruptcy