Prakash C Nahata

US Patent:

53285468, Jul 12, 1994

Filed:

Apr 3, 1992

Appl. No.:

7/862701

Inventors:

William A. Brady - Lake Worth FL
See A. Chan - Coral Springs FL
Norbert Freisitzer - Hyde Park NY
Rolf G. Meinert - Wappingers Falls NY
Prakash Nahata - Coral Springs FL
Julius J. Perlini - Boynton Beach FL
Mario G. M. Tavares - Pompano Beach FL
Douglas A. West - Boca Raton FL

Assignee:

International Business Machines Corp. - Armonk NY

International Classification:

B32B 3100

US Classification:

156584

Abstract:

A dry film photoresist laminator includes a punch and die assembly 24 which punches a rolled sheet dry film photoresist material 14, that is comprised of a dry film photoresist material 18 sandwiched between a Mylar top layer 16 and a polyolefin bottom layer 20, into photoresist decals. The photoresist decals are bonded to a tacky transport tape 40 which carries the decals to a polyolefin peeler assembly 54 that rolls a high tack tape 57 along the polyolefin layer 20 of the decal, thereby peeling it from the decal. The decal is advanced by a laminating assembly 44 which rolls the decal onto a heated wafer 72, thereby bonding the exposed photoresist material 18 to the wafer 72. Bonded wafer 72 and decal 14 are removed from the transport tape 40. A tape transport assembly 44 carrying the transport tape and decal is advanced through the various process steps.