Quan T Chau

US Patent:

20100108261, May 6, 2010

Filed:

Oct 30, 2009

Appl. No.:

12/609377

Inventors:

Jason Augustino - Fremont CA, US
Quan Chau - San Jose CA, US
Keith William Gaff - Fremont CA, US
Hanh Tuong Ha - San Jose CA, US
Brett C. Richardson - San Ramon CA, US
Harmeet Singh - Fremont CA, US

Assignee:

Lam Research Corporation - Fremont CA

International Classification:

C23F 1/08
H01L 21/306

US Classification:

1563451

Abstract:

A lower electrode assembly for use in a plasma processing chamber comprises a metal base and upper and lower edge rings. The metal base comprises metal plates brazed together and forming a brazed line on a lower side surface of the base, an edge ring support surface extending horizontally inwardly from the lower side surface and an upper side surface above the edge ring support surface. The upper edge ring comprises a lower surface mounted on the edge ring support surface and the lower edge ring surrounds the lower side surface of the base with a gap between opposed surfaces of the upper and lower edge rings and between the lower edge ring and the outer periphery of the base. The gap has an aspect ratio of total gap length to average gap width sufficient to impede arcing at the location of the braze line.