Richard M Farrell

US Patent:

7268339, Sep 11, 2007

Filed:

Sep 27, 2005

Appl. No.:

11/238001

Inventors:

Richard Farrell - East Killingly CT, US
Kofi Vanderpuye - Sommerville MA, US

Assignee:

Radiation Monitoring Devices, Inc. - Watertown MA

International Classification:

H01L 31/00

US Classification:

2502141, 257438, 257496, 257E31063, 438 91, 438965

Abstract:

A method is provided for forming a semiconductor-detection device that provides internal gain. The method includes forming a plurality of bottom trenches in a bottom surface of an n-doped semiconductor wafer; and forming a second plurality of top trenches in a top surface of the semiconductor wafer. The bottom surface and the top surface are opposed surfaces. Each of the bottom trenches is substantially parallel to and substantially juxtaposed to an associated one of the top trenches. The method further includes doping the semiconductor wafer with at least one p-type dopant to form a p-region that defines at least one n-well within the p-region, wherein a p-n junction is formed substantially at an interface of the n-well and the p-region; and removing a portion of the bottom surface to form a remaining-bottom surface, wherein a portion of the n-well forms a portion of the remaining-bottom surface.