Richard J Himics
age ~50
from Morristown, NJ
- Also known as:
-
- Richard John Himics
- Dick J Himics
- Rick J Himics
- Richard J Himils
Richard Himics Phones & Addresses
- Morristown, NJ
- Old Bridge, NJ
- Morris Plains, NJ
- Florham Park, NJ
- Skillman, NJ
- Morgan, NJ
License Records
Richard J Himics
Address:
Morris Plains, NJ
License #:
19HC00584500 - Active
Category:
HVACR
Issued Date:
Sep 15, 2015
Expiration Date:
Jun 30, 2018
Type:
Master HVACR Contractor
Richard J Himics
Address:
Morris Plains, NJ
License #:
19HC00584500 - Active
Category:
HVACR
Issued Date:
Sep 15, 2015
Expiration Date:
Jun 30, 2018
Type:
Master HVACR Contractor
Richard J Himics
Address:
Morris Plains, NJ
License #:
19HC00584500 - Active
Category:
HVACR
Issued Date:
Sep 15, 2015
Expiration Date:
Jun 30, 2018
Type:
Master HVACR Contractor
Richard J Himics
Address:
Morris Plains, NJ
License #:
19HC00584500 - Active
Category:
HVACR
Issued Date:
Sep 15, 2015
Expiration Date:
Jun 30, 2018
Type:
Master HVACR Contractor
Us Patents
-
Method Of Transferring A Surface Relief Pattern From A Poly(Olefin Sulfone) Layer To A Metal Layer
view source -
US Patent:40453189, Aug 30, 1977
-
Filed:Jul 30, 1976
-
Appl. No.:5/710184
-
Inventors:Richard Joseph Himics - Skillman NJ
Nitin Vithalbhai Desai - Edison NJ
Eugene Samuel Poliniak - Willingboro NJ -
Assignee:RCA Corporation - New York NY
-
International Classification:C23C 1500
-
US Classification:204192E
-
Abstract:This invention pertains to a method of transferring a surface relief pattern from a poly(olefin sulfone) layer to a metal layer wherein the poly(olefin sulfone) layer is exposed to ultra violet radiation prior to sputter etching the surface relief pattern into the metal layer.
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Method Of Preparing A Pattern On A Silicon Wafer
view source -
US Patent:39649091, Jun 22, 1976
-
Filed:Mar 6, 1975
-
Appl. No.:5/555728
-
Inventors:Richard Joseph Himics - Skillman NJ
Scott Oliver Graham - Princeton NJ
Daniel Louis Ross - Princeton NJ -
Assignee:RCA Corporation - New York NY
-
International Classification:G03C 500
G03C 168 -
US Classification:96 362
-
Abstract:Copolymers of certain keto-olefins and SO. sub. 2 are sensitive to light and form films useful as photoresists in the manufacture of printed circuits, integrated circuits, printing plates and the like.
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Olefin-So.sub.2 Copolymer Film Adhesion To A Substrate
view source -
US Patent:40072959, Feb 8, 1977
-
Filed:Jul 28, 1975
-
Appl. No.:5/599589
-
Inventors:Eugene Samuel Poliniak - Willingboro NJ
Richard Joseph Himics - Skillman NJ
Henry Wielicki - Wyndmoor PA -
Assignee:RCA Corporation - New York NY
-
International Classification:H04N 582
-
US Classification:427 43
-
Abstract:To improve the adherence of an olefin-SO. sub. 2 copolymer film employed as an electron beam resist to a metallic substrate, a thin film of gold is first applied to the substrate. The resulting bond is strong enough to withstand exposure to electron beams, development of the resist film and electroplating of the film witout undercutting, lifting or distortion of the film.
-
Photosensitive Copolymer On Silicon Support
view source -
US Patent:40544540, Oct 18, 1977
-
Filed:Feb 20, 1976
-
Appl. No.:5/659976
-
Inventors:Richard Joseph Himics - Skillman NJ
Scott Oliver Graham - Princeton NJ
Daniel Louis Ross - Princeton NJ -
Assignee:RCA Corporation - New York NY
-
International Classification:G03C 168
G03C 500 -
US Classification:96 67
-
Abstract:Copolymers of certain keto-olefins and SO. sub. 2 are sensitive to light and form films useful as photoresists in the manufacture of printed circuits, integrated circuits, printing plates and the like.
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Photoresist Containing A Thiodipropionate Compound
view source -
US Patent:40594491, Nov 22, 1977
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Filed:Sep 30, 1976
-
Appl. No.:5/728426
-
Inventors:Thomas Francis Rosenkranz - Flemington NJ
Richard Joseph Himics - Skillman NJ -
Assignee:RCA Corporation - New York NY
-
International Classification:G03C 152
G03C 168 -
US Classification:96 91D
-
Abstract:This invention relates to a photoresist consisting of a novolak resin and a sensitizer containing a thiodipropionate compound.
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Preparation Of Olefin So.sub.2 Copolymer Electron Beam Resist Films And Use Of Same For Recording
view source -
US Patent:39353311, Jan 27, 1976
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Filed:Jan 9, 1975
-
Appl. No.:5/539851
-
Inventors:Eugene Samuel Poliniak - Willingboro NJ
Howard George Scheible - Livingston NJ
Richard Joseph Himics - Skillman NJ -
Assignee:RCA Corporation - New York NY
-
International Classification:B05D 306
G11B 900 -
US Classification:427 43
-
Abstract:In preparing an electron beam resist film of a copolymer of an olefin and SO. sub. 2, the steps of removing insoluble particles, drying the films under high vacuum and storing them in a moisture-free atmosphere are required to prevent cracking of the films during development.
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Development Of Poly(1-Methyl-1-Cyclopentene-So.sub.2) Electron Beam Resist
view source -
US Patent:39353320, Jan 27, 1976
-
Filed:Jan 9, 1975
-
Appl. No.:5/539801
-
Inventors:Eugene Samuel Poliniak - Willingboro NJ
Richard Joseph Himics - Skillman NJ -
Assignee:RCA Corporation - New York NY
-
International Classification:B05D 306
G11B 900 -
US Classification:427 43
-
Abstract:Three developer solvents 2-methylcyclohexanone, 3-methylcyclohexanone, and a mixture of acetonyl acetate and acetone, improve the resolution of electron beam exposed films of poly(1-methyl-1-cyclopentene-SO. sub. 2) copolymers.
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Method For Purifying Methyl Alkyl Siloxane Lubricants
view source -
US Patent:41592760, Jun 26, 1979
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Filed:Aug 29, 1978
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Appl. No.:5/937837
-
Inventors:Nitin V. Desai - Somerset NJ
Richard J. Himics - Trumbull CT -
Assignee:RCA Corporation - New York NY
-
International Classification:C07F 720
-
US Classification:2604482E
-
Abstract:A method of purifying methyl alkyl siloxane lubricants of the formula ##STR1## wherein R is an alkyl group of 4-20 carbon atoms and x is an integer which comprises multiply extracting with acetone.
Richard John Himics
view sourceFriends:
John M. Hills Jr., Andrea Glauner Shemeley, Jen Williams, Trixie Dion
Classmates
Richard Himics
view sourceSchools:
Ridgedale Middle School Florham Park NJ 1984-1988
Community:
Sharon Love, Gwyn Thompson, Steven King, Chad White, Roberta Calderella
Ridgedale Middle School, ...
view sourceGraduates:
Cherielle Gallagher (1998-2002),
Richard Himics (1984-1988),
Larisa Lakhman (1994-1998),
Adam Flanner (2000-2004),
Gloria McCarthy (1997-2001)
Richard Himics (1984-1988),
Larisa Lakhman (1994-1998),
Adam Flanner (2000-2004),
Gloria McCarthy (1997-2001)
Youtube
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