Robert E Kaufman

US Patent:

6361669, Mar 26, 2002

Filed:

Aug 15, 2000

Appl. No.:

09/638961

Inventors:

Robert Kaufman - Canoga Park CA
Gary C. Downes - Moorpark CA

Assignee:

Technic Inc. - Cranston RI

International Classification:

C23C 1400

US Classification:

20429827, 42729827

Abstract:

A plating apparatus and methodology is disclosed that is particularly useful in improving the plating rate, improving the plating of via holes, improving the uniformity of the plating deposition across the surface of the wafer, and minimizing damage to the wafer. With regard to improving the plating rate and the plating of via holes, the plating apparatus and method immerses a wafer in a plating fluid bath and continuously directs plating fluid towards the surface of the wafer. Immersing the wafer in a plating fluid bath reduces the occurrence of trapped gas pockets within via holes which makes it easier to plate them. The continuous directing of plating fluid towards the surface of the wafer increases the ion concentration gradient which is, in turn, increases the plating rate. With regard to improving the uniformity of the plating deposition, the plating apparatus and method effectuate random horizontal fluid flow within the bath to reduce the occurrence of relatively long horizontal fluid flow that causes non-uniform plating deposition across the surface of the wafer. In addition, the plating apparatus and method configure the electrostatic field between the anode and cathode in a manner that improves the uniformity of the current distribution across the surface of the wafer to provide a more uniform plating of the wafer.

US Patent:

6419805, Jul 16, 2002

Filed:

Aug 15, 2000

Appl. No.:

09/638709

Inventors:

Robert Kaufman - Canoga Park CA
Gary C. Downes - Moorpark CA

Assignee:

Technic Inc. - Cranston RI

International Classification:

C25B 900

US Classification:

204273, 204232, 204224 R, 118612

Abstract:

A plating apparatus is disclosed that is particularly useful in improving the plating rate, improving the plating of via holes, improving the uniformity of the plating deposition across the surface of the wafer, and minimizing damage to the wafer. With regard to improving the plating rate and the plating of via holes, the plating apparatus immerses a wafer in a plating fluid bath and continuously directs plating fluid towards the surface of the wafer. Immersing the wafer in a plating fluid bath reduces the occurrence of trapped gas pockets within via holes which makes it easier to plate them. With regard to improving the uniformity of the plating deposition, the plating apparatus and method effectuate random horizontal fluid flow within the bath to reduce the occurrence of relatively long horizontal fluid flow that causes non-uniform plating deposition across the surface of the wafer.

US Patent:

7119121, Oct 10, 2006

Filed:

Aug 25, 2005

Appl. No.:

11/212330

Inventors:

John Gregory Slatter - Bellevue WA, US
Raymond Charles Grabiak - Maryland Heights MO, US
Robert John Kaufman - University City MO, US

Assignee:

Pfizer Inc. - New York NY

International Classification:

A61K 31/13
C07C 211/00

US Classification:

514648, 564315, 564316

Abstract:

Novel 3,3-diphenylpropylamines of the formulaand stereoisomers and physiologically acceptable acid addition salt thereof; wherein R, R, R, R, R, and Rare as defined herein; methods of use thereof; and pharmaceutical compositions thereof.

US Patent:

7291648, Nov 6, 2007

Filed:

Aug 24, 2006

Appl. No.:

11/466814

Inventors:

John Gregory Slatter - Bellevue WA, US
Raymond Charles Grabiak - Maryland Heights MO, US
Robert John Kaufman - University City MO, US

Assignee:

Pfizer Inc. - New York NY

International Classification:

A61K 31/13
C07C 211/00

US Classification:

514648, 564315, 564316

Abstract:

Novel 3,3-diphenylpropylamines of the formula.

US Patent:

7387327, Jun 17, 2008

Filed:

Jun 24, 2005

Appl. No.:

11/165945

Inventors:

Allan Tencer - Seattle WA, US
Robert Philip Kaufman - Seattle WA, US
Charles Newman Mock - Seattle WA, US

Assignee:

University of Washington - Seattle WA

International Classification:

B60N 2/06
B60N 2/427

US Classification:

296 681, 296 6511, 296 6513, 29618712, 280751, 2972161, 29721618

Abstract:

A system for managing an occupant in an occupant compartment of an automotive vehicle, a structure for use in an automobile, and methods of use thereof are provided for protecting an occupant during a near side impact collision.

US Patent:

20050004223, Jan 6, 2005

Filed:

Apr 26, 2004

Appl. No.:

10/832555

Inventors:

John Slatter - Bellevue WA, US
Raymond Charles Grabiak - Maryland Heights MO, US
Robert Kaufman - University City MO, US

International Classification:

A61K031/195
A61K031/137

US Classification:

514567000, 514649000, 562442000, 564336000

Abstract:

Novel 3,3-diphenylpropylamines of the formula and any stereoisomers thereof; wherein Rrepresents —H or —CH; Rrepresents —CX, —CRX, —CRRX, or —CRRH, wherein X represents halogen, and Rand Rindependently represent —H or —(C-Calkyl), optionally substituted with halogen; Rand Rindependently represent —H, —OCH, —OH, —CONH, —SONH, —F, —Cl, —Br, —I, —CF, or —(C-Calkyl), optionally substituted with one or two —OH, —(C-Calkoxy), —COOH, or —CO—O—(C-Calkyl); and Rand Rindependently represent C-Calkyl, optionally substituted with hydroxyl, wherein Rand Rtogether contain at least three carbon atoms, and wherein Rand Rmay form a ring together with the amine nitrogen; provided that Rcomprises at least one halogen; or a physiologically acceptable acid addition salt thereof; the 3,3-diphenylpropylamines for use as medicaments, use of the 3,3-diphenylpropylamines for the manufacture of specific medicaments, and pharmaceutical compositions comprising the 3,3-diphenylpropylamines. The present invention also includes a method of treatment involving administration of the 3,3-diphenylpropylamines.

US Patent:

62874438, Sep 11, 2001

Filed:

Aug 15, 2000

Appl. No.:

9/638496

Inventors:

Robert Kaufman - Canoga Park CA
Gary C. Downes - Moorpark CA
Daniel J. Gramarossa - Moorpark CA

Assignee:

Technic Inc. - Cranston RI

International Classification:

C25D 500
C25D 520
C25D 700
C25D 1132

US Classification:

205 96

Abstract:

A plating apparatus and methodology is disclosed that is particularly useful in improving the plating rate, improving the plating of via holes, improving the uniformity of the plating deposition across the surface of the wafer, and minimizing damage to the wafer. With regard to improving the plating rate and the plating of via holes, the plating apparatus and method immerses a wafer in a plating fluid bath and continuously directs plating fluid towards the surface of the wafer. Immersing the wafer in a plating fluid bath reduces the occurrence of trapped gas pockets within via holes which makes it easier to plate them. The continuous directing of plating fluid towards the surface of the wafer increases the ion concentration gradient which is, in turn, increases the plating rate. With regard to improving the uniformity of the plating deposition, the plating apparatus and method effectuate random horizontal fluid flow within the bath to reduce the occurrence of relatively long horizontal fluid flow that causes non-uniform plating deposition across the surface of the wafer.

US Patent:

53233018, Jun 21, 1994

Filed:

Dec 8, 1992

Appl. No.:

7/986718

Inventors:

Robert Kaufman - North Hollywood CA

International Classification:

F21V 700

US Classification:

362287

Abstract:

A studio lighting device for supplying light having a selected color temperature to a subject, comprising: an electrically powered light source connected to receive operating power which establishes a voltage across the source, the source being operative to produce light having a color temperature which varies as a function of the voltage; a first reflecting mirror for reflecting light in a first wavelength range, the first mirror being disposed at a location for reflecting a quantity of light from the source to the subject; a second reflecting mirror for reflecting light in a second wavelength range which is different from the first wavelength range, the second mirror being disposed at a location for reflecting a quantity of light from the source to the subject; and means connected for displacing the second reflecting mirror relative to the first reflecting mirror in order to alter the ratio between the quantity of light reflected to the subject by the first mirror and the quantity of light reflected to the subject by the second mirror.

Address:

5309 Somerset Dr SE, Bellevue, WA 98006

VIN:

5TEUU42N57Z379061

Make:

TOYOTA

Model:

TACOMA

Year:

2007