Robert Kavanagh

US Patent:

6841331, Jan 11, 2005

Filed:

Feb 26, 2002

Appl. No.:

10/083675

Inventors:

George G. Barclay - Jefferson MA, US
Stefan J. Caporale - Austin TX, US
Robert J. Kavanagh - Cambridge MA, US
Nick Pugliano - Grafton MA, US

Assignee:

Shipley Company, L.L.C. - Marlborough MA

International Classification:

G03F 7004

US Classification:

4302701, 430326, 430905

Abstract:

The invention includes new polymers and methods for providing such polymers and photoresists that comprises the polymers. Methods of the invention include those that comprise providing a reaction mixture and adding over the course of a polymerization reaction one or more polymerization reagents to the reaction mixture to provide the polymer. Photoresists containing a polymer of the invention can exhibit significantly improved lithographic properties.

US Patent:

7090968, Aug 15, 2006

Filed:

Oct 10, 2003

Appl. No.:

10/683532

Inventors:

George G. Barclay - Jefferson MA, US
Zhibiao Mao - Shrewsbury MA, US
Robert J. Kavanagh - Cambridge MA, US

Assignee:

Shipley Company, L.L.C. - Marlborough MA

International Classification:

G03F 7/30

US Classification:

430326, 4302701, 430905, 430910, 526270, 526281, 526282

Abstract:

The present invention includes polymers and photoresist compositions that comprise the polymers as a resin binder component. Photoresists of the invention include chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths such as sub-200 nm, particularly 193 nm. Polymers of the invention contain in specified molar ratios both nitrile and photoacid labile groups that have an alicyclic moiety, particularly a bridged bicyclic or tricyclic group or other caged group. Polymers and resists of the invention can exhibit substantial resistance to plasma etchants.

US Patent:

7205087, Apr 17, 2007

Filed:

Apr 18, 2003

Appl. No.:

10/418740

Inventors:

Robert J. Kavanagh - Natick MA, US
James W. Thackeray - Braintree MA, US

Assignee:

Shipley Company, L.L.C. - Marlborough MA

International Classification:

G03F 7/004

US Classification:

4302701, 430306, 430320, 430322, 430434, 430494

Abstract:

New photoresists are provided that are suitable for short wavelength imaging, including sub-200 nm, particularly 193 nm. Resists of the invention comprise a polymer that is preferably substantially free of aromatic moieties and comprises photoacid-labile repeat units, a photoactive components such as one or more photoacid generator compounds and a solvent component that comprises methyl isoamyl ketone (5-methyl-2-hexanone).

US Patent:

7208261, Apr 24, 2007

Filed:

Apr 5, 2004

Appl. No.:

10/819686

Inventors:

George G. Barclay - Jefferson MA, US
Stefan J. Caporale - Austin TX, US
Robert J. Kavanagh - Cambridge MA, US
Nick Pugliano - Grafton MA, US

Assignee:

Shipley Company, L.L.C. - Marlborough MA

International Classification:

G03F 7/004
G03F 7/30

US Classification:

4302701, 430325, 430326, 430905

Abstract:

The invention includes new polymers and methods for providing such polymers and photoresists that comprises the polymers. Methods of the invention include those that comprise providing a reaction mixture and adding over the course of a polymerization reaction one or more polymerization reagents to the reaction mixture to provide the polymer. Photoresists containing a polymer of the invention can exhibit significantly improved lithographic properties.

US Patent:

7270935, Sep 18, 2007

Filed:

Mar 8, 2005

Appl. No.:

11/075544

Inventors:

Young C. Bae - Worcester MA, US
Robert J. Kavanagh - Natick MA, US

Assignee:

Rohm and Haas Electronic Materials LLC - Marlborough MA

International Classification:

G03F 7/004

US Classification:

4302701, 430326, 430905, 430910

Abstract:

Cyanoadamantyl compounds, polymers that comprise polymerized units of such compounds, and photoresist compositions that comprise such polymers are provided. Preferred polymers of the invention are employed in photoresists imaged at wavelengths less than 250 nm such as 248 nm and 193 nm.

US Patent:

7309750, Dec 18, 2007

Filed:

Mar 8, 2005

Appl. No.:

11/075545

Inventors:

Young C. Bae - Worcester MA, US
Robert J. Kavanagh - Natick MA, US

Assignee:

Rohm and Haas Electronic Materials LLC - Marlborough MA

International Classification:

C08F 10/00
G03F 7/004

US Classification:

526282, 4302701, 430905, 430910

Abstract:

Cyanoadamantyl compounds, polymers that comprise polymerized units of such compounds, and photoresist compositions that comprise such polymers are provided. Preferred polymers of the invention are employed in photoresists imaged at wavelengths less than 250 nm such as 248 nm and 193 nm.

US Patent:

20020187420, Dec 12, 2002

Filed:

Feb 25, 2002

Appl. No.:

10/082769

Inventors:

George Barclay - Jefferson MA, US
Robert Kavanagh - Natick MA, US

Assignee:

Shipley Company, L.L.C. - Marlborough MA

International Classification:

G03F007/004

US Classification:

430/270100, 430/910000, 430/905000, 430/326000, 526/319000

Abstract:

The present invention includes polymers and photoresist compositions that comprise the polymers as a resin binder component. Polymers of the invention contain a hydroxyadamantyl functionality. Photoresists of the invention include chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths such as sub-200 nm, particularly 193 nm.

US Patent:

6692888, Feb 17, 2004

Filed:

Oct 7, 1999

Appl. No.:

09/413763

Inventors:

George G. Barclay - Jefferson MA
Zhibiao Mao - Shrewsbury MA
Robert J. Kavanagh - Cambridge MA

Assignee:

Shipley Company, L.L.C. - Marlborough MA

International Classification:

G03F 7039

US Classification:

4302701, 430910, 526270, 526281, 526282

Abstract:

The present invention includes polymers and photoresist compositions that comprise the polymers as a resin binder component. Photoresists of the invention include chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths such as sub-200 nm, particularly 193 nm. Polymers of the invention contain in specified molar ratios both nitrile and photoacid labile groups that have an alicyclic moiety, particularly a bridged bicyclic or tricyclic group or other caged group. Polymers and resists of the invention can exhibit substantial resistance to plasma etchants.