Robert Douglas Mohondro

US Patent:

6406836, Jun 18, 2002

Filed:

Mar 21, 2000

Appl. No.:

09/531885

Inventors:

Robert Mohondro - Sykesville MD
Qingyuan Han - Columbia MD
Ivan Berry - Ellicott City MD
Mahmoud Dahimene - Sunnyvale CA
Stuart Rounds - Frederick MD

Assignee:

Axcelis Technologies, Inc. - Beverly MA

International Classification:

G03F 736

US Classification:

430329, 430311, 430313, 430314, 438706, 216 67

Abstract:

A method of stripping a photoresist layer comprising applying a re-coating material on the photoresist layer which extends through and fills openings in a first layer on which the photoresist layer is disposed, ashing the stack comprised of the photoresist layer and the re-coating material, and removing such re-coating material as remains in the openings in the first layer after the ashing.

US Patent:

6503693, Jan 7, 2003

Filed:

Dec 2, 1999

Appl. No.:

09/452878

Inventors:

Robert Douglas Mohondro - Sykesville MD
John Scott Hallock - Potomac MD

Assignee:

Axcelis Technologies, Inc. - Beverly MA

International Classification:

G03C 556

US Classification:

430328, 430311, 430315, 430324, 430325, 430330, 216 49, 438692, 427337

Abstract:

A process for altering exposed and developed photoresist features. The photoresist features are exposed to at least one compound that will react with at least one of itself and at least one component of the photoresist. The reaction takes place in the presence of at least one component of the photoresist. The photoresist features are exposed to reaction-initiating energy during at least one time selected from the group consisting of prior to, simultaneous with and subsequent to exposing the photoresist features to the at least one compound.

US Patent:

6214524, Apr 10, 2001

Filed:

May 12, 1999

Appl. No.:

9/310090

Inventors:

Robert Douglas Mohondro - Sykesville MD

Assignee:

Fusion Systems Corporation - Rockville MD

International Classification:

G03F 700
H01L 21027

US Classification:

430311

Abstract:

A semiconductor device preparing according to a process comprising the step of photolithographic features formed in a photoresist including exposing the photoresist to at least one material selected from the group consisting of at least one amine, at least one amide, at least one aldehyde, and nitrogen.

US Patent:

60570849, May 2, 2000

Filed:

Oct 3, 1997

Appl. No.:

8/943623

Inventors:

Robert Douglas Mohondro - Sykesville MD

Assignee:

Fusion Systems Corporation - Rockville MD

International Classification:

G03F 700

US Classification:

430330

Abstract:

A process for reducing shrinkage of photolithographic features formed in a photoresist including exposing the photoresist to at least one material selected from the group consisting of at least one amine, at least one amide, at least one aldehyde, and nitrogen.

US Patent:

20230096972, Mar 30, 2023

Filed:

Dec 7, 2022

Appl. No.:

18/062661

Inventors:

- Montville NJ, US
Rajnish Tiwari - Harrison NJ, US
Robert D. Mohondro - Hanover PA, US

International Classification:

H01L 21/67
B05D 1/00
H01L 21/02
G03F 7/16

Abstract:

A system and/or method for coating a substrate. The system may include a chuck for holding and rotating the substrate, a dispensing subsystem for dispensing a coating material onto the substrate, and a shield member. The shield member may be movable towards and away from the substrate during the coating procedure. The shield member may have an inverted funnel shape. The shield member may include a central chamber through which a solvent vapor flows and a peripheral chamber that is fluidly separated from the central chamber through which a gas flows. During a coating procedure, the shield member may be moved very close to the substrate and the solvent vapor and gas may flow onto the substrate to create a solvent rich ambient around the substrate and prevent aerosols of the coating material from redepositing onto the substrate after being flung off due to spinning of the substrate.