Robert F Rogler

US Patent:

51642867, Nov 17, 1992

Filed:

Jan 24, 1992

Appl. No.:

7/825240

Inventors:

Andrew J. Blakeney - Seekonk MA
Robert Rogler - Rehoboth MA
Medhat Toukhy - Barrington RI
David Brzozowy - Lincoln RI

Assignee:

OCG Microelectronic Materials, Inc. - Cheshire CT

International Classification:

G03E 732
G03C 500

US Classification:

430331

Abstract:

Described herein is a developer for alkali developable photoresists which comprises the addition of a selected fluorinated amphoteric surfactant to an aqueous basic solution.

US Patent:

52761266, Jan 4, 1994

Filed:

Feb 8, 1993

Appl. No.:

8/015055

Inventors:

Robert F. Rogler - Rehoboth MA

Assignee:

OCG Microelectronic Materials, Inc. - West Paterson NJ

International Classification:

C08G 824
G03C 152
B05D 512
B29D 2200

US Classification:

528155

Abstract:

A method of planarizing topographical features on a substrate for subsequent coating of a radiation sensitive composition thereon comprising: (1) applying thereover a coating of a planarizing coating layer comprising a planarization layer of novolak resin made by the condensation reaction of an aldehyde source with a phenolic monomeric source comprising at least 25 mole percent of ortho-secondary butyl phenol and a suitable solvent; and (2) heating said coated substrate to remove essentially all of said solvent therefrom and cause said coating to reflow, thereby planarizing the topographical features.

US Patent:

50699962, Dec 3, 1991

Filed:

Sep 18, 1989

Appl. No.:

7/408849

Inventors:

Robert F. Rogler - Rehoboth MA

Assignee:

OCG Microelectronic Materials, Inc. - Cheshire CT

International Classification:

G03C 174
G03F 7023
G03F 732

US Classification:

430168

Abstract:

The process of developing an image-wise exposed positive-working photoresist-coated substrate comprising the steps of: (1) coating said substrate with a radiation-sensitive composition useful as a photoresist; said composition comprising an admixture of: (a) at least one alkali-soluble binder resin; (b) at least one photoactive compound; and (c) a sufficient amount of at least one solvent to dissolve (a) and (b); subject to the proviso that said photoactive compound (b) is a mixture of fully and partially esterified o-naphthoquinone diazide esters of a polyhydroxyaromatic compound having at least four hydroxyl groups capable of being esterified by said diazide groups.