Roger D Olson

US Patent:

55564739, Sep 17, 1996

Filed:

Oct 27, 1995

Appl. No.:

8/549130

Inventors:

Roger A. Olson - Amery WI
John Wary - Noblesville IN
William F. Beach - Bridgewater NJ

Assignee:

Specialty Coating Systems, Inc.

International Classification:

C23C 1600

US Classification:

118719

Abstract:

Chemical vapor deposition apparatus is provided for the quick and efficient deposition of Parylene AF4 onto silicon wafers in the production of semiconductor chips. The apparatus includes an oilless, dry vacuum pump connected rierctly to the deposition chamber, and a liquid nitrogen cooled cold trap connected to the outlet of the vacuum pump. The apparatus further includes a vacuum by-pass assembly wherein a high-conductance vacuum outlet is utilized to quickly reduce pressure in the chamber system and a low-conductance vacuum manifold outlet is utilized to maintain vacuum flow during the deposition procedure.

US Patent:

57097534, Jan 20, 1998

Filed:

Oct 27, 1995

Appl. No.:

8/549395

Inventors:

Roger A. Olson - Amery WI
William F. Beach - Bridgewater NJ
John Wary - Noblesville IN

Assignee:

Specialty Coating Sysetms, Inc. - Indianapolis IN

International Classification:

C23C 1600

US Classification:

118719

Abstract:

Chemical vapor deposition apparatus is provided for the quick and efficient deposition of Parylene AF4 onto silicon wafers in the production of semiconductor chips. The apparatus includes a heated and cooled dimer receptacle for fast and efficient vaporization of parylene dimer material.

US Patent:

53124898, May 17, 1994

Filed:

Sep 30, 1993

Appl. No.:

8/129471

Inventors:

Roger A. Olson - Amery WI

Assignee:

Union Carbide Chemicals & Plastics Technology Corporation - Danbury CT

International Classification:

C23C 1600

US Classification:

118719

Abstract:

Apparatus are disclosed for coating the inside surfaces of hollow objects with a coating material by vapor deposition wherein the objects are removably attached to a rotary fixture which is employed for holding the objects while the coating process is being conducted. The rotary fixture comprises a hollow chamber rotatably mounted about an axis of rotation wherein the chamber can have a plurality of connecting union assemblies which secure the objects and provide communication between the inside surfaces of the objects and the inside space of the hollow chamber. The coating material is introduced from the interior space of the hollow chamber to the interior space of the objects under vacuum conditions.

US Patent:

55363172, Jul 16, 1996

Filed:

Oct 27, 1995

Appl. No.:

8/549133

Inventors:

Kermit Crain - Amery WI
John Wary - Noblesville IN
Roger A. Olson - Amery WI
William F. Beach - Bridgewater NJ

Assignee:

Specialty Coating Systems, Inc. - Indianapolis IN

International Classification:

C23C 1600

US Classification:

118664

Abstract:

A parylene deposition apparatus includes a quartz crystal thickness/rate controller for controlling the deposition of Parylene AF4 onto silicon wafers in the production of semiconductor chips. The crystal is located within the deposition chamber to receive a coating of parylene consistent with that of the substrate being coated. The vaporization chamber of the apparatus includes a heat transfer receptacle for receiving parylene dimer to be vaporized. The heat transfer receptacle includes heating and cooling devices to control the temperature thereof. In operation, parylene monomer deposits onto the surface of the crystal during deposition thereby varying the vibration frequency of the crystal. The rate of change in frequency can be directly correlated with the rate of monomer deposition. The crystal is associated with a microcontroller and set-point comparator, and further with the heating and cooling elements of the vaporization chamber to effectively monitor the thickness of the parylene coating during deposition, and control the rate of vaporization of the dimer.

US Patent:

54240972, Jun 13, 1995

Filed:

Sep 30, 1993

Appl. No.:

8/129291

Inventors:

Roger A. Olson - Amery WI
Frederick W. Kopitzke - Indianapolis IN
Joseph P. O'Connor - Carmel IN

Assignee:

Specialty Coating Systems, Inc. - Indianapolis IN

International Classification:

C23C 1602
C23C 1654

US Classification:

4272555

Abstract:

Continuous vapor deposition apparatus for coating objects with a coating material, e. g. , parylene, are disclosed. The apparatus comprise an entrance chamber for loading the objects, a process chamber for coating the objects, and an exit chamber for removing the objects. Coating material is introduced into the process chamber under vacuum conditions in a vaporized state. The pressure in the process chamber can be controlled by modulating the rate of introduction of the coating material with a modulating valve in response to the pressure in the process chamber. A process for continuously coating objects by vapor deposition under vacuum conditions, suitable for use in the apparatus, is also disclosed.

US Patent:

49675958, Nov 6, 1990

Filed:

Apr 24, 1989

Appl. No.:

7/341913

Inventors:

Roger Olson - Amery WI

International Classification:

G01N 910

US Classification:

73440

Abstract:

A device (10) for testing samples of aviation fuel drained through a drain valve of an aircraft fuel system is disclosed including a pin (22) upstanding from the bottom (18) and extending concentrically with the sidewall (16) out of and above the inlet (20) of a container (12). Thus, the fuel draining from the drain valve is caught and collected by the inlet (20) and is contained in the container (12) for visual observation for particulate contamination and liquid separation. Device (10) further includes specific gravity floats (32, 34) having densities to float in water but not in jet fuel and gasoline and to float in water and jet fuel but not in gasoline, respectively. Thus, by observing the condition of the floats (32, 34), the pilot can quickly, accurately, and clearly determine whether the sample is gasoline, jet fuel, or water. Device (10) further includes a screen (36) anchored to the sidewall (16) of the container (12) adjacent the inlet (20) for preventing passage of the floats (32, 34) from the container (12) through the inlet (20) while permitting generally unrestricted flow of liquid into the container (12) through the inlet (20). In the most preferred form, pin (22) upstands from the bottom (18) of the container (12) and passes through a central aperture (40) formed in the screen (36).

US Patent:

59085061, Jun 1, 1999

Filed:

Oct 10, 1996

Appl. No.:

8/728669

Inventors:

Roger Allen Olson - Amery WI
Frederick William Kopitzke - Indianapolis IN
Joseph Patrick O'Connor - Carmel IN

Assignee:

Specialty Coating Systems, Inc. - Indianapolis IN

International Classification:

C23C 1600

US Classification:

118708

Abstract:

Continuous vapor deposition apparatus for coating objects with a coating material, e. g. , parylene, are disclosed. The apparatus comprise an entrance chamber for loading the objects, a process chamber for coating the objects, and an exit chamber for removing the objects. Coating material is introduced into the process chamber under vacuum conditions in a vaporized state. The pressure in the process chamber can be controlled by modulating the rate of introduction of the coating material with a modulating valve in response to the pressure in the process chamber. A process for continuously coating objects by vapor deposition under vacuum conditions, suitable for use in the apparatus, is also disclosed.