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Ronald L Bowman

age ~83

from Fordland, MO

Also known as:
  • Ronald Ml Bowman
  • Donald L Bowman
  • Janice N Bowman
  • Ronald L Boiwman
  • Rl Bowman
Phone and address:
219 Schultz St, Fordland, MO 65652
(417)7382232

Ronald Bowman Phones & Addresses

  • 219 Schultz St, Fordland, MO 65652 • (417)7382232
  • Cumberland, RI
  • Peoria, AZ
  • Northglenn, CO
  • Rogersville, MO
  • Buena Vista, CO
  • Casper, WY
  • Bloomington, IL

Work

  • Company:
    Dakkota integrated systems
    Dec 2012
  • Position:
    Production worker

Education

  • School / High School:
    Webberville High School- Webberville, MI
    Sep 1974
  • Specialities:
    HIGH SCHOOL DIPLOMA

Specialities

Business Law

Medicine Doctors

Ronald Bowman Photo 1

Ronald R. Bowman

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Specialties:
Orthopaedic Surgery
Work:
Tigard Orthopedic & Fracture Clinic
9445 SW Locust St, Portland, OR 97223
(503)3521313 (phone), (503)3521314 (fax)
Education:
Medical School
Oregon Health & Science University School of Medicine
Graduated: 1985
Procedures:
Arthrocentesis
Shoulder Arthroscopy
Shoulder Surgery
Conditions:
Fractures, Dislocations, Derangement, and Sprains
Internal Derangement of Knee Cartilage
Rotator Cuff Syndrome and Allied Disorders
Internal Derangement of Knee
Internal Derangement of Knee Ligaments
Languages:
English
Description:
Dr. Bowman graduated from the Oregon Health & Science University School of Medicine in 1985. He works in Portland, OR and specializes in Orthopaedic Surgery.

Lawyers & Attorneys

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Ronald Bowman - Lawyer

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Office:
Racioppo, Zuber, Coetzee, Dionne, LLP
Specialties:
Business Law
ISLN:
908877025
Admitted:
1967
Name / Title
Company / Classification
Phones & Addresses
Ronald Bowman
Treasurer
TWO DAVID CIGARS, INC

Us Patents

  • Operation, Control And Suspension System For A Vertical Vane Covering For Architectural Openings

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  • US Patent:
    6360806, Mar 26, 2002
  • Filed:
    Apr 5, 2000
  • Appl. No.:
    09/543305
  • Inventors:
    Ronald L. Bowman - Golden CO
    Paul G. Swiszcz - Boulder CO
  • Assignee:
    Hunter Douglas Inc. - Upper Saddle River NJ
  • International Classification:
    E06B 936
  • US Classification:
    1601681V, 1601761 V, 1601781 V
  • Abstract:
    A covering for an architectural opening includes a new system for mounting the controls for the covering within the head rail such that suspended vertical vanes are closely positioned relative to the bottom of a head rail and disposed so as to form a continuous and integrated look with the head rail. An improved pantograph is used in the control system with one set of links of the pantograph having tapered side edges to improve stacking of the vanes adjacent to the end of a head rail without sacrificing strength and therefore quality of the control system. An improved operating system in the form of the combination of a tilt wand, coupler and pull cord provides a simplified system for not only moving the vanes along the length of the head rail between extended and retracted positions but for also pivoting the vanes about longitudinal vertical axis between open and closed positions. An improved system for connecting suspended vanes to the control system is also provided with the system being uniquely designed for use with tubular vanes and retains the vanes in a tubular orientation. The tilt wand is connected to the tilt rod within the head rail by an inclined drive connector that enables the tilt wand to be aligned with the pull cord at the location where the pull cord drops from the head rail for manipulation by an operator.
  • Covering For A Simulated Divided Light Architectural Opening And Systems For Mounting Same

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  • US Patent:
    6571851, Jun 3, 2003
  • Filed:
    Oct 13, 2000
  • Appl. No.:
    09/687451
  • Inventors:
    Ralph G. Jelic - Boulder CO
    Paul F. Josephson - Longmont CO
    Barbara A. Forst Randle - Arvada CO
    Jason T. Throne - Steamboat Springs CA
    Ronald L. Bowman - Golden CO
  • Assignee:
    Hunter Douglas Inc. - Upper Saddle River NJ
  • International Classification:
    E06B 906
  • US Classification:
    160 8406, 160 87, 160115, 160 90, 160107
  • Abstract:
    Various embodiments of an architectural covering insert primarily adapted for use in simulated divided light openings is disclosed. The insert includes an outer framework with horizontal and vertical dividers, a plurality of horizontally or vertically disposed shade components associated with one or more dividers and control means for moving the shade components between extended and retracted positions across simulated openings defined by the vertical and horizontal dividers. The shade components can be of the roller shade type or collapsible cellular type with the net result being that, from a visual standpoint, there are shade components associated with each individual simulated opening defined by the horizontal and vertical dividers, as opposed to a single shade that covers the entire architectural opening.
  • Covering For A Simulated Divided Light Architectural Opening And Systems For Mounting Same

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  • US Patent:
    6808001, Oct 26, 2004
  • Filed:
    Apr 22, 2003
  • Appl. No.:
    10/421457
  • Inventors:
    Ralph G. Jelic - Boulder CO
    Paul F. Josephson - Longmont CO
    Barbara A. Forst Randle - Broomfield CO
    Jason T. Throne - Steamboat Springs CO
    Ronald L. Bowman - Golden CO
  • Assignee:
    Hunter Douglas Inc. - Upper Saddle River NJ
  • International Classification:
    E06B 908
  • US Classification:
    160120
  • Abstract:
    Various embodiments of an architectural covering insert primarily adapted for use in simulated divided light openings is disclosed. The insert includes an outer framework with horizontal and vertical dividers, a plurality of horizontally or vertically disposed shade components associated with one or more dividers and control means for moving the shade components between extended and retracted positions across simulated openings defined by the vertical and horizontal dividers. The shade components can be of the roller shade type or collapsible cellular type with the net result being that, from a visual standpoint, there are shade components associated with each individual simulated opening defined by the horizontal and vertical dividers, as opposed to a single shade that covers the entire architectural opening.
  • Discrete Semiconductor Device And Method Of Forming Sealed Trench Junction Termination

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  • US Patent:
    8163624, Apr 24, 2012
  • Filed:
    Jul 30, 2008
  • Appl. No.:
    12/182660
  • Inventors:
    Ronald R. Bowman - Chandler AZ, US
  • International Classification:
    H01L 21/76
  • US Classification:
    438424, 438414
  • Abstract:
    A discrete semiconductor device has a substrate with a first conductivity type of semiconductor material. A first semiconductor layer is formed over the substrate. The first semiconductor layer having the first conductivity type of semiconductor material. A second semiconductor layer over the first semiconductor layer. The second semiconductor layer has a second conductivity type of semiconductor material. A trench is formed through the second semiconductor layer and extends into the second semiconductor layer. The trench has a rounded or polygonal shape and vertical sidewalls. The trench is lined with an insulating layer and filled with an insulating material. A boundary between the first and second semiconductor layers forms a p-n junction. The trench surrounds the p-n junction to terminate the electric field of a voltage imposed on the second semiconductor layer. The discrete semiconductor device can also be a transistor, thyristor, triac, or transient voltage suppressor.
  • Remotely Located Liquid Dispensing Valve

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  • US Patent:
    20020092877, Jul 18, 2002
  • Filed:
    Jan 16, 2001
  • Appl. No.:
    09/759894
  • Inventors:
    Ronald Bowman - Golden CO, US
  • International Classification:
    B65D035/38
  • US Classification:
    222/490000, 222/175000, 220/714000, 251/342000
  • Abstract:
    A flexible member is fabricated with side walls forming a chamber which is coupled to a liquid source on one side and has a slit through an end wall on the other side. The end wall is generally curved toward the chamber on its interior surface. The exterior surface of the end wall has ridges adjacent to the slit that extends through the end wall. Deformation of the side walls of the flexible member as by biting causes the end wall with the slit to deform and open the slit which otherwise is retained closed by the walls of the flexible member. This action establishes fluid dispensing from the source through the slit. The thickness of the end wall varies over its distance creating weaken areas in the end wall. These weakened areas create areas in which the end wall deforms opening the slit. In addition to the foregoing, the interior surface forming the chamber has a minimal surface area. The surface is smooth, allowing easier cleaning of the chamber.
  • Integrated Circuit And Method Of Forming Sealed Trench Junction Termination

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  • US Patent:
    20100025809, Feb 4, 2010
  • Filed:
    Jul 30, 2008
  • Appl. No.:
    12/182699
  • Inventors:
    Ronald R. Bowman - Chandler AZ, US
  • Assignee:
    TRION TECHNOLOGY, INC. - Tempe AZ
  • International Classification:
    H01L 29/732
    H01L 21/331
  • US Classification:
    257526, 438359, 257E29183, 257E21375
  • Abstract:
    An integrated circuit having a substrate with a first conductivity type of semiconductor material. A buried layer is formed in the substrate. The buried layer has a second conductivity type of semiconductor material. A first semiconductor layer is formed over the buried layer. The first semiconductor layer has the second conductivity type of semiconductor material. A trench is formed through the first semiconductor layer and buried layer and extends into the substrate. The trench is lined with an insulating layer and filled with an insulating material. A second semiconductor layer is formed in the first semiconductor layer. The second semiconductor layer has the first conductivity type of semiconductor material. A third semiconductor layer is formed in the second semiconductor layer. The third semiconductor layer has the second conductivity type of semiconductor material. The first, second, and third semiconductor layers form the collector, base, and emitter of a bipolar transistor.
  • Discrete Semiconductor Device And Method Of Forming Sealed Trench Junction Termination

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  • US Patent:
    20120175729, Jul 12, 2012
  • Filed:
    Mar 22, 2012
  • Appl. No.:
    13/427543
  • Inventors:
    Ronald R. Bowman - Chandler AZ, US
  • International Classification:
    H01L 29/06
  • US Classification:
    257510, 257E2902
  • Abstract:
    A discrete semiconductor device has a substrate with a first conductivity type of semiconductor material. A first semiconductor layer is formed over the substrate. The first semiconductor layer having the first conductivity type of semiconductor material. A second semiconductor layer over the first semiconductor layer. The second semiconductor layer has a second conductivity type of semiconductor material. A trench is formed through the second semiconductor layer and extends into the second semiconductor layer. The trench has a rounded or polygonal shape and vertical sidewalls. The trench is lined with an insulating layer and filled with an insulating material. A boundary between the first and second semiconductor layers forms a p-n junction. The trench surrounds the p-n junction to terminate the electric field of a voltage imposed on the second semiconductor layer. The discrete semiconductor device can also be a transistor, thyristor, triac, or transient voltage suppressor.
  • Integrated Circuit And Method Of Forming Sealed Trench Junction Termination

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  • US Patent:
    20120299148, Nov 29, 2012
  • Filed:
    Aug 7, 2012
  • Appl. No.:
    13/568410
  • Inventors:
    Ronald R. Bowman - Chandler AZ, US
  • International Classification:
    H01L 29/06
    H01L 21/762
  • US Classification:
    257510, 438435, 257E21546, 257E2902
  • Abstract:
    An integrated circuit having a substrate with a first conductivity type of semiconductor material. A buried layer is formed in the substrate. The buried layer has a second conductivity type of semiconductor material. A first semiconductor layer is formed over the buried layer. The first semiconductor layer has the second conductivity type of semiconductor material. A trench is formed through the first semiconductor layer and buried layer and extends into the substrate. The trench is lined with an insulating layer and filled with an insulating material. A second semiconductor layer is formed in the first semiconductor layer. The second semiconductor layer has the first conductivity type of semiconductor material. A third semiconductor layer is formed in the second semiconductor layer. The third semiconductor layer has the second conductivity type of semiconductor material. The first, second, and third semiconductor layers form the collector, base, and emitter of a bipolar transistor.

Resumes

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Ronald Bowman

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Ronald Bowman Photo 4

Ronald Bowman

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Ronald Bowman Photo 5

Ronald Todd Bowman

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Ronald Bowman Photo 6

Ronald Bowman

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Ronald Bowman Photo 7

Ronald Bowman

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Ronald Bowman Photo 8

Ronald Bowman

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Ronald Bowman Photo 9

Ronald Bowman

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Ronald Bowman Photo 10

Vp Operations At Meyer Plastics Inc.

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Location:
United States
Industry:
Plastics

Youtube

December 26, 2022

  • Duration:
    10s

Ronald Bowman Memorial Service

My nephew Bradley Scoggin singing at the memorial service for his "Pop...

  • Duration:
    3m 44s

Funeral Service for Ronald Bowman

Funeral Service for Ronald Bowman.

  • Duration:
    38m 39s

Top 5 Autos Under $10 in 2022 Bowman Chrome |...

I haven't done a Sleeper Prospects video in quite a while so I combed ...

  • Duration:
    10m 12s

Salvation Is The Only Way To Heaven By: Ron...

Southern Gospel Music.

  • Duration:
    2m 14s

Ronald Bowman - appearance

Name Look - Ronald Bowman - appearance. In this video we present "Rona...

  • Duration:
    2m 2s

Myspace

Ronald Bowman Photo 11

Ronald Bowman

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Locality:
Lansdowne, Maryland
Gender:
Male
Birthday:
1947
Ronald Bowman Photo 12

Ronald Bowman

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Locality:
WASHINGTON D.C, Washington DC
Gender:
Male
Birthday:
1942
Ronald Bowman Photo 13

ROnald BOwman

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Locality:
RATCHET CITY, Maryland
Gender:
Male
Birthday:
1949
Ronald Bowman Photo 14

ronald bowman

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Locality:
CLOVER, South Carolina
Gender:
Male
Birthday:
1921
Ronald Bowman Photo 15

ronald bowman

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Locality:
Colorado Springs, Colorado
Gender:
Male
Birthday:
1930
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ronald bowman

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Locality:
hopkins, MICHIGAN
Gender:
Male
Birthday:
1932
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Ronald Bowman

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Locality:
RICHMOND
Gender:
Male
Birthday:
1914

Flickr

Facebook

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Ronald Bowman

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Ronald Bowman

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Ronald Bowman Photo 28

Ronald Bowman

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Ronald Bowman Photo 29

Ronald Bowman

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Ronald Bowman Photo 30

Ronald Bowman

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Ronald Bowman Photo 31

Ronald Leroy Bowman

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Ronald Bowman Photo 32

Ronald E Bowman

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Ronald Bowman Photo 33

Ronald Bowman

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Googleplus

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Ronald Bowman

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Ronald Bowman

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Ronald Bowman

Ronald Bowman Photo 37

Ronald Bowman

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Ronald Bowman

Classmates

Ronald Bowman Photo 39

Ronald Bowman (Bowman Jr.)

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Schools:
Friendly High School Ft. Washington MD 2004-2008
Community:
Marc Ferrara, Jeffrey Bolton, Cindi Jones
Ronald Bowman Photo 40

Ronald Bowman

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Schools:
Saluda High School Saluda IN 1953-1957
Community:
Gwinda Scales
Ronald Bowman Photo 41

Ronald Bowman

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Schools:
Lake Elementary School Pascagoula MS 1948-1954
Community:
Lynn Kenyon, Jill Samuels, Renee Carolan
Ronald Bowman Photo 42

Ronald Bowman

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Schools:
Kingman/Mohave County Union High School Kingman AZ 1984-1988
Community:
Joe Shaeffer, Roberta Bobbi, Jeroldine Penrod, Bonnie Stayner
Ronald Bowman Photo 43

Ronald Bowman

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Schools:
Taylorsville High School Taylorsville KY 1970-1974
Community:
David Hilbert, Martha Curtsinger, Ann Lutz
Ronald Bowman Photo 44

Ronald Bowman

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Schools:
Mangham High School Mangham LA 1991-1995
Community:
Lillian Laird
Ronald Bowman Photo 45

Ronald Bowman

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Schools:
Hampton Elementary School Milwaukee WI 1963-1970, John Muir School Milwaukee WI 1971-1974
Community:
Kathryn Kondziella, Brian Blackburn
Ronald Bowman Photo 46

Ronald Bowman

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Schools:
Shamokin Area High School Shamokin PA 1963-1967
Community:
Treina Beck

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