Medical School Oregon Health & Science University School of Medicine Graduated: 1985
Procedures:
Arthrocentesis Shoulder Arthroscopy Shoulder Surgery
Conditions:
Fractures, Dislocations, Derangement, and Sprains Internal Derangement of Knee Cartilage Rotator Cuff Syndrome and Allied Disorders Internal Derangement of Knee Internal Derangement of Knee Ligaments
Languages:
English
Description:
Dr. Bowman graduated from the Oregon Health & Science University School of Medicine in 1985. He works in Portland, OR and specializes in Orthopaedic Surgery.
Ronald L. Bowman - Golden CO Paul G. Swiszcz - Boulder CO
Assignee:
Hunter Douglas Inc. - Upper Saddle River NJ
International Classification:
E06B 936
US Classification:
1601681V, 1601761 V, 1601781 V
Abstract:
A covering for an architectural opening includes a new system for mounting the controls for the covering within the head rail such that suspended vertical vanes are closely positioned relative to the bottom of a head rail and disposed so as to form a continuous and integrated look with the head rail. An improved pantograph is used in the control system with one set of links of the pantograph having tapered side edges to improve stacking of the vanes adjacent to the end of a head rail without sacrificing strength and therefore quality of the control system. An improved operating system in the form of the combination of a tilt wand, coupler and pull cord provides a simplified system for not only moving the vanes along the length of the head rail between extended and retracted positions but for also pivoting the vanes about longitudinal vertical axis between open and closed positions. An improved system for connecting suspended vanes to the control system is also provided with the system being uniquely designed for use with tubular vanes and retains the vanes in a tubular orientation. The tilt wand is connected to the tilt rod within the head rail by an inclined drive connector that enables the tilt wand to be aligned with the pull cord at the location where the pull cord drops from the head rail for manipulation by an operator.
Covering For A Simulated Divided Light Architectural Opening And Systems For Mounting Same
Ralph G. Jelic - Boulder CO Paul F. Josephson - Longmont CO Barbara A. Forst Randle - Arvada CO Jason T. Throne - Steamboat Springs CA Ronald L. Bowman - Golden CO
Assignee:
Hunter Douglas Inc. - Upper Saddle River NJ
International Classification:
E06B 906
US Classification:
160 8406, 160 87, 160115, 160 90, 160107
Abstract:
Various embodiments of an architectural covering insert primarily adapted for use in simulated divided light openings is disclosed. The insert includes an outer framework with horizontal and vertical dividers, a plurality of horizontally or vertically disposed shade components associated with one or more dividers and control means for moving the shade components between extended and retracted positions across simulated openings defined by the vertical and horizontal dividers. The shade components can be of the roller shade type or collapsible cellular type with the net result being that, from a visual standpoint, there are shade components associated with each individual simulated opening defined by the horizontal and vertical dividers, as opposed to a single shade that covers the entire architectural opening.
Covering For A Simulated Divided Light Architectural Opening And Systems For Mounting Same
Ralph G. Jelic - Boulder CO Paul F. Josephson - Longmont CO Barbara A. Forst Randle - Broomfield CO Jason T. Throne - Steamboat Springs CO Ronald L. Bowman - Golden CO
Assignee:
Hunter Douglas Inc. - Upper Saddle River NJ
International Classification:
E06B 908
US Classification:
160120
Abstract:
Various embodiments of an architectural covering insert primarily adapted for use in simulated divided light openings is disclosed. The insert includes an outer framework with horizontal and vertical dividers, a plurality of horizontally or vertically disposed shade components associated with one or more dividers and control means for moving the shade components between extended and retracted positions across simulated openings defined by the vertical and horizontal dividers. The shade components can be of the roller shade type or collapsible cellular type with the net result being that, from a visual standpoint, there are shade components associated with each individual simulated opening defined by the horizontal and vertical dividers, as opposed to a single shade that covers the entire architectural opening.
Discrete Semiconductor Device And Method Of Forming Sealed Trench Junction Termination
A discrete semiconductor device has a substrate with a first conductivity type of semiconductor material. A first semiconductor layer is formed over the substrate. The first semiconductor layer having the first conductivity type of semiconductor material. A second semiconductor layer over the first semiconductor layer. The second semiconductor layer has a second conductivity type of semiconductor material. A trench is formed through the second semiconductor layer and extends into the second semiconductor layer. The trench has a rounded or polygonal shape and vertical sidewalls. The trench is lined with an insulating layer and filled with an insulating material. A boundary between the first and second semiconductor layers forms a p-n junction. The trench surrounds the p-n junction to terminate the electric field of a voltage imposed on the second semiconductor layer. The discrete semiconductor device can also be a transistor, thyristor, triac, or transient voltage suppressor.
A flexible member is fabricated with side walls forming a chamber which is coupled to a liquid source on one side and has a slit through an end wall on the other side. The end wall is generally curved toward the chamber on its interior surface. The exterior surface of the end wall has ridges adjacent to the slit that extends through the end wall. Deformation of the side walls of the flexible member as by biting causes the end wall with the slit to deform and open the slit which otherwise is retained closed by the walls of the flexible member. This action establishes fluid dispensing from the source through the slit. The thickness of the end wall varies over its distance creating weaken areas in the end wall. These weakened areas create areas in which the end wall deforms opening the slit. In addition to the foregoing, the interior surface forming the chamber has a minimal surface area. The surface is smooth, allowing easier cleaning of the chamber.
Integrated Circuit And Method Of Forming Sealed Trench Junction Termination
An integrated circuit having a substrate with a first conductivity type of semiconductor material. A buried layer is formed in the substrate. The buried layer has a second conductivity type of semiconductor material. A first semiconductor layer is formed over the buried layer. The first semiconductor layer has the second conductivity type of semiconductor material. A trench is formed through the first semiconductor layer and buried layer and extends into the substrate. The trench is lined with an insulating layer and filled with an insulating material. A second semiconductor layer is formed in the first semiconductor layer. The second semiconductor layer has the first conductivity type of semiconductor material. A third semiconductor layer is formed in the second semiconductor layer. The third semiconductor layer has the second conductivity type of semiconductor material. The first, second, and third semiconductor layers form the collector, base, and emitter of a bipolar transistor.
Discrete Semiconductor Device And Method Of Forming Sealed Trench Junction Termination
A discrete semiconductor device has a substrate with a first conductivity type of semiconductor material. A first semiconductor layer is formed over the substrate. The first semiconductor layer having the first conductivity type of semiconductor material. A second semiconductor layer over the first semiconductor layer. The second semiconductor layer has a second conductivity type of semiconductor material. A trench is formed through the second semiconductor layer and extends into the second semiconductor layer. The trench has a rounded or polygonal shape and vertical sidewalls. The trench is lined with an insulating layer and filled with an insulating material. A boundary between the first and second semiconductor layers forms a p-n junction. The trench surrounds the p-n junction to terminate the electric field of a voltage imposed on the second semiconductor layer. The discrete semiconductor device can also be a transistor, thyristor, triac, or transient voltage suppressor.
Integrated Circuit And Method Of Forming Sealed Trench Junction Termination
An integrated circuit having a substrate with a first conductivity type of semiconductor material. A buried layer is formed in the substrate. The buried layer has a second conductivity type of semiconductor material. A first semiconductor layer is formed over the buried layer. The first semiconductor layer has the second conductivity type of semiconductor material. A trench is formed through the first semiconductor layer and buried layer and extends into the substrate. The trench is lined with an insulating layer and filled with an insulating material. A second semiconductor layer is formed in the first semiconductor layer. The second semiconductor layer has the first conductivity type of semiconductor material. A third semiconductor layer is formed in the second semiconductor layer. The third semiconductor layer has the second conductivity type of semiconductor material. The first, second, and third semiconductor layers form the collector, base, and emitter of a bipolar transistor.