Ronald Armin Huber

US Patent:

6542837, Apr 1, 2003

Filed:

May 19, 2000

Appl. No.:

09/574823

Inventors:

Ronald Huber - Tucson AZ

Assignee:

Infineon Technologies AG - Munich

International Classification:

G06F 1900

US Classification:

702 81, 356336

Abstract:

A wafer processing system is described located in at least one clean room and having an arrangement of manufacturing units for performing individual manufacturing operations. In a manufacturing unit, measuring devices are provided for determining process parameters in order to check the quality of wafer processing of the manufacturing operations. Process data generated by the measuring devices is compiled continuously in a computing unit assigned to the manufacturing unit. Characteristic quantities for evaluating the quality of wafer processing are derived from this process data.

US Patent:

6643558, Nov 4, 2003

Filed:

Nov 19, 2001

Appl. No.:

09/992287

Inventors:

Ronald Huber - Poughkeepsie NY
Rolf-Arno Klaebsch - Lostau, DE

Assignee:

Infineon Technologies AG - Munich

International Classification:

G06F 1900

US Classification:

700112, 700 99, 700116, 700121

Abstract:

The wafer processing installation is disposed in one or more clean rooms. The installation has a configuration of processing units including fabrication units for executing individual fabricating steps and/or measuring units for checking fabricating steps. The processing units are connected by a transport system for sending the wafers in and out. The wafers are combined into variable batch sizes corresponding to the capacities of the processing units and/or the transport system.