Ronald G Moss

US Patent:

44684371, Aug 28, 1984

Filed:

Feb 22, 1982

Appl. No.:

6/350738

Inventors:

James W. Patten - Richland WA
Ronald W. Moss - Richland WA
Edwin D. McClanahan - Richland WA

Assignee:

Battelle Memorial Institute - Richland WA

International Classification:

B22F 708
C23C 1300

US Classification:

428553

Abstract:

Methods for improving microstructures of line-of-sight deposited films are described. Columnar growth defects ordinarily produced by geometrical shadowing during deposition of such films are eliminated without resorting to post-deposition thermal or mechanical treatments. The native, as-deposited coating qualities, including homogeneity, fine grain size, and high coating-to-substrate adherence, can thus be retained. The preferred method includes the steps of emitting material from a source toward a substrate to deposit a coating non-uniformly on the substrate surface, removing a portion of the coating uniformly over the surface, again depositing material onto the surface, but from a different direction, and repeating the foregoing steps. The quality of line-of-sight deposited films such as those produced by sputtering, progressively deteriorates as the angle of incidence between the flux and the surface becomes increasingly acute. Depositing non-uniformly, so that the coating becomes progressively thinner as quality deteriorates, followed by uniformly removing some of the coating, such as by resputtering, eliminates the poor quality portions, leaving only high quality portions of the coating.

US Patent:

40466663, Sep 6, 1977

Filed:

May 7, 1976

Appl. No.:

5/684418

Inventors:

Edwin D. McClanahan - Richland WA
Ronald W. Moss - Richland WA

Assignee:

The United States of America as represented by the United States Energy
Research and Development Administration - Washington DC

International Classification:

C23C 1500
H01J 1904

US Classification:

204298

Abstract:

A thin film of a low-thermionic-work-function material is maintained on the cathode of a device for producing a high-current, low-pressure gas discharge by means of sputter deposition from an auxiliary electrode. The auxiliary electrode includes a surface with a low-work-function material, such as thorium, uranium, plutonium or one of the rare earth elements, facing the cathode but at a disposition and electrical potential so as to extract ions from the gas discharge and sputter the low-work-function material onto the cathode. By continuously replenishing the cathode film, high thermionic emissions and ion plasmas can be realized and maintained over extended operating periods.

US Patent:

40381714, Jul 26, 1977

Filed:

Mar 31, 1976

Appl. No.:

5/672402

Inventors:

Ronald W. Moss - Richland WA
Edwin D. McClanahan - Richland WA
Nils Laegreid - Richland WA

Assignee:

Battelle Memorial Institute - Columbus OH

International Classification:

C23C 1500

US Classification:

204298

Abstract:

A supported plasma sputtering apparatus is described having shaped electrical fields in the electron discharge region between the cathode and anode and the sputter region between the target and substrate while such regions are free of any externally applied magnetic field to provide a high deposition rate which is substantially uniform over a wide area. Plasma shaping electrodes separate from the anode and target shape the electrical fields in the electron discharge region and the sputter region to provide a high density plasma. The anode surrounds the target to cause substantially uniform sputtering over a large target area. In one embodiment the anode is in the form of an annular ring surrounding a flat target surface, such anode being provided with a ribbed upper surface which shields portions of the anode from exposure to sputtered material to maintain the electron discharge for a long stable operation. Several other embodiments accomplish the same result by using different anodes which either shield the anode from sputtered material, remove the sputtered coating on the anode by heating, or simultaneously mix sputtered metal from the auxiliary target with sputtered insulator from the main target so the resultant coating is conductive. A radio frequency potential alone or together with a D. C.

US Patent:

45006024, Feb 19, 1985

Filed:

Aug 10, 1981

Appl. No.:

6/291729

Inventors:

James W. Patten - Richland WA
Ronald W. Moss - Richland WA
Brennan A. Forcht - Arlington TX

Assignee:

LTV Aerospace and Defense Co. - Dallas TX

International Classification:

B32B 900

US Classification:

428408

Abstract:

Composite protective coatings for protecting carbonaceous substrates from degrading in oxygen containing environments are provided. The composite protective coatings include a first coating layer applied to the surface of the substrate. The first coating layer is a silicon carbide type coating. The second coating layer is applied to the surface of a first coating layer and is a sputter deposited phase stabilized zirconium oxide having a columnar microstructure. Carbonaceous substrates having the composite protective coatings are able to withstand temperatures of about 4100. degree. F. in oxygen containing environments.

US Patent:

43361188, Jun 22, 1982

Filed:

Mar 21, 1980

Appl. No.:

6/131922

Inventors:

James W. Patten - Richland WA
Ronald W. Moss - Richland WA
Edwin D. McClanahan - Richland WA

Assignee:

Battelle Memorial Institute - Richland WA

International Classification:

C23C 1500

US Classification:

204192EC

Abstract:

Methods for improving microstructures of line-of-sight deposited films are described. Columnar growth defects ordinarily produced by geometrical shadowing during deposition of such films are eliminated without resorting to post-deposition thermal or mechanical treatments. The native, as-deposited coating qualities, including homogeneity, fine grain size, and high coating-to-substrate adherence, can thus be retained. The preferred method includes the steps of emitting material from a source toward a substrate to deposit a coating non-uniformly on the substrate surface, removing a portion of the coating uniformly over the surface, again depositing material onto the surface, but from a different direction, and repeating the foregoing steps. The quality of line-of-sight deposited films such as those produced by sputtering, progressively deteriorates as the angle of incidence between the flux and the surface becomes increasingly acute. Depositing non-uniformly, so that the coating becomes progressively thinner as quality deteriorates, followed by uniformly removing some of the coating, such as by resputtering, eliminates the poor quality portions, leaving only high quality portions of the coating.