Ronald A Myers

US Patent:

6953532, Oct 11, 2005

Filed:

Mar 6, 2003

Appl. No.:

10/382370

Inventors:

Ronald E. Myers - Aurora IL, US

Assignee:

Cabot Microelectronics Corporation - Aurora IL

International Classification:

C23F001/00

US Classification:

216 89, 216 88, 252 791, 252 792

Abstract:

The invention provides a method of polishing a substrate comprising a lanthanide-containing metal oxide material. The method comprises the steps of (i) providing a polishing system comprising (a) an abrasive, a polishing pad, or a combination thereof, (b) an acid, and (c) a liquid carrier, (ii) providing a substrate comprising a metal oxide layer, wherein the metal oxide layer comprises at least one lanthanide series element, and (iii) abrading at least a portion of the metal oxide layer with the polishing system to polish the substrate. The lanthanide-containing metal oxide material can be a lanthanide oxide, a doped lanthanide oxide, a lanthanide-doped metal oxide, a lanthanide perovskite, or any other suitable lanthanide-containing mixed metal oxide material, in particular those used as solid electrode and solid electrolyte materials in gas sensor and fuel cell devices.

US Patent:

7686994, Mar 30, 2010

Filed:

Mar 2, 2005

Appl. No.:

11/070695

Inventors:

Abaneshwar Prasad - Naperville IL, US
Ronald E. Myers - Strongsville OH, US

Assignee:

Cabot Microelectronics Corporation - Aurora IL

International Classification:

B28B 3/00
B29C 43/02

US Classification:

264101, 264104, 264105, 264319

Abstract:

The invention provides a method for producing a conductive film that generates an electric current via field emission of electrons, which method comprises incorporating an electrically conductive material into a thermoplastic polymer. The invention also provides a conductive film and a method for generating an electric current via field emission of electrons.

US Patent:

20040198892, Oct 7, 2004

Filed:

Mar 31, 2004

Appl. No.:

10/814714

Inventors:

Heinz Busta - Park Ridge IL, US
David Boldridge - Oswego IL, US
Ronald Myers - Aurora IL, US

Assignee:

Cabot Microelectronics Corporation

International Classification:

C08K003/04
C08K003/34
C08K003/40

US Classification:

524/495000, 524/494000, 524/492000

Abstract:

A field emitter source and method for making same. An x-ray and a high energy electron source is fabricated from the field emitter. The field emitter source composition comprises carbon black and a mixing medium. An alternative method of field emitter formulation includes providing a quantity of silica with the carbon black and a mixing medium. An x-ray source comprises a substrate and a carbon black field emitter composition provided along a surface of the substrate and an extraction grid to pull electrons from the field emitter film and a metal film biased at high voltage to accelerate the electrons. A conductive film is further provided along an upper support structure of the source, such that when the conductive film is struck by the accelerated electrons, the upper support structure converts the impinging high-energy electrons into x-rays. A high energy electron source is also disclosed similar to the x-ray source but without a conductive film and with appropriate apertures to facilitate egress of the high energy electrons.

US Patent:

20050153634, Jul 14, 2005

Filed:

Jan 9, 2004

Appl. No.:

10/754390

Inventors:

Abaneshwar Prasad - Naperville IL, US
Ronald Myers - Aurora IL, US

Assignee:

Cabot Microelectronics Corporation - Aurora IL

International Classification:

B24B001/00

US Classification:

451041000, 451526000

Abstract:

The invention is directed to a chemical-mechanical polishing pad comprising a porous polymeric material, wherein the porous polymeric material has a Poisson's ratio less than 0. The invention further provides a method of polishing a workpiece comprising (i) providing a workpiece to be polished, (ii) contacting the workpiece with a chemical-mechanical polishing system comprising the polishing pad of the invention, and (iii) abrading at least a portion of the surface of the workpiece with the polishing system to polish the workpiece.

US Patent:

61380423, Oct 24, 2000

Filed:

Dec 31, 1997

Appl. No.:

9/001625

Inventors:

Pallab Midya - Schaumburg IL
Lawrence E. Connell - Naperville IL
John Grosspietsch - Libertyville IL
Ronald Gene Myers - Scottsdale AZ

Assignee:

Motorola, Inc. - Schaumburg IL

International Classification:

H04Q 723
G05F 170
H02M 7155

US Classification:

455571

Abstract:

A method (300, 400), device (100, 200), phone (200) and base station (200) provide an efficient tracking power converter for variable signals. The tracking power converter includes a feedforward feedback control unit that is coupled to receive a reference signal and to receive at least one feedback signal and is used for determining an optimal control signal in accordance with a predetermined scheme, a pulse width modulation unit that is coupled to the feedforward feedback control unit and is used for modifying a duty ratio to provide a switching signal, and a power converter that is coupled to the pulse width modulation unit and to a power source and is used for providing the dynamic variable output signal.

US Patent:

61309109, Oct 10, 2000

Filed:

Nov 3, 1997

Appl. No.:

8/963491

Inventors:

Dale Anderson - Ft. Worth TX
Pallab Midya - Schaumburg IL
Ronald Gene Myers - Scottsdale AZ

Assignee:

Motorola, Inc. - Schaumburg IL

International Classification:

H03K 708
H03K 908
H03F 338
H03G 300

US Classification:

375238

Abstract:

A method and apparatus for efficient power amplification of a wideband signal with a correspondingly wide modulation bandwidth includes an envelope detector (220), an interleaved class S modulator (270), and a power amplifier (260). The interleaved class S modulator (270) amplifies includes multiple channels (272) which each include a portion of a class S modulator. Each class S modulator has a duty cycle and time offset associated therewith. The duty cycles of the channels (272) can be the same with the time offsets different, or the duty cycles can also be different. For an interleaved class S modulator with N channels (272), the slew rate increases by as much as N, and the output ripple decreases by as much as N. sup. 2.