Rong Rui Chen

US Patent:

8084087, Dec 27, 2011

Filed:

Feb 14, 2008

Appl. No.:

12/070367

Inventors:

Stacey F. Bent - Stanford CA, US
Rong Chen - Sunnyvale CA, US
Xirong Jiang - Stanford CA, US
Marja N. Mullings - Stanford CA, US
Yuji Saito - Tokyo, JP

Assignee:

The Board of Trustees of the Leland Stanford Junior University - Palo Alto CA
Honda Motor Co., Ltd. - Tokyo

International Classification:

C23C 16/00

US Classification:

42725528, 4272481, 42725511

Abstract:

A method of growing spatially-separated and size-controlled particles on substrate surfaces is provided. The method utilizes chemical modification of the substrate surface, an atomic layer deposition (ALD) system, providing a modified layer to the substrate surface and providing an ALD material for nanoparticle deposition. The method induces a Volmer-Weber growth method, where islands of the nanoparticles are formed on the surface. The modified layer controls a number of nucleation sites on the surface, where controlling the number of ALD cycles limits an amount of deposited the material for discrete the nanoparticles. The modified layer can include self-assembled monolayers, modified hydrophobicity of the surface, H-terminated surfaces, and varying functional groups within the modified layer, where thermally attached alkenes, photochemically attached alkenes, thermally attached alkynes or photochemically attached alkynes are attached to the H-terminated surfaces, and the density of the nucleation sites of the nanoparticles are thereby managed.

US Patent:

8255536, Aug 28, 2012

Filed:

Mar 21, 2008

Appl. No.:

12/053267

Inventors:

Rong Chao Chen - Redmond WA, US

Assignee:

Microsoft Corporation - Redmond WA

International Classification:

G06F 15/173

US Classification:

709226, 709223

Abstract:

Systems and methods described relate to controlling bandwidth and latency in a remote computing environment. A controller establishes a remote session between a client and a remote server. Data transfer between the client and the remote server is routed through the controller. The controller regulates bandwidth consumption and latency in the remote session by simulating a session bandwidth that can be less than the available bandwidth and by injecting delays into data packets transferred in the remote session. Such systems and methods can be used to prioritize remote client sessions and test deployment of applications in a remote computing environment.

US Patent:

20080146034, Jun 19, 2008

Filed:

Dec 12, 2007

Appl. No.:

11/954981

Inventors:

MEIHUA SHEN - Fremont CA, US
RONG CHEN - Sunnyvale CA, US
Scott M. Williams - Belmont CA, US

Assignee:

APPLIED MATERIALS, INC. - Santa Clara CA

International Classification:

H01L 21/311

US Classification:

438700, 257E21249

Abstract:

Methods for recess etching are provided herein that advantageously improve lateral to vertical etch ratio requirements, thereby enabling deeper recess etching while maintaining relatively shallow vertical etch depths. Such enhanced lateral etch methods advantageously provide benefits for numerous applications where lateral to vertical etch depth ratios are constrained or where recesses or cavities are desired to be formed. In some embodiments, a method of recess etching includes providing a substrate having a structure formed thereon; forming a recess in the substrate at least partially beneath the structure using a first etch process; forming a selective passivation layer on the substrate; and extending the recess in the substrate using a second etch process. The selective passivation layer is generally formed on regions of the substrate adjacent to the structure but generally not within the recess. The first and second etch processes may be the same or different.

US Patent:

20120165207, Jun 28, 2012

Filed:

Feb 12, 2010

Appl. No.:

13/148458

Inventors:

Atul J. Butte - Stanford CA, US
Rong Chen - Fremont CA, US
Minnie M. Sarwal - Portola Valley CA, US
Tara Sigdel - Palo Alto CA, US

Assignee:

The Board of Trustees of the Leland Stanford Junior University - Palo Alto CA

International Classification:

G01N 33/566
C40B 30/04

US Classification:

506 9, 435 792, 435 71, 435 721

Abstract:

Methods are provided for monitoring an allograft recipient for a rejection response, e.g., to predict, to diagnose, and/or to characterize a rejection response. In practicing the subject methods, the level of at least one protein in a sample from the allograft recipient, e.g., serum, urine, blood, CSF, tears or saliva, is evaluated, to monitor the subject. Also provided are compositions, systems, and kits that find use in practicing the subject methods.

US Patent:

20130080068, Mar 28, 2013

Filed:

Apr 13, 2012

Appl. No.:

13/445925

Inventors:

Frederick Dewey - Redwood City CA, US
Euan Ashley - Menlo Park CA, US
Carlos Daniel Bustamante - Emerald Hills CA, US
Atul Butte - Menlo Park CA, US
Jake Byrnes - San Francisco CA, US
Rong Chen - Fremont CA, US

Assignee:

The Board of Trustees of the Leland Stanford Junior University - Palo Alto CA

International Classification:

G06F 19/12

US Classification:

702 19

Abstract:

An embodiment of the present invention is a methodology for prioritizing variants relevant to inherited Mendelian (“single gene”) disease syndromes according to disease phenotype, gene, and variant level information.