Rong Liu

US Patent:

7129055, Oct 31, 2006

Filed:

Dec 11, 2000

Appl. No.:

09/734221

Inventors:

Dan R. Littman - New York NY, US
Hongkui Deng - Worcester MA, US
Wilfried Ellmeier - New York NY, US
Nathaniel R. Landau - New York NY, US
Rong Liu - New York NY, US

Assignee:

New York University - New York NY

International Classification:

C01N 33/53
C01N 33/533
C12N 15/00
C12N 15/48
C12N 15/07
C12N 15/09
C12N 5/28
C07K 16/28

US Classification:

435 72, 435 721, 435 724, 435 78, 435 793, 435325, 435 691, 435440, 53038822

Abstract:

Entry of HIV-1 into target cells requires cell surface CD4 as well as additional host cell cofactors. A cofactor required for infection with virus adapted for growth in transformed T cell lines was recently identified and named fusin. Fusin, however, does not promote entry of macrophage-tropic viruses that are believed to be the key pathogenic strains in vivo. It has now been determined that the principal cofactor for entry mediated by the envelope glycoproteins of primary macrophage-tropic strains of HIV-1 is CC-CKR5, a receptor for the β-chemokines RANTES, MIP-1α, and MIP-1β.

US Patent:

7679473, Mar 16, 2010

Filed:

Jan 15, 2008

Appl. No.:

12/014725

Inventors:

Wenjiang Zeng - Sunnyvale CA, US
Rong Liu - Fremont CA, US
Yupeng Chen - Sunnyvale CA, US
Wang-Chang Albert Gu - Longwood FL, US

Assignee:

California Micro Devices - Milpitas CA

International Classification:

H03H 7/00

US Classification:

333176, 333167

Abstract:

The present invention relates to a low pass filter incorporating coupled inductors to enhance stop band attenuation. In one embodiment, the coupled inductors are provided along with various capacitors to provide for superior performance within a smaller surface area of a semiconductor or ceramic integrated device. In a further specific embodiment, the capacitors are formed on an integrated device within an area on which entirely intertwined inductors are formed. In another embodiment, at least one further pair of coupled inductors is included to create additional frequency attenuation notches, as well as a wide stop-band.

US Patent:

7808752, Oct 5, 2010

Filed:

Aug 17, 2005

Appl. No.:

11/206667

Inventors:

Dominick Richiuso - Saratoga CA, US
William N. Buchele - Los Gatos CA, US
Anguel Brankov - San Jose CA, US
Rong Liu - Fremont CA, US
John M. Jorgensen - Los Gatos CA, US

Assignee:

Semiconductor Components Industries, LLC - Phoenix AZ

International Classification:

H02H 9/00

US Classification:

361 56, 361 911, 361111, 361119

Abstract:

A method for implementing an inductor-capacitor filter in an integrated circuit. Embodiments of the invention implement a 5-pole LC low-pass filter suitable for incorporation in wireless applications necessitating compact layouts. Inductors are formed in an IC as concentric coils on metallization layers, the concentric coils providing a negative coupling coefficient between the inductors. The invention provides programmable frequency response characteristics, enabling the transmission of high-frequency base band information while attenuating carrier RF frequencies.

US Patent:

20090002669, Jan 1, 2009

Filed:

Jun 27, 2008

Appl. No.:

12/163645

Inventors:

Rong Liu - Pleasanton CA, US
Evan Palmer - Mountain View CA, US

Assignee:

Optical Associates, Inc. - San Jose CA

International Classification:

G03B 27/32
G03B 27/54

US Classification:

355 67, 355 77

Abstract:

An exposure apparatus for use in optical lithography can include a holder and a plurality of UV-LED modules carried by the holder and disposed in an array. A respective plurality of collimating lenses can be disposed in an array corresponding to the array of UV-LED modules. The plurality of UV-LED modules and the respective plurality of collimating lenses can provide a respective plurality of distinct beams of UV light. The plurality of collimating lenses may be spaced from the plurality of UV-LED modules and spaced from the exposure plane and have an optical configuration providing a composite beam of UV light formed from the plurality of distinct beams of UV light in which each beam inside the periphery of the array overlaps each adjacent beam by at least 70% at the exposure plane. A method for directing light onto an exposure plane in an optical lithography procedure is provided.

US Patent:

20100250228, Sep 30, 2010

Filed:

Mar 30, 2009

Appl. No.:

12/413749

Inventors:

David Cohn - Dobbs Ferry NY, US
Pankaj Dhoolia - New Delhi, IN
Hemesh Kumar - New Delhi, IN
Santhosh Kumaran - Peekskill NY, US
Rong Liu - Sterling VA, US
Florian Pinel - New York NY, US

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

G06F 9/45

US Classification:

703 22, 718100

Abstract:

Techniques for modeling a composite application are provided. The techniques include identifying one or more entities that are processed in a user enterprise, identifying one or more actions to be performed during a lifecycle of the one or more entities, and modeling a composite application based on the one or more actions to be performed during a lifecycle of the one or more entities.

US Patent:

20120080803, Apr 5, 2012

Filed:

Oct 1, 2010

Appl. No.:

12/896416

Inventors:

Phillip Holland - Los Gatos CA, US
Rong Liu - San Jose CA, US
Umesh Sharma - Santa Clara CA, US
Der Min Liou - San Jose CA, US
David D. Marreiro - Chandler AZ, US
Sudhama C. Shastri - Phoenix AZ, US

International Classification:

H01L 23/52

US Classification:

257774, 257784, 438622, 257E23141, 257E21159

Abstract:

A semiconductor component and methods for manufacturing the semiconductor component that includes a three dimensional helically shaped common mode choke. In accordance with embodiments, a transient voltage suppression device may be coupled to the monolithically integrated common mode choke.

US Patent:

62585274, Jul 10, 2001

Filed:

May 21, 1997

Appl. No.:

8/861105

Inventors:

Dan R. Littman - New York NY
Hongkui Deng - Worcester MA
Wilfried Ellmeier - New York NY
Nathaniel R. Landau - New York NY
Rong Liu - New York NY

Assignee:

The Aaron Diamond Aids Research Center - New York NY
New York University - New York NY

International Classification:

C12Q 170
G01N 33567
C12N 510

US Classification:

435 5

Abstract:

Entry of HIV-1 into target cells requires cell surface CD4 as well as additional host cell cofactors. A cofactor required for infection with virus adapted for growth in transformed T cell lines was recently identified and named fusin. Fusin, however, does not promote entry of macrophage-tropic viruses that are believed to be the key pathogenic strains in vivo. It has now been determined that the principal cofactor for entry mediated by the envelope glycoproteins of primary macrophage-tropic strains of HIV-1 is CC-CKR5, a receptor for the. beta. -chemokines RANTES, MIP-1. alpha. , and MIP-1. beta.

US Patent:

60571020, May 2, 2000

Filed:

Aug 8, 1997

Appl. No.:

8/907468

Inventors:

Nathaniel R. Landau - New York NY
Richard A. Koup - Southlake TX
Rong Liu - New York NY
William Paxton - Amsterdam, NL

Assignee:

The Aaron Diamond Aids Research Center - New York NY

International Classification:

C12Q 168
C12Q 170

US Classification:

435 6

Abstract:

Entry of HIV-1 into target cells requires cell surface CD4 as well as additional host cell cofactors. A cofactor required for infection with virus adapted for growth in transformed T cell lines was recently identified and named fusin. Fusin, however, does not promote entry of macrophage-tropic viruses that are believed to be the key pathogenic strains in vivo. It has now been determined that the principal cofactor for entry mediated by the envelope glycoproteins of primary macrophage-tropic strains of HIV-1 is CC-CKR5, a receptor for the. beta. -chemokines RANTES, MIP-1. alpha. , and MIP-1. beta. It has also been found that individuals who are homozygous for a mutation of the CKR-5 receptor are resistent to HIV infection; in vitro infection requires a 1000-fold higher dose of HIV than normal cells. The mutation results in complete suppression of CKR-5 expression.