Ryan A Bennett

US Patent:

58491031, Dec 15, 1998

Filed:

Dec 22, 1997

Appl. No.:

8/995775

Inventors:

Ryan Paul Bennett - Vancouver WA
Harry Frank Zaro - Vancouver WA
Naoto Iizuka - Vancouver WA

Assignee:

SEH America, Inc. - Vancouver WA

International Classification:

B08B 9093

US Classification:

134 2218

Abstract:

A method of monitoring contamination of fluid used to rinse crystal wafers, and a contamination monitoring system having a portable framework which carries a rinsing bath for detachable connection to a remote fluid source. A transport structure is mounted on the framework to accommodate transport of the system to and from the remote fluid source. The framework includes a chamber which encloses the rinsing bath to isolate it from the surrounding environment, typically using a filter which removes unwanted particles from air within the chamber. The filter also typically creates a vertical airflow within the chamber. In one embodiment, the system employs a rinsing bath with inner and outer tanks, the inner tank being configured to hold wafers to be rinsed and the outer tank being configured to hold the inner tank. An input port introduces fluid from the remote fluid source into the inner tank for overflow into the outer tank. The outer tank employs an output port for discharge of fluid received from the inner tank.

US Patent:

60589477, May 9, 2000

Filed:

Oct 8, 1998

Appl. No.:

9/169090

Inventors:

Ryan Paul Bennett - Vancouver WA
Harry Frank Zaro - Vancouver WA
Naoto Iizuka - Vancouver WA

Assignee:

SEH America, Inc. - Vancouver WA

International Classification:

B08B 306
B08B 1300

US Classification:

134113

Abstract:

A contamination monitoring system having a portable framework which carries a rinsing bath for detachable connection to a remote fluid source. A transport structure is mounted on the framework to accommodate transport of the system to and from the remote fluid source. The framework includes a chamber which encloses the rinsing bath to isolate it from the surrounding environment, typically using a filter which removes unwanted particles from air within the chamber. The filter also typically creates a vertical airflow within the chamber. In one embodiment, the system employs a rinsing bath with inner and outer tanks, the inner tank being configured to hold wafers to be rinsed and the outer tank being configured to hold the inner tank. An input port introduces fluid from the remote fluid source into the inner tank for overflow into the outer tank. The outer tank employs an output port for discharge of fluid received from the inner tank.