Samuel L Graham

US Patent:

20030051739, Mar 20, 2003

Filed:

Sep 18, 2001

Appl. No.:

09/956543

Inventors:

Leonard Klebanoff - Dublin CA, US
Philip Grunow - Livermore CA, US
Samuel Graham - Dublin CA, US

International Classification:

C25F001/00
C25F003/30
C25F005/00
B08B006/00

US Classification:

134/001100, 156/345400

Abstract:

Activated gaseous species generated adjacent a carbon contaminated surface affords in-situ cleaning. A device for removing carbon contamination from a surface of the substrate includes (a) a housing defining a vacuum chamber in which the substrate is located; (b) a source of gaseous species; and (c) a source of electrons that are emitted to activate the gaseous species into activated gaseous species. The source of electrons preferably includes (i) a filament made of a material that generates thermionic electron emissions; (ii) a source of energy that is connected to the filament; and (iii) an electrode to which the emitted electrons are attracted. The device is particularly suited for photolithography systems with optic surfaces, e.g., mirrors, that are otherwise inaccessible unless the system is dismantled.

US Patent:

20040011381, Jan 22, 2004

Filed:

Jul 17, 2002

Appl. No.:

10/198309

Inventors:

Leonard Klebanoff - Dublin CA, US
Samuel Graham - Dublin CA, US

International Classification:

C23G001/00

US Classification:

134/002000, 134/021000, 134/201000, 359/838000

Abstract:

A method using atomic hydrogen for removing carbon contamination from optical surfaces. The method is particularly useful for removing carbon and hydrocarbon contamination in-situ from the surface of the multilayer optics used for extreme ultraviolet lithography (EUVL) without degrading the quality of the optical surface. Atomic hydrogen at pressures in the range of about 10and 10Torr without the potentially detrimental heating of the optic is used to provide cleaning rates of about 6-60 /hr.

US Patent:

20040211448, Oct 28, 2004

Filed:

May 24, 2004

Appl. No.:

10/852545

Inventors:

Leonard Klebanoff - Dublin CA, US
Philip Grunow - Livermore CA, US
Samuel Graham - Dublin CA, US

Assignee:

EUV LLC

International Classification:

B08B007/00

US Classification:

134/039000, 134/001000, 134/021000, 134/031000

Abstract:

Activated gaseous species generated adjacent a carbon contaminated surface affords in-situ cleaning. A device for removing carbon contamination from a surface of the substrate includes (a) a housing defining a vacuum chamber in which the substrate is located; (b) a source of gaseous species; and (c) a source of electrons that are emitted to activate the gaseous species into activated gaseous species. The source of electrons preferably includes (i) a filament made of a material that generates thermionic electron emissions; (ii) a source of energy that is connected to the filament; and (iii) an electrode to which the emitted electrons are attracted. The device is particularly suited for photolithography systems with optic surfaces, e.g., mirrors, that are otherwise inaccessible unless the system is dismantled.