Sandeep Disawal

US Patent:

7691541, Apr 6, 2010

Filed:

Oct 21, 2003

Appl. No.:

10/689547

Inventors:

Percy Van Crocker - Chicago IL, US
Sylvain Cruchon-Dupeyrat - Chicago IL, US
Linette Demers - Chicago IL, US
Robert Elghanian - Chicago IL, US
Sandeep Disawal - Chicago IL, US
Nabil Amro - Chicago IL, US
Hua Zhang - Chicago IL, US

Assignee:

NanoInk, Inc. - Skokie IL

International Classification:

G03F 1/00
G03F 1/14
B05D 3/00
B32B 43/00
B82B 3/00

US Classification:

430 5, 427140, 977857, 977863

Abstract:

Photomask repair and fabrication with use of direct-write nanolithography, including use of scanning probe microscopic tips (e. g. , atomic force microscope tips, etc. ) for deposition of ink materials including sol-gel inks. Additive methods can be combined with subtractive methods. Holes can be filled with nanostructures. Heights of the nanostructures filling the holes can be controlled without losing control of the lateral dimensions of the nanostructures. Phase shifters on phase shifting masks (PSMs) are additively repaired with selectively deposited sol-gel material that is converted to solid oxide, which has optical transparency and index of refraction adapted for the phase shifters repaired.

US Patent:

8071168, Dec 6, 2011

Filed:

Feb 25, 2005

Appl. No.:

11/065694

Inventors:

Sylvain Cruchon-Dupeyrat - Chicago IL, US
Hua Zhang - Evanston IL, US
Robert Elghanian - Chicago IL, US
Linette Demers - Evanston IL, US
Nabil Amro - Chicago IL, US
Sandeep Disawal - Chicago IL, US
John Bussan - Naperville IL, US

Assignee:

Nanoink, Inc. - Skokie IL

International Classification:

B05D 5/00

US Classification:

427256, 427 21

Abstract:

A new, low temperature method for directly writing conductive metal traces with micron and sub-micron sized features. In this method, a flat beam is used, such as an AFM cantilever, with or without a tip, to draw traces of metal precursor ink onto a substrate. The dimensions of the metal traces can be directly controlled by the geometry of the cantilever, so that one can controllably deposit traces from 1 micron to over 100 microns wide with microfabricated cantilevers. Cantilevers with sharp tips can be used to further shrink the minimum features sizes to sub-micron scale. The height of the features can be increased by building layers of similar or different material.

US Patent:

20050255237, Nov 17, 2005

Filed:

Feb 14, 2005

Appl. No.:

11/056391

Inventors:

Hua Zhang - Evanston IL, US
Robert Elghanian - Wilmette IL, US
Linette Demers - Evanston IL, US
Nabil Amro - Chicago IL, US
Sandeep Disawal - Chicago IL, US
Sylvain Cruchon-Dupeyrat - Chicago IL, US

International Classification:

H01L021/44
B05D001/12
G03F001/00

US Classification:

427180000, 427256000, 430005000, 438674000

Abstract:

A novel method for fabricating polymer, e.g., polydimethylsiloxane (PDMS),-coated dip-pen nanolithographic (DPN) stamp tips. This kind of tip adsorbed chemicals (“inks”) easily and was used to generate DPN nanopatterns which were imaged with the same tip after DPN process. This method built a bridge between micro-contact printing (μCP) and DPN, making it possible for one to easily generate smaller structures of any molecules which have been patterned by the μCP technique. The easy tip-coating and writing process enriches the state-of-the-art DPN technique. The sub-100 nm DPN resolution obtained by using this kind of novel tip is comparable to that with a conventional SiNprobe tip. Importantly, the unique stamp tip was able to transfer solvent (e.g., liquid “ink”) onto a substrate, resulting in fabrication of hollow nanostructures with only one DPN holding/writing step. Inks comprising metals and sol-gel materials are noted, as well as applications in photomask repair, enhancement, and fabrication.

US Patent:

20100297228, Nov 25, 2010

Filed:

Oct 29, 2008

Appl. No.:

12/260911

Inventors:

Cedric Loiret-Bernal - Evanston IL, US
Nabil Amro - Chicago IL, US
Sandeep Disawal - Chicago IL, US
Bjoern Rosner - Chicago IL, US
John E. Bussan - Naperville IL, US
Bo He - Schaunburg IL, US

International Classification:

A61K 9/44
B05D 3/12
A61P 43/00

US Classification:

424467, 427 223

Abstract:

To improve anticounterfeiting protection, a method for imprinting pharmaceutical unit compositions comprising: providing a pharmaceutical unit composition, partially coating the exterior of the composition with a coating, stamping the coating with a stamp comprising a plurality of identification features, wherein identification features from the stamp are at least partially transposed in the coating and form a barcode, wherein the plurality of identification features comprise at least one lateral dimension of about 1,000 nm or less. Other objects can be coated and stamped including currency and luxury goods.

US Patent:

20110014131, Jan 20, 2011

Filed:

Jul 19, 2010

Appl. No.:

12/839327

Inventors:

Sandeep Disawal - Chicago IL, US
Bjoem Rosner - Chicago IL, US
Robert J. Janosky - Naples FL, US

International Classification:

A61K 9/48
A61J 3/06
B05D 5/00
B29C 45/14

US Classification:

424 102, 424451, 424456, 427 222, 264265

Abstract:

Small scale and nanoscopic identification features can be fabricated for pharmaceutical capsules. A composition comprising a capsule component, wherein the capsule component comprises a gelled pharmaceutical capsule material and at least one surface, wherein the at least one surface comprises at least one integral feature with a lateral dimension smaller than about 100 microns, or less than one micron. Methods of making the same are described by gelation with heating or cooling. The compositions and methods can be used for anti-counterfeiting.

US Patent:

20120100304, Apr 26, 2012

Filed:

Oct 24, 2011

Appl. No.:

13/279793

Inventors:

Sylvain Cruchon-Dupeyrat - Chicago IL, US
Hua Zhang - Evanston IL, US
Robert Elghanian - Chicago IL, US
Linette Demers - Evanston IL, US
Nabil Amro - Chicago IL, US
Sandeep Disawal - Chicago IL, US
John Bussan - Naperville IL, US

International Classification:

B05D 5/12
B05D 3/06

US Classification:

427555, 427553, 427 58, 427123, 4271261

Abstract:

A method for direct-write patterning comprises providing a cantilever having a cantilever end, wherein the cantilever is a tipless cantilever; providing an ink disposed at the cantilever end; providing a substrate surface; and moving the cantilever end or moving the substrate surface so that ink is delivered from the cantilever end to the substrate surface. A method for direct writing of conductive metal or metal precursor comprises providing a tipless cantilever having a cantilever end; providing an ink disposed at the cantilever end, wherein the ink comprises one or more metals, one or more metallic nanoparticles, or one or more metal salts; providing a substrate surface; and contacting the cantilever end and the substrate surface so that ink is delivered from the cantilever end to the substrate surface.

US Patent:

20120104660, May 3, 2012

Filed:

Oct 28, 2011

Appl. No.:

13/284727

Inventors:

Sandeep DISAWAL - Aurora IL, US
Bjoern ROSNER - Chicago IL, US
Patrick EISWERTH - Chicago IL, US
Michael R. NELSON - Libertyville IL, US
Robert JANOSKY - Naples FL, US
Bo HE - Schaumburg IL, US

International Classification:

B29C 59/16
B29C 45/26
B29C 45/76
B29C 45/00
B29C 41/42

US Classification:

264494, 2643281, 264129, 264 401, 425542, 425577

Abstract:

A method for forming a pharmaceutical container portion comprises providing a pharmaceutical container portion mold comprising a surface with at least one identification region, the at least one identification region comprising at least one identification feature that has a lateral dimension of 100 microns or less; and molding a pharmaceutical container portion from a moldable material using the mold, such that the at least one identification region is transferred to a surface of the pharmaceutical container portion. Applications include anti-counterfeiting.

US Patent:

20120164564, Jun 28, 2012

Filed:

Jun 29, 2010

Appl. No.:

13/381590

Inventors:

Nabil Amro - Chicago IL, US
Raymond Sanedrin - Evanston IL, US
Sandeep Disawal - Chicago IL, US
Joseph S. Fragala - San Jose CA, US

International Classification:

G03F 1/72
C08K 5/07
C08J 3/28
C08K 5/05
C08K 5/20
C08K 5/053
C08K 5/057
C09D 183/00

US Classification:

430 5, 524382, 524357, 524588, 524385, 524233, 524386, 524361, 522172

Abstract:

Additive repair of advanced photomasks with low temperature or optical curing via direct write lithographic printing with sharp tips and cantilevers. The optical properties of the materials formed from the ink can be tuned (e.g., n and k values). Sol gel inks, including silsesquioxane inks, can be used to form MoSi compositions. The repaired photomasks are resistant to washing under normal photomask washing conditions. AFM instrumentation can be used to perform the additive repair to provide the high resolution and registration.