Abstract:
An integrated optoelectrical circuit is described. An apparatus and method are disclosed whereby planar optical waveguides are formed on Al. sub. 2 O. sub. 3, other ceramics, silicon, silica, and other glass substrates that are thin film wired. An interface coating of silicon or silicon dioxide is applied to a surface of the thin film wired substrates using a low temperature deposition process such as sputtering or chemical vapor deposition. Glass cladding and core layers are deposited onto the thin film coating using a flame hydrolysis deposition technique. With this invention, channel waveguides and integrated optical circuits can be formed on a common substrate with electronic IC chips.