Srivatsan S Kidambi

US Patent:

20080241926, Oct 2, 2008

Filed:

Mar 3, 2008

Appl. No.:

12/041244

Inventors:

Ilsoon Lee - Okemos MI, US
Christina Chan - Okemos MI, US
Srivatsan Kidambi - Cambridge MA, US

International Classification:

C12N 5/06
B05D 3/00
B05D 1/36
B32B 5/00

US Classification:

435395, 427299, 427402, 428409

Abstract:

Micro-topography of a surface influences cell adhesion and proliferation. To improve adhesion, polyelectrolyte multilayers (PEMs) are built on patterned support layers to increase surface wettability, thereby improving attachment and spreading of the cells. Physical parameters, such as pattern size and pitch, in part, regulate cell adhesion and proliferation. Varying the surface topography provides a method to influence cell attachment and proliferation for tissue engineering applications.

US Patent:

20070224175, Sep 27, 2007

Filed:

Mar 27, 2007

Appl. No.:

11/728712

Inventors:

Christina Chan - Okemos MI, US
Ilsoon Lee - Okemos MI, US
Srivatsan Kidambi - Cambridge MA, US

International Classification:

A61K 35/12
C12N 5/06
C12N 5/08
A61K 9/70

US Classification:

424093700, 424443000, 435325000, 435366000, 427002240

Abstract:

A method for selectively removing a resist material from the polycationic surface of a polyelectrolyte multilayer (PEM) film, without disturbing adhering interactions between the cationic film surface and bound biomaterials such as cells, proteins, and nucleic acids. The resist material is one that that inhibits or prevents the further deposition of cells or other biomaterial; it thus masks the cationic surface from application of biomaterials. In one embodiment the resist material is a carboxy functional oxyalkylene oligomer. It is removed by exposing the film containing the bound biomaterial and the bound resist material to a pH below 4.5, and/or to a salt concentration of higher than 0.01 M.