Steven P. Cahill - Newton MA Bradley L. Hunter - Lexington MA
Assignee:
GSI Lumonics Corp. - Billerica MA
International Classification:
H01L 2168
US Classification:
318135, 318687, 355 53
Abstract:
A high-speed precision positioning apparatus has a stage supported by a platen. The stage is driven by a plurality of drive motors that are co-planar with the stage and arranged symmetrically around the stage. The drive motors apply drive forces directly to the stage without any mechanical contact to the stage. The drive forces impart planar motion to the stage in at least three degrees of freedom of motion. In the remaining three degrees of freedom the motion is constrained by a plurality of fluid bearings that operate between the stage and the platen. The drive motors are configured as magnets, attached to the stage, moving in a gap formed in-between top and bottom stationary coils. Integral force cancellation is implemented by a force cancellation system that applies cancellation forces to the stage. The cancellation forces, which are co-planar with a center of gravity of the stage and any components that move with the stage, cancel forces generated by planar motion of the stage. Interferometric encoders are used as position detectors.
Steven P. Cahill - Newton MA, US Bradley L. Hunter - Lexington MA, US
Assignee:
GSI Group Corporation - Billerica MA
International Classification:
H02K021/00
US Classification:
310 12, 355 53, 355 72
Abstract:
A high-speed precision positioning apparatus has a stage supported by a platen. The stage is driven by a plurality of drive motors that are co-planar with the stage and arranged symmetrically around the stage. The drive motors apply drive forces directly to the stage without any mechanical contact to the stage. The drive forces impart planar motion to the stage in at least three degrees of freedom of motion. In the remaining three degrees of freedom the motion is constrained by a plurality of fluid bearings that operate between the stage and the platen. The drive motors are configured as magnets, attached to the stage, moving in a gap formed in-between top and bottom stationary coils. Integral force cancellation is implemented by a force cancellation system that applies cancellation forces to the stage. The cancellation forces, which are co-planar with a center of gravity of the stage and any components that move with the stage, cancel forces generated by planar motion of the stage. Interferometric encoders are used as position detectors.
Method And System For Calibrating A Laser Processing System And Laser Marking System Utilizing Same
Steven P. Cahill - Newton MA, US Jonathan S. Ehrmann - Sudbury MA, US You C. Li - Reading MA, US Rainer Schramm - Everett MA, US Kurt Pelsue - Wayland MA, US
Assignee:
GSI Group Corporation - Billerica MA
International Classification:
B23K 26/00
US Classification:
21912169, 21912168
Abstract:
A method of calibrating a laser marking system includes calibrating a laser marking system in three dimensions. The step of calibrating includes storing data corresponding to a plurality of heights. A position measurement of a workpiece is obtained to be marked. Stored calibration data is associated with the position measurement. A method and system for calibrating a laser processing or marking system is provided. The method includes: calibrating a laser marker over a marking field; obtaining a position measurement of a workpiece to be marked; associating stored calibration data with the position measurement; relatively positioning a marking beam and the workpiece based on at least the associated calibration data; and calibrating a laser marking system in at least three degrees of freedom. The step of calibrating includes storing data corresponding to a plurality of positions and controllably and relatively positioning a marking beam based on the stored data corresponding to the plurality of positions.
Method And System For Marking A Workpiece Such As A Semiconductor Wafer And Laser Marker For Use Therein
Steven Cahill - Newton MA, US Jonathan Ehrmann - Sudbury MA, US John Gillespie - Salem MA, US You Li - Reading MA, US Chris Nemets - Camarillo CA, US Rainer Schramm - Everett MA, US Kevin Sullivan - Everett MA, US Walter Leslie - Westborough MA, US Michael Woelki - Stow MA, US Kurt Pelsue - Wayland MA, US
International Classification:
B23K026/00 B23K026/06
US Classification:
219/121680, 219/121830
Abstract:
A system for semiconductor wafer marking is provided. The system includes: (a) a first positioning subsystem for positioning a laser marking field relative to a wafer, the positioning along a first direction; (b) an alignment vision subsystem; (c) a laser marker including a laser for marking a location within the marking field with a laser marking beam; (d) a calibration program for calibrating at least one subsystem of the system; and (e) a controller. The marking field is substantially smaller than the wafer, and the laser marker includes a scan lens for optically maintaining a spot formed by the beam on the wafer within an acceptable range about the location within the marking field so as to avoid undesirable mark variations associated with wafer sag or other variations in depth within the field.
Method And System For Calibrating A Laser Processing System And Laser Marking System Utilizing Same
Steven Cahill - Newton MA, US Jonathan Ehrmann - Sudbury MA, US You Li - Reading MA, US Rainer Schramm - Everett MA, US Kurt Pelsue - Wayland MA, US
Assignee:
GSI Lumonics Corporation - Billerica MA
International Classification:
B23K 26/02
US Classification:
219121830, 219121690
Abstract:
A method of calibrating a laser marking system includes calibrating a laser marking system in three dimensions. The step of calibrating includes storing data corresponding to a plurality of heights. A position measurement of a workpiece is obtained to be marked. Stored calibration data is associated with the position measurement. A method and system for calibrating a laser processing or marking system is provided. The method includes: calibrating a laser marker over a marking field; obtaining a position measurement of a workpiece to be marked; associating stored calibration data with the position measurement; relatively positioning a marking beam and the workpiece based on at least the associated calibration data; and calibrating a laser marking system in at least three degrees of freedom. The step of calibrating includes storing data corresponding to a plurality of positions and controllably and relatively positioning a marking beam based on the stored data corresponding to the plurality of positions.
Steven P. Cahill - Newton MA Roger G. Covington - Rochester NY
Assignee:
Eastman Kodak Company - Rochester NY
International Classification:
G11B 700 G65D 8530
US Classification:
369291
Abstract:
Structure is provided for separately sealing an optical disk cartridge and cooperating apparatus closed when the cartridge and apparatus are not operatively engaged for intended use, and for opening the cartridge and apparatus to each other while jointly closing them from the environment when they are so engaged. The optical disk includes a magnetically attractable hub bearing a compliant annular seal. The disk-containing cartridge is permanently closed except for a central drive-access opening in one wall thereof that is bounded by a circular rim concentrically aligned with the hub seal. Magnetic means on that wall atrract the hub and thereby draw its seal into firm contact with the rim, to seal the opening closed whenever the cartridge is not in use. The cooperating apparatus includes a drive spindle that is bounded by a circular flange also concentrically aligned with the hub seal. Associated mechanism engages the spindle axially with the hub so as to move the flange into contact with the hub seal while moving the seal out of contact with the rim.
Steven P. Cahill - Newton MA Bradley L. Hunter - Lexington MA
Assignee:
General Scanning, Inc. - Wilimington MA
International Classification:
H01L 2100
US Classification:
310 12
Abstract:
A high-speed precision positioning apparatus has a stage supported by a platen. The stage is driven by a plurality of drive motors that are co-planar with the stage and arranged symmetrically around the stage. The drive motors apply drive forces directly to the stage without any mechanical contact to the stage. The drive forces impart planar motion to the stage in at least three degrees of freedom of motion. In the remaining three degrees of freedom the motion is constrained by a plurality of fluid bearings that operate between the stage and the platen. The drive motors are configured as magnets, attached to the stage, moving in a gap formed in-between top and bottom stationary coils. Integral force cancellation is implemented by a force cancellation system that applies cancellation forces to the stage. The cancellation forces, which are co-planar with a center of gravity of the stage and any components that move with the stage, cancel forces generated by planar motion of the stage.
University of Rhode Island Aug 2010 - Aug 2012
Research Assistant
Toray Plastics (America), Inc. Aug 2010 - Aug 2012
Process Engineer I
H.c. Starck Jun 2011 - Sep 2011
Engineering Intern
Education:
University of Rhode Island 2008 - 2012
Bachelors, Bachelor of Arts, Bachelor of Science, Chemical Engineering, Chemistry
Boston College 2004 - 2008
Skills:
Matlab Aspen Plus Turbovap Rotavap Distillation Units Cooling Towers Heat Exchangers Tensiometers Viscometers Liquid Chromatography Differential Scanning Calorimetry Gas Chromatography Mass Spectrometry Ir Spectroscopy Automated Solvent Extraction Chemstation Excel Injection Molding Plastic Extrusion Film Production Film Metallization
In his earnings preview, Wells Fargo analyst Steven Cahill had forecast 4 millionParamount+ subscriber net additions in the second quarter, or 5 million when excluding Russia, but only 1.3 million total streaming net adds due to some weakness at Showtime and a (negative) 2 million impact from non-
Steven Cahill (2002-2006), Walter Magnus (1959-1963), Paul Biber (1978-1982), Nicole Rice (1987-1991), Lorie Krucker (1988-1992), Jane Dalzotto (1971-1975)