Steven T Schaffer

US Patent:

20040062896, Apr 1, 2004

Filed:

Sep 26, 2002

Appl. No.:

10/256154

Inventors:

Terrence Picone - Ramsey NJ, US
Steven Schaffer - Danbury CT, US

International Classification:

B32B009/00
B32B003/10
G03F007/09
G03F007/40
G03F007/16
B05D001/32
B44C001/22

US Classification:

428/040100, 428/137000, 428/195100, 430/014000, 430/018000, 430/260000, 430/272100, 430/271100, 430/323000, 430/324000, 427/282000, 216/043000, 216/047000

Abstract:

The present invention is directed to a photo-sensitive laminate film for use in making an image mask for etching an image on a substrate. In a first preferred embodiment, the photo-sensitive laminate film comprises a support sheet having a first surface and a second surface, a layer of polymer resin composition having photocrosslinkability, the layer of polymer resin composition having a first surface and a second surface, and a fractionally-releasable bonding layer located between the first surface of the support sheet and the second surface of the layer of polymer resin composition. Upon the creation of an image mask from the layer of polymer resin composition, the image mask is capable of being separated from the first surface of the support sheet such that at least a portion of the bonding layer located between the image mask and the first surface of the support sheet is released from the support sheet with the image mask, and the remaining portion of the bonding layer remains with the support sheet. In use, the image mask, defined by a predetermined pattern, can be operatively attached to a substrate, the support sheet can be removed, and the substrate can be etched (e.g., either by sandblasting or by the application of a chemical etching solution) with an image corresponding inversely to the predetermined pattern of the image mask.