Su Y Kang

US Patent:

20120129105, May 24, 2012

Filed:

Nov 17, 2011

Appl. No.:

13/298761

Inventors:

James W. Thackeray - Braintree MA, US
Emad Aqad - Northborough MA, US
Su Jin Kang - Grafton MA, US

Assignee:

ROHM AND HAAS ELECTRONIC MATERIALS LLC - Marlborough MA

International Classification:

G03F 7/20
C08F 228/06
G03F 7/027
C08F 220/68
G03F 7/004

US Classification:

4302851, 525289, 430311, 525276

Abstract:

A copolymer has formula:wherein R-Rare independently H, Calkyl, or Caryl, Ris a fluorinated or non-fluorinated Cacid decomposable group; each Ar is a monocyclic, polycyclic, or fused polycyclic Caryl group; each Rand Ris —ORor —C(CF)ORwhere each Ris H, a fluorinated or non-fluorinated Cacid decomposable group, or a combination; each Ris independently F, a Calkyl, Cfluoroalkyl, Calkoxy, or a Cfluoroalkoxy group; Ris a cation-bound Cphotoacid generator-containing group, mole fractions a, b, and d are 0 to 0.80, c is 0.01 to 0.80, e is 0 to 0.50 provided where a, b, and d are 0, e is greater than 0, the sum a+b+c+d+e is 1, l and m are integers of 1 to 4, and n is an integer of 0 to 5. A photoresist and coated substrate, each include the copolymer.

US Patent:

20130078569, Mar 28, 2013

Filed:

Sep 21, 2012

Appl. No.:

13/624579

Inventors:

Rohm and Haas Electronic Materials LLC - Marlborough MA, US
Dow Global Technologies LLC - Midland MI, US
James W. Thackeray - Braintree MA, US
Brad C. Bailey - Midland MI, US
Su Jin Kang - Grafton MA, US

Assignee:

DOW GLOBAL TECHNOLOGIES LLC - Midland MI
ROHM AND HAAS ELECTRONIC MATERIALS LLC - Marlborough MA

International Classification:

C07C 69/80
G03F 7/20
G03F 7/004

US Classification:

4302701, 560100, 430322, 430296

Abstract:

A molecular glass compound comprises a vinyl ether adduct of an aromatic vinyl ether of formula C(R)═C(R)—O-(L)-Ar, and a calix[4]arene, wherein Rand Rare each independently a single bond, H, Calkyl, Chaloalkyl, Caryl, Chaloaryl, Caralkyl, or Chaloaralkyl, L is a Clinking group, n is 0 or 1, and Aris a halo-containing monocyclic, or substituted or unsubstituted polycyclic or fused polycyclic Caromatic-containing moiety, wherein Rand Rare connected to Arwhen either or both of Rand Ris a single bond and n is 0. A photoresist, comprising the molecular glass compound, a solvent, and a photoacid generator, a coated substrate, comprising (a) a substrate having one or more layers to be patterned on a surface thereof; and (b) a layer of a photoresist composition over the one or more layers to be patterned, and a method of forming the molecular glass compound, are also disclosed.

US Patent:

20060172223, Aug 3, 2006

Filed:

Nov 23, 2005

Appl. No.:

11/287103

Inventors:

James Cameron - Cambridge MA, US
Su Kang - Grafton MA, US
Jin Sung - Northborough MA, US

Assignee:

Rohm and Haas Electronic Materials LLC - Marlborough MA

International Classification:

G03C 1/76

US Classification:

430270100

Abstract:

Chemically-amplified positive photoresist compositions are provided that contain an additive with acetal and alicyclic groups. Preferred photoresists of the invention comprise a resin component that includes a polymer with one or more photoacid-labile moieties, one or more photoacid generator compounds, and an additive that contains one or more alicyclic groups such as adamantyl and the like.