Thomas U Boettiger

US Patent:

20120305030, Dec 6, 2012

Filed:

Jun 6, 2011

Appl. No.:

13/153834

Inventors:

Michael E. Chalom - Meridian ID, US
Thomas U. Boettiger - Boise ID, US

Assignee:

MICRON TECHNOLOGY, INC. - Boise ID

International Classification:

B08B 5/04

US Classification:

134 21

Abstract:

Some embodiments include methods for removing an edge bead after a photoresist application. Basic solution may be applied to the edge bead and removed with a vacuum, with the basic solution having a pH of at least about 14. Some embodiments include methods of profiling coatings along peripheral regions of substrates. A nozzle may be positioned above a peripheral region and oriented to direct a basic solution downwardly toward the peripheral region. A suction port may be positioned laterally outward of the peripheral region. Basic solution may be ejected from the nozzle toward the peripheral region, with the basic solution having a pH of at least about 14 and dissolving coating along the peripheral region. A vacuum may be provided within the suction port to pull the basic solution and the dissolved coating from the peripheral region.