M. Joseph Roberts - Ridgecrest CA, US Scott K. Johnson - Ridgecrest CA, US Richard A. Hollins - Ridgecrest CA, US Curtis E. Johnson - Ridgecrest CA, US Thomas J. Groshens - Ridgecrest CA, US David J. Irvin - Ridgecrest CA, US
Assignee:
The United States of America as represented by the Secretary of the Navy - Washington DC
International Classification:
H01L 21/302
US Classification:
438755, 438800, 438E5104, 977742, 977842, 977845
Abstract:
A film surface imprinted with nanometer-sized particles to produce micro- and/or nano-structured electron and hole collecting interfaces, including: at least one substrate; at least one photoabsorbing conjugated polymer (including polybutylthiophene (pbT)) applied on a substrate, nanometer-sized particles including multiwalled carbon nanotubes (MWNT) to produce a charge separation interface; at least one transparent polymerizable layer, wherein the MWNT are embedded in the conjugated polymer to produce mixture and applied on a substrate to form a MWNT bearing surface film layer to form a stamp surface which is imprinted into the surface of the polymerizable film layer to produce micro- and/or nano-structured electron and hole collecting interfaces; polymerizing the polymerizable film layer to form a conformal gap between the MWNT stamp surface and the surface of the polymerizable film layer, and filling the gap with a photoabsorbing material to promote the generation of photoexcited electrons and transport to the charge separation interface.
Method For Surface Imprinted Films With Carbon Nanotubes
M. Joseph Roberts - Ridgecrest CA, US Scott K. Johnson - Ridgecrest CA, US Richard A. Hollins - Ridgecrest CA, US Curtis E. Johnson - Ridgecrest CA, US Thomas J. Groshens - Ridgecrest CA, US David J. Irvin - Ridgecrest CA, US
Assignee:
The United States of America as represented by the Secretary of the Navy - Washington DC
A method of making films surface imprinted with nanometer-sized particles to produce micro- and/or nano-structured electron and hole collecting interfaces, include providing at least one transparent substrate, providing at least one photoabsorbing conjugated polymer, providing a sufficient amount of nanometer-sized particles to produce a charge separation interface, providing at least one transparent polymerizable layer, embedding the nanometer-sized particles in the conjugated polymer, applying the polymerizable layer and the conjugated polymer/nanometer-sized particle mixture on separate substrates where the nanometer-sized particles form a stamp surface, imprinting the stamp surface into the surface of the polymerizable film layer to produce micro- and/or nano-structured electron and hole collecting interfaces, polymerizing the polymerizable film layer to form a conformal gap, and filling the gap with at least one photoabsorbing material to promote the generation of photoexcited electrons and transport to the charge separation interface.
3,3,7,7,-Tetrakis(Difluoramino)Octahydro-1,5-Diazocinium Salts And Method For Making The Same
Robert D. Chapman - Ridgecrest CA, US Thomas J. Groshens - Ridgecrest CA, US
Assignee:
The United States of America as represented by the Secretary of the Navy - Washington DC
International Classification:
C07D 245/00
US Classification:
540470
Abstract:
3,3,7,7-Tetrakis(difluoramino)octahydro-1,5-diazocinium intermediate salts and method for making the salts, through difluoramination followed by N-denosylation or N-deprotection, which are valuable for use as precursor(s) to HNFX as well as to other members of the rare class of 3,3,7,7-tetrakis(difluoramino)octahydro-1,5-diazocines.
Method For Making 3,3,7,7-Tetrakis(Difluoramino)Octahydro-1,5-Dinitro-1,5-Diazocine (Hnfx)
Robert D. Chapman - Ridgecrest CA, US Thomas J. Groshens - Ridgecrest CA, US
Assignee:
The United States of America as represented by the Secretary of the Navy - Washington DC
International Classification:
C07D 245/00
US Classification:
540470
Abstract:
A novel reaction scheme is presented for making a 3,3,7,7-tetrakis(difluoramino)octahydro-1,5-diazocinium salt, such as HNFX, from a tetrahydro-1,5-diazocine-3,7(2H,6H)-dione that does not employ N-nitrolysis,—but that instead requires protolytic N-deprotection, or protolytic denosylation, (i. e. , the nosyl N-protecting group is replaced with protons, forming the corresponding protonated amine or ammonium derivative). In summary, the present method subjects a suitably N-protected dione to difluoramination followed by protolytic N-deprotection by addition of a superacid and subsequent nitration utilizing an electrophilic nitrating agent to yield the diazocinium salt.
Chemical Hydrogen Storage Materials Having Guanidinium Borohydride
The United States of America as represented by the Secretary of the Navy - Washington DC
International Classification:
H01M 8/06 C07F 5/02
US Classification:
95 90, 4236582
Abstract:
A fuel cell and a method for chemically storing hydrogen. Embodiments of the fuel cell include a mixture having at least one boron-nitrogen-hydrogen compound and a reactive hydride where the mixture has more than about 10 wt % hydrogen density and a hydrogen storage density of about 0. 1 kg H1.
Robert D. Chapman - Ridgecrest CA, US Thomas J. Groshens - Ridgecrest CA, US
International Classification:
C06B 45/00 D03D 23/00 D03D 43/00
US Classification:
149 2, 1491094
Abstract:
3,3,7,7-Tetrakis(difluoramino)octahydro-1,5-diazocinium intermediate salts through difluoramination followed by N-denosylation or N-deprotection, which are valuable for use as precursor(s) to HNFX as well as to other members of the rare class of 3,3,7,7-tetrakis(difluoramino)octahydro-1,5-diazocines.
Use Of Tertiarybutylbis-(Dimethylamino)Phosphine In Forming Semiconductor Material By Chemical Vapor Deposition
Robert W. Gedridge - Ridgecrest CA Thomas J. Groshens - Ridgecrest CA Kelvin T. Higa - Ridgecrest CA
Assignee:
The United States of America as represented by the Secretary of the Navy - Washington DC
International Classification:
H01L 2120
US Classification:
438478
Abstract:
A new compound, tertiarybutylbis-(dimethylamino)phosphine, ((CH. sub. 3). sub. 3 C)((CH. sub. 3). sub. 2 N). sub. 2 P, is used as a precursor in forming phosphorus-containing semiconductor material by chemical vapor deposition. Tertiarybutylbis-(dimethylamino)phosphine is prepared by reacting a phosphorus trihalide, PX. sub. 3, with the tertiarybutyl Grignard reagent ((CH. sub. 3). sub. 3 C)MgX. The resultant product is treated with lithium dimethylamide reagent LiN(CH. sub. 3). sub. 2. Tertiarybutylbis-(dimethylamino)phosphine is then recovered from the reaction mixture. Phosphorus-containing semiconductor materials are formed by chemical vapor deposition by means of bubbling a carrier gas through the new compound and then transporting the ((CH. sub. 3). sub. 3 C)((CH. sub. 3). sub. 2 N). sub. 2 P with the carrier gas to a heated substrate. Additional elements from groups II, III, V, and VI of the periodic table are then deposited on the substrate to form the Phosphorus-containing semiconductor materials.
Compound Tertiarybutylbis-(Dimethylamino)Phosphine And A Process For Preparing The Compound Tertiarybutylbis-(Dimethylamino)Phosphine
Robert W. Gedridge - Ridgecrest CA Thomas J. Groshens - Ridgecrest CA Kelvin T. Higa - Ridgecrest CA
Assignee:
The United States of America as represented by the Secretary of the Navy - Washington DC
International Classification:
C23C 1600
US Classification:
42725538
Abstract:
A new compound tertiarybutylbis-(dimethylamino)phosphine and a process for preparing the compound, which has the formula ((CH. sub. 3). sub. 3 C) ((CH. sub. 3). sub. 2 N). sub. 2 P. The process has the steps of: (1) reacting phosphorus trihalide, PX. sub. 3, with tertiarybutyl Grignard reagent, ((CH. sub. 3). sub. 3 C)MgX, where X is a halide; (2) treating the resulting product with lithium dimethylamide, LiN(CH. sub. 3). sub. 2 to form a reaction mixture; and (3) recovering ((CH. sub. 3). sub. 3 C) ((CH. sub. 3). sub. 2 N). sub. 2 P from the reaction mixture.
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