Thomas Lee Wilkinson

US Patent:

51057620, Apr 21, 1992

Filed:

Mar 22, 1991

Appl. No.:

7/674417

Inventors:

Thomas F. Wilkinson - Garland TX

Assignee:

Texas Instruments Incorporated - Dallas TX

International Classification:

C23C 1600
F16J 1502
F16C 3206

US Classification:

118733

Abstract:

Reaction gases are prevented from escaping from a reaction chamber through the use of flexible or gas seals between the interface of the reaction chamber and the junction used to connected successive reaction chambers.

US Patent:

50424238, Aug 27, 1991

Filed:

Dec 20, 1988

Appl. No.:

7/287753

Inventors:

Thomas F. Wilkinson - Garland TX

Assignee:

Texas Instruments Incorporated - Dallas TX

International Classification:

B05C 102

US Classification:

118500

Abstract:

A carrier for use in a continuous chemical vapor deposition reactor system has a lid with tapered edges which match the sides of a recess in the carrier in which the lid resides during processing of the semiconductor to provide a precise fit for the lid and to minimize thermal stresses in the carrier, the lid and the lid-carrier assembly due to extreme heat during processing of the semiconductor wafer.

US Patent:

49414291, Jul 17, 1990

Filed:

Dec 20, 1988

Appl. No.:

7/287106

Inventors:

Thomas F. Wilkinson - Garland TX
Kaoru Ishii - Garland TX

Assignee:

Texas Instruments Incorporated - Dallas TX

International Classification:

C23C 1600

US Classification:

118715

Abstract:

A track system is used in a continuous chemical deposition reaction system to guide semiconductor wafer carriers through a plurality of interconnected reaction chambers to position the carriers in each reaction chamber, and to prevent wear to the bottom of the reactor chambers.

US Patent:

49496697, Aug 21, 1990

Filed:

Dec 20, 1988

Appl. No.:

7/287174

Inventors:

Kaoru Ishii - Garland TX
Thomas F. Wilkinson - Garland TX

Assignee:

Texas Instruments Incorporated - Dallas TX

International Classification:

C23C 1600

US Classification:

118719

Abstract:

Gas flow structures are described for the inputting and exhausting of gases for a continuous vapor deposition reactor to cause an even flow of gases within the reactor chamber and to prevent the deposition of reaction material on the walls of the reactor chamber. Gas inlet and exhaust port structures are provided for multiple-chamber chemical vapor deposition reactors having gas input and exhaust junctions, wherein the ports may include, in order to provide uniform flow, baffles or a plurality of orifices with or without shutters. Two vertically spaced gas inlets may be used, wherein gas from a second inlet prevents deposition on the reactor chamber from gases introduced through the first inlet.

US Patent:

53124901, May 17, 1994

Filed:

Jan 29, 1992

Appl. No.:

7/827780

Inventors:

Thomas F. Wilkinson - Garland TX

Assignee:

Texas Instruments Incorporated - Dallas TX

International Classification:

C23C 1600

US Classification:

118733

Abstract:

Reaction gases are prevented from escaping from a reaction chamber through the use of flexible or gas seals between the interface of the reaction chamber and the junction used to connected successive reaction chambers.

US Patent:

54438608, Aug 22, 1995

Filed:

Mar 2, 1994

Appl. No.:

8/204912

Inventors:

Thomas F. Wilkinson - Garland TX

Assignee:

Texas Instruments Incorporated - Dallas TX

International Classification:

C23C 1600

US Classification:

4272481

Abstract:

Reaction gases are prevented from escaping from a reaction chamber through the use of flexible or gas seals between the interface of the reaction chamber and the junction used to connected successive reaction chambers.

US Patent:

49084950, Mar 13, 1990

Filed:

Dec 20, 1988

Appl. No.:

7/287747

Inventors:

Kaoru Ishii - Garland TX
Thomas F. Wilkinson - Garland TX
Stephen J. Dwyer - Dallas TX
Rick Cooper - Farmers Branch TX

Assignee:

Texas Instruments Incorporated - Dallas TX

International Classification:

H05B 100
F21V 2900
G02B 510

US Classification:

219343

Abstract:

A heating lamp assembly for use with semiconductor reactors has a reflector assembly constructed of tubes joined together by heat conductive spacers to provide for water cooling of the reflector assembly, has mounting pins for providing variable spacing of heating lamps, and water manifolds on each side of the reflector assembly for directing water through the cooling tubes. One or more blocking gates are mounted on the lamp mounting pins to direct cooling air flow across the heating lamps.