Tony J Keeton

US Patent:

6861321, Mar 1, 2005

Filed:

Apr 5, 2002

Appl. No.:

10/118073

Inventors:

Tony J. Keeton - Mesa AZ, US
Michael R. Stamp - Chandler AZ, US
Mark R. Hawkins - Gilbert AZ, US

Assignee:

ASM America, Inc. - Phoenix AZ

International Classification:

H01L021/336

US Classification:

438308, 438792, 438795, 118724, 118725, 118727

Abstract:

One or more of three different measures are taken to preheat a wafer before it is loaded into direct contact with a wafer holder, in order to provide optimal throughput while reducing the risk of thermal shock to the wafer. The first measure is to move the wafer holder to a raised position prior to inserting the wafer into the reaction chamber and holding the wafer above the wafer holder. The second measure is to provide an increased flow rate of a heat-conductive gas (such as Hpurge gas) through the chamber prior to inserting the wafer therein. The third measure is to provide a power bias to radiative heat elements (e. g. , heat lamps) above the reaction chamber.

US Patent:

6879777, Apr 12, 2005

Filed:

Oct 3, 2002

Appl. No.:

10/265519

Inventors:

Matthew G. Goodman - Chandler AZ, US
Tony J Keeton - Mesa AZ, US
Ravinder Aggarwal - Gilbert AZ, US
Mark Hawkins - Gilbert AZ, US

Assignee:

ASM America, Inc. - Phoenix AZ

International Classification:

F26B003/30

US Classification:

392411, 392416, 392418, 219390, 219405, 219411, 118724, 118725

Abstract:

An apparatus for processing a semiconductor substrate, including a process chamber having a plurality of walls and a substrate support to support the substrate within the process chamber. A radiative heat source is positioned outside the process chamber to heat the substrate through the walls when the substrate is positioned on the substrate support. In some embodiments, lenses are positioned between the heat source and the substrate to focus or diffuse radiation from the heat source and thereby selectively alter the radiation intensity incident on certain portions of the substrate. In other embodiments, diffusing surfaces are positioned between the heat source and the substrate to diffuse radiation from the heat source and thereby selectively reduce the radiation intensity incident on certain portions of the substrate.

US Patent:

7033445, Apr 25, 2006

Filed:

Dec 20, 2002

Appl. No.:

10/327296

Inventors:

Tony J. Keeton - Mesa AZ, US
Zachary L. Lutz - Phoenix AZ, US

Assignee:

ASM America, Inc. - Phoenix AZ

International Classification:

H01L 21/00
C23C 16/00

US Classification:

118725, 118724, 118728, 118500, 118715, 15634551, 15634552, 15634553, 2194441, 219544, 392416, 392418, 2041921, 20429801, 279128, 279 3, 361234

Abstract:

Susceptor designs are provided for controlling damage to wafers, particularly during cold wafer drops-off on a hot susceptor. The designs include axisymmetric grid designs, such that thermal gradients are symmetrical in the circumferential (θ) direction and the same traversing any particular radial line. The grids are preferably arcuate and each have the same surface area. In one embodiment an outer zone is asymmetrically designed to induce predictable wafer curling in a saddle shape.

US Patent:

7070660, Jul 4, 2006

Filed:

May 3, 2002

Appl. No.:

10/139098

Inventors:

Tony J. Keeton - Mesa AZ, US
Matthew G. Goodman - Chandler AZ, US

Assignee:

ASM America, Inc. - Phoenix AZ

International Classification:

H01L 21/00
C23C 16/00

US Classification:

118725, 118728, 118724, 118500, 15634551, 15634552, 2041921, 20429801

Abstract:

A wafer holder comprises a circular, disc-shaped main portion and a rib extending generally downward from a lower surface of the main portion. The rib encircles the vertical center axis of the wafer holder. The upper surface of the main portion has a wafer-receiving pocket defined by an inner pocket surface surrounded by an outer shoulder. The rib is closed to completely surround a vertical center axis of the main portion. The rib helps to prevent the main portion from inducing symmetric concavity during the manufacture of the wafer holder. In other words, the rib helps to maintain the flatness of the upper surface of the outer shoulder while the main portion is made symmetrically concave.

US Patent:

7449071, Nov 11, 2008

Filed:

Jul 30, 2004

Appl. No.:

10/903083

Inventors:

Ravinder K. Aggarwal - Gilbert AZ, US
Tony J. Keeton - Chandler AZ, US
Matthew G. Goodman - Chandler AZ, US

Assignee:

ASM America, Inc. - Phoenix AZ

International Classification:

C23C 16/00
C23F 1/00
H01L 21/306

US Classification:

118725, 118728, 118729, 118730, 15634551, 15634552, 15634553, 15634554, 15634555

Abstract:

A wafer holder for supporting a wafer within a CVD processing chamber includes a vertically moveable lift ring configured to support the bottom peripheral surface of the wafer, and an inner plug having a top flat surface configured to support the wafer during wafer processing. The lift ring has a central aperture configured to closely surround the inner plug. When a wafer is to be loaded onto the wafer holder, the lift ring is elevated above the inner plug. The wafer is loaded onto the lift ring in the elevated position. Then, the lift ring is maintained in the elevated position for a time period sufficient to allow the wafer temperature to rise to a level that is sufficient to significantly reduce or even substantially prevent thermal shock to the wafer when the wafer is brought into contact with the inner plug. The lift ring is then lowered into surrounding engagement with the inner plug. This is the wafer processing position of the wafer holder.

US Patent:

7648579, Jan 19, 2010

Filed:

Feb 11, 2005

Appl. No.:

11/057111

Inventors:

Matt G. Goodman - Chandler AZ, US
Ravinder Aggarwal - Gilbert AZ, US
Mike Halpin - Scottsdale AZ, US
Tony Keeton - Mesa AZ, US
Mark Hawkins - Gilbert AZ, US
Lee Haen - Phoenix AZ, US
Armand Ferro - Phoenix AZ, US
Paul Brabant - Phoenix AZ, US
Robert Vyne - Gilbert AZ, US
Gregory M. Bartlett - Chandler AZ, US
Joseph P. Italiano - Phoenix AZ, US
Bob Haro - Gilbert AZ, US

Assignee:

ASM America, Inc. - Phoenix AZ

International Classification:

C23C 16/458
C23C 16/00
H01L 21/306

US Classification:

118730, 118715, 118725, 118728, 118500, 15634533, 15634551, 15634552, 15634554

Abstract:

A substrate support system comprises a substrate holder having a plurality of passages extending between top and bottom surfaces thereof. The substrate holder supports a peripheral portion of the substrate backside so that a thin gap is formed between the substrate and the substrate holder. A hollow support member provides support to an underside of, and is configured to convey gas upward into one or more of the passages of, the substrate holder. The upwardly conveyed gas flows into the gap between the substrate and the substrate holder. Depending upon the embodiment, the gas then flows either outward and upward around the substrate edge (to inhibit backside deposition of reactant gases above the substrate) or downward through passages of the substrate holder, if any, that do not lead back into the hollow support member (to inhibit autodoping by sweeping out-diffused dopant atoms away from the substrate backside).

US Patent:

8088225, Jan 3, 2012

Filed:

Dec 18, 2009

Appl. No.:

12/641712

Inventors:

Matt G. Goodman - Chandler AZ, US
Ravinder Aggarwal - Gilbert AZ, US
Mike Halpin - Scottsdale AZ, US
Tony Keeton - Mesa AZ, US
Mark Hawkins - Gilbert AZ, US
Lee Haen - Phoenix AZ, US
Armand Ferro - Phoenix AZ, US
Paul Brabant - Phoenix AZ, US
Robert Vyne - Gilbert AZ, US
Gregory M. Bartlett - Chandler AZ, US
Joseph P. Italiano - Phoenix AZ, US
Bob Haro - Gilbert AZ, US

Assignee:

ASM America, Inc. - Phoenix AZ

International Classification:

C23C 16/458
C23C 16/00
H01L 21/306

US Classification:

118730, 118715, 118725, 118728, 118500, 15634533, 15634534, 15634552, 15634554

Abstract:

A substrate support system comprises a substrate holder having a plurality of passages extending between top and bottom surfaces thereof. The substrate holder supports a peripheral portion of the substrate backside so that a thin gap is formed between the substrate and the substrate holder. A hollow support member provides support to an underside of, and is configured to convey gas upward into one or more of the passages of, the substrate holder. The upwardly conveyed gas flows into the gap between the substrate and the substrate holder. Depending upon the embodiment, the gas then flows either outward and upward around the substrate edge (to inhibit backside deposition of reactant gases above the substrate) or downward through passages of the substrate holder, if any, that do not lead back into the hollow support member (to inhibit autodoping by sweeping out-diffused dopant atoms away from the substrate backside).

US Patent:

20030173031, Sep 18, 2003

Filed:

Mar 15, 2002

Appl. No.:

10/100308

Inventors:

Ravinder Aggarwal - Gilbert AZ, US
Tony Keeton - Chandler AZ, US
Matthew Goodman - Chandler AZ, US

International Classification:

C23F001/00
C23C016/00

US Classification:

156/345510, 118/728000

Abstract:

A wafer holder for supporting a wafer within a CVD processing chamber includes a vertically moveable lift ring configured to support the bottom peripheral surface of the wafer, and an inner plug having a top flat surface configured to support the wafer during wafer processing. The lift ring has a central aperture configured to closely surround the inner plug. When a wafer is to be loaded onto the wafer holder, the lift ring is elevated above the inner plug. The wafer is loaded onto the lift ring in the elevated position. Then, the lift ring is maintained in the elevated position for a time period sufficient to allow the wafer temperature to rise to a level that is sufficient to significantly reduce or even substantially prevent thermal shock to the wafer when the wafer is brought into contact with the inner plug. The lift ring is then lowered into surrounding engagement with the inner plug. This is the wafer processing position of the wafer holder.

Address:

4859 E Harmony Ave, Mesa, AZ 85206

Phone:

(480)9855246

VIN:

1FMDK06157GA28353

Make:

FORD

Model:

FREESTYLE

Year:

2007